Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12222651 | Resist underlayer film forming composition having a disulfide structure | Takafumi Endo, Yuichi Goto, Yasunobu Someya, Satoshi KAMIBAYASHI | 2025-02-11 |
| 12077633 | Chemical-resistant protective film-forming composition containing polymerization product of arylene compound having glycidyl group | Takafumi Endo, Tokio NISHITA | 2024-09-03 |
| 12072631 | Resist underlayer film-forming composition and method for forming resist pattern using the same | Shou SHIMIZU, Hiroyuki Wakayama, Yasunobu Someya | 2024-08-27 |
| 12030974 | Composition for forming block copolymer layer for formation of microphase-separated pattern | Yasunobu Someya, Hiroyuki Wakayama, Masami Kozawa, Shinsuke TADOKORO | 2024-07-09 |
| 11479627 | Film forming composition containing fluorine-containing surfactant | Makiko Umezaki, Ryo Karasawa, Shuhei Shigaki | 2022-10-25 |
| 11459414 | Film forming composition containing fluorine-containing surfactant | Makiko Umezaki, Ryo Karasawa, Shuhei Shigaki | 2022-10-04 |
| 11440985 | Underlayer film-forming composition for use in forming a microphase-separated pattern | Yasunobu Someya, Hiroyuki Wakayama, Rikimaru Sakamoto | 2022-09-13 |
| 10995172 | Self-organized film-forming composition for use in forming a micro-phase-separated pattern | Yasunobu Someya, Hiroyuki Wakayama, Rikimaru Sakamoto | 2021-05-04 |
| 10865262 | Upper-layer film forming composition and method for producing a phase-separated pattern | Yasunobu Someya, Hiroyuki Wakayama, Rikimaru Sakamoto | 2020-12-15 |
| 10289002 | Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer | Yasushi Sakaida, Rikimaru Sakamoto | 2019-05-14 |
| 10113083 | Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound | Ryuji Ohnishi, Tokio NISHITA, Yasushi Sakaida, Rikimaru Sakamoto | 2018-10-30 |
| 10042247 | Mask blank, method for manufacturing mask blank and transfer mask | Takahiro Hiromatsu, Masahiro Hashimoto, Yasushi Sakaida, Rikimaru Sakamoto, Masaki Nagai | 2018-08-07 |
| 9746764 | Mask blank and transfer mask | Takahiro Hiromatsu, Masahiro Hashimoto, Yasushi Sakaida, Rikimaru Sakamoto, Masaki Nagai | 2017-08-29 |
| 9394231 | Composition for forming antistatic film and oligomer compound | Tokio NISHITA, Rikimaru Sakamoto, Tomohisa Yamada, Naoki Nakaie, Yuki TAKAYAMA | 2016-07-19 |