Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12405533 | Resist underlayer film-forming composition containing substituted crosslinkable compound | Keisuke Hashimoto, Kenji Takase, Tetsuya Shinjo, Rikimaru Sakamoto, Takafumi Endo | 2025-09-02 |
| 12313972 | Resist underlayer film-forming composition | Hiroto OGATA, Makoto Nakajima, Yuki MITSUTAKE, Hayato HATTORI | 2025-05-27 |
| 12072629 | Resist underlayer film-forming composition containing novolac resin to which aromatic vinyl compound is added | Takafumi Endo, Keisuke Hashimoto, Rikimaru Sakamoto | 2024-08-27 |
| 12044969 | Resist underlayer film-forming composition | Hiroto OGATA, Hikaru TOKUNAGA, Makoto Nakajima | 2024-07-23 |
| 12025916 | Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added | Daigo Saito, Ryo Karasawa, Keisuke Hashimoto | 2024-07-02 |
| 11650505 | Resist underlayer film-forming composition containing novolac resin reacted with aromatic methylol compound | Rikimaru Sakamoto, Keisuke Hashimoto, Takafumi Endo | 2023-05-16 |
| 11472168 | Laminated body including novolac resin as peeling layer | Hiroshi Ogino, Ryo Karasawa, Tetsuya Shinjo, Satoshi KAMIBAYASHI, Shunsuke MORIYA +1 more | 2022-10-18 |
| 11287742 | Composition for forming resist underlayer film having improved flattening properties | Takafumi Endo | 2022-03-29 |
| 11199777 | Resist underlayer film-forming composition containing novolac polymer having secondary amino group | Keisuke Hashimoto, Rikimaru Sakamoto, Takafumi Endo | 2021-12-14 |
| 10809619 | Resist underlayer film-forming composition containing substituted crosslinkable compound | Keisuke Hashimoto, Kenji Takase, Tetsuya Shinjo, Rikimaru Sakamoto, Takafumi Endo | 2020-10-20 |
| 10585353 | Resist underlayer film forming composition | Keisuke Hashimoto, Rikimaru Sakamoto | 2020-03-10 |
| 10394124 | Resist underlayer film-forming composition containing polymer having arylene group | Keisuke Hashimoto, Rikimaru Sakamoto, Takafumi Endo | 2019-08-27 |
| 10191374 | Resist underlayer film-forming composition | Keisuke Hashimoto, Takafumi Endo, Rikimaru Sakamoto | 2019-01-29 |
| 10017664 | Novolac resin-containing resist underlayer film-forming composition using bisphenol aldehyde | Takafumi Endo, Keisuke Hashimoto, Rikimaru Sakamoto | 2018-07-10 |
| 9469777 | Resist underlayer film forming composition that contains novolac resin having polynuclear phenol | Takafumi Endo, Tetsuya Shinjo, Keisuke Hashimoto, Yasunobu Someya, Ryo Karasawa +1 more | 2016-10-18 |
| 9436085 | Composition for forming photosensitive resist underlayer film | Yusuke Horiguchi, Makiko Umezaki, Noriaki Fujitani, Takahiro Kishioka, Takahiro Hamada | 2016-09-06 |
| 9395628 | Resist underlayer film-forming composition containing aryl sulfonate salt having hydroxyl group | Takafumi Endo, Keisuke Hashimoto, Rikimaru Sakamoto | 2016-07-19 |
| 9261790 | Resist underlayer film-forming composition containing copolymer resin having heterocyclic ring | Yasunobu Someya, Keisuke Hashimoto, Tetsuya Shinjo, Ryo Karasawa, Rikimaru Sakamoto | 2016-02-16 |
| 9263286 | Diarylamine novolac resin | Rikimaru Sakamoto, Yasunobu Someya, Keisuke Hashimoto | 2016-02-16 |
| 9244353 | Resist underlayer film forming composition | Keisuke Hashimoto, Tetsuya Shinjo, Takafumi Endo, Rikimaru Sakamoto | 2016-01-26 |
| 9140989 | Photosensitive organic particles | Takahiro Kishioka, Makiko Umezaki, Shigeo Kimura, Tomoya Ohashi, Yuki Usui | 2015-09-22 |
| 9023583 | Monolayer or multilayer forming composition | Takahiro Kishioka, Daisuke SAKUMA, Shigeo Kimura, Tomoya Ohashi, Yuki Usui | 2015-05-05 |
| 8993215 | Resist underlayer film forming composition containing phenylindole-containing novolac resin | Rikimaru Sakamoto, Keisuke Hashimoto, Tetsuya Shinjo, Yasunobu Someya, Ryo Karasawa | 2015-03-31 |
| 8822138 | Composition for forming resist underlayer film for lithography including resin containing alicyclic ring and aromatic ring | Tetsuya Shinjo, Yasushi Sakaida, Keisuke Hashimoto | 2014-09-02 |
| 8685615 | Photosensitive resist underlayer film forming composition | Shigeo Kimura, Tomoya Ohashi, Yuki Usui, Takahiro Kishioka | 2014-04-01 |