Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11488824 | Method for manufacturing semiconductor device using silicon-containing resist underlayer film forming composition for solvent development | Satoshi Takeda, Makoto Nakajima, Hiroyuki Wakayama | 2022-11-01 |
| 11447700 | Liquid crystal cured layer, production method therefor, optical film, polarizing plate, and display device | Masakazu Saito, Yuki Furukawa | 2022-09-20 |
| 11392037 | Resist underlayer film forming composition containing silicone having cyclic amino group | Makoto Nakajima, Wataru SHIBAYAMA | 2022-07-19 |
| 10590219 | Retardation material-forming resin composition, orientation material, and retardation material | Shojiro Yukawa, Jun Ito, Kohei Goto, Hiroyuki Omura, Tadashi Hatanaka | 2020-03-17 |
| 10570248 | Cured film formation composition, orientation material, and retardation material | Jun Ito, Tadashi Hatanaka | 2020-02-25 |
| 10428274 | Liquid crystal alignment agent for photo-alignment, aligning member, and retardation member | Jun Ito, Tadashi Hatanaka | 2019-10-01 |
| 10372039 | Resist underlayer film forming composition containing silicon having ester group | Makoto Nakajima, Satoshi Takeda, Hiroyuki Wakayama | 2019-08-06 |
| 10100201 | Cured film formation composition, orientation material and retardation material | Jun Ito, Shojiro Yukawa, Kohei Goto, Tadashi Hatanaka | 2018-10-16 |
| 10081693 | Retardation material-forming resin composition, orientation material, and retardation material | Shojiro Yukawa, Jun Ito, Kohei Goto, Hiroyuki Omura, Tadashi Hatanaka | 2018-09-25 |
| 10079146 | Resist underlayer film forming composition containing silicon containing cyclic organic group having hetero atom | Makoto Nakajima, Kenji Takase, Satoshi Takeda, Hiroyuki Wakayama | 2018-09-18 |
| 9760006 | Silicon-containing resist underlayer film forming composition having urea group | Makoto Nakajima, Wataru SHIBAYAMA | 2017-09-12 |
| 9524871 | Silicon-containing resist underlayer film-forming composition having sulfone structure | Makoto Nakajima, Daisuke SAKUMA, Takahiro Kishioka | 2016-12-20 |
| 9494862 | Resist underlayer film forming composition containing silicon having sulfone structure and amine structure | Kenji Takase, Makoto Nakajima, Satoshi Takeda, Hiroyuki Wakayama | 2016-11-15 |
| 9291900 | Composition for forming resist underlayer film, containing silicon that bears diketone-structure-containing organic group | Daisuke SAKUMA, Makoto Nakajima | 2016-03-22 |
| 9290623 | Composition for forming silicon-containing resist underlayer film having cyclic diester group | Daisuke SAKUMA, Kenji Takase, Makoto Nakajima, Shuhei Shigaki | 2016-03-22 |
| 9217921 | Resist underlayer film forming composition containing silicon having sulfide bond | Makoto Nakajima, Wataru SHIBAYAMA | 2015-12-22 |
| 9196484 | Silicon-containing composition for formation of resist underlayer film, which contains organic group containing protected aliphatic alcohol | Satoshi Takeda, Makoto Nakajima | 2015-11-24 |
| 9093279 | Thin film forming composition for lithography containing titanium and silicon | Makoto Nakajima, Satoshi Takeda, Yasushi Sakaida, Shuhei Shigaki | 2015-07-28 |
| 9023588 | Resist underlayer film forming composition containing silicon having nitrogen-containing ring | Makoto Nakajima, Wataru SHIBAYAMA | 2015-05-05 |
| 8877425 | Silicon-containing resist underlayer film forming composition having fluorine-based additive | Makoto Nakajima, Tomoko Misaki, Motonobu Matsuyama, Masayuki Haraguchi | 2014-11-04 |
| 8864894 | Resist underlayer film forming composition containing silicone having onium group | Wataru SHIBAYAMA, Makoto Nakajima | 2014-10-21 |
| 8835093 | Resist underlayer film forming composition containing silicon having anion group | Wataru SHIBAYAMA, Makoto Nakajima | 2014-09-16 |
| 8828879 | Silicon-containing composition having sulfonamide group for forming resist underlayer film | Makoto Nakajima, Wataru SHIBAYAMA | 2014-09-09 |
| 8815494 | Resist underlayer film forming composition containing silicon having anion group | Wataru SHIBAYAMA, Makoto Nakajima | 2014-08-26 |
| 8426112 | Resist underlayer film forming composition containing polymer having nitrogen-containing silyl group | Makoto Nakajima, Wataru SHIBAYAMA | 2013-04-23 |