Issued Patents All Time
Showing 1–25 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12372875 | Composition for resist pattern metallization process | Satoshi Takeda, Shuhei Shigaki, Ken ISHIBASHI, Kodai KATO, Makoto Nakajima | 2025-07-29 |
| 12248251 | Silicon-containing resist underlayer film-forming composition including organic group having ammonium group | Hayato HATTORI, Ken ISHIBASHI, Makoto Nakajima | 2025-03-11 |
| 12227621 | Film-forming composition | Yuichi Goto, Shun KUBODERA, Satoshi Takeda, Ken ISHIBASHI, Makoto Nakajima | 2025-02-18 |
| 12084592 | Coating composition for pattern inversion | Hiroaki Yaguchi, Makoto Nakajima, Yuki Endo, Shuhei Shigaki | 2024-09-10 |
| 11966164 | Semiconductor device production method employing silicon-containing resist underlayer film-forming composition including organic group having ammonium group | Hayato HATTORI, Ken ISHIBASHI, Makoto Nakajima | 2024-04-23 |
| 11815815 | Composition for forming silicon-containing resist underlayer film removable by wet process | Hiroyuki Wakayama, Makoto Nakajima, Masahisa Endo | 2023-11-14 |
| 11561472 | Radiation sensitive composition | Makoto Nakajima, Kenji Takase, Satoshi Takeda | 2023-01-24 |
| 11531269 | Method for producing resist pattern coating composition with use of solvent replacement method | Shuhei Shigaki, Satoshi Takeda, Makoto Nakajima, Rikimaru Sakamoto | 2022-12-20 |
| 11392037 | Resist underlayer film forming composition containing silicone having cyclic amino group | Makoto Nakajima, Yuta Kanno | 2022-07-19 |
| 11281104 | Alkaline developer soluable silicon-containing resist underlayer film-forming composition | Makoto Nakajima | 2022-03-22 |
| 11215927 | Substrate treating composition and method for fabricating a semiconductor device using the same | Ju Young Kim, Hyunwoo KIM, Makoto Nakajima, Satoshi Takeda, Shuhei Shigaki | 2022-01-04 |
| 11175583 | Silicon-containing resist underlayer film-forming composition having phenyl group-containing chromophore | Makoto Nakajima, Satoshi Takeda, Kenji Takase | 2021-11-16 |
| 11022884 | Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl group | Kenji Takase, Makoto Nakajima, Satoshi Takeda, Hiroyuki Wakayama, Rikimaru Sakamoto | 2021-06-01 |
| 10838303 | Resist underlayer film forming composition for lithography containing hydrolyzable silane having carbonate skeleton | Makoto Nakajima, Yuichi Goto, Rikimaru Sakamoto | 2020-11-17 |
| 10676491 | Isocyanuric acid derivative having alkoxyalkyl groups and method for producing the same | Shun KUBODERA, Yuichi Goto, Gun SON | 2020-06-09 |
| 10613440 | Silicon-containing EUV resist underlayer film-forming composition containing onium sulfonate | Shuhei Shigaki, Rikimaru Sakamoto | 2020-04-07 |
| 10558119 | Composition for coating resist pattern | Makoto Nakajima, Shuhei Shigaki, Hiroaki Yaguchi, Rikimaru Sakamoto | 2020-02-11 |
| 10372040 | Resist underlayer film forming composition for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide group | Kenji Takase, Rikimaru Sakamoto | 2019-08-06 |
| 10197917 | Silicon-containing resists underlayer film-forming composition having phenyl group-containing chromophore | Makoto Nakajima, Satoshi Takeda, Kenji Takase | 2019-02-05 |
| 10139729 | Coating composition for pattern reversal on soc pattern | Hiroaki Yaguchi, Makoto Nakajima, Satoshi Takeda, Hiroyuki Wakayama, Rikimaru Sakamoto | 2018-11-27 |
| 10082735 | Silicon-containing resist underlayer film-forming composition having organic group having aliphatic polycyclic structure | Shuhei Shigaki, Makoto Nakajima, Satoshi Takeda, Hiroyuki Wakayama, Rikimaru Sakamoto | 2018-09-25 |
| 9760006 | Silicon-containing resist underlayer film forming composition having urea group | Makoto Nakajima, Yuta Kanno | 2017-09-12 |
| 9725618 | Metal-containing resist underlayer film-forming composition containing polyacid | Makoto Nakajima, Hiroyuki Wakayama, Satoshi Takeda | 2017-08-08 |
| 9627217 | Silicon-containing EUV resist underlayer film-forming composition including additive | Shuhei Shigaki, Hiroaki Yaguchi, Rikimaru Sakamoto, Bangching Ho | 2017-04-18 |
| 9217921 | Resist underlayer film forming composition containing silicon having sulfide bond | Yuta Kanno, Makoto Nakajima | 2015-12-22 |