Issued Patents All Time
Showing 76–100 of 100 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9261790 | Resist underlayer film-forming composition containing copolymer resin having heterocyclic ring | Yasunobu Someya, Keisuke Hashimoto, Tetsuya Shinjo, Hirokazu Nishimaki, Ryo Karasawa | 2016-02-16 |
| 9263286 | Diarylamine novolac resin | Yasunobu Someya, Keisuke Hashimoto, Hirokazu Nishimaki | 2016-02-16 |
| 9250525 | Resist underlayer film-forming composition | Takafumi Endo, Noriaki Fujitani | 2016-02-02 |
| 9244353 | Resist underlayer film forming composition | Hirokazu Nishimaki, Keisuke Hashimoto, Tetsuya Shinjo, Takafumi Endo | 2016-01-26 |
| 9240327 | Resist underlayer film-forming composition for EUV lithography containing condensation polymer | Noriaki Fujitani, Takafumi Endo, Ryuji Ohnishi, Bangching Ho | 2016-01-19 |
| 9212255 | Resist underlayer film-forming composition | Takafumi Endo, Noriaki Fujitani | 2015-12-15 |
| 9195137 | Composition for forming highly adhesive resist underlayer film | Takafumi Endo, Noriaki Fujitani | 2015-11-24 |
| 9165782 | Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same | Takafumi Endo, Noriaki Fujitani | 2015-10-20 |
| 9046768 | Resist overlayer film forming composition for lithography | Ryuji Ohnishi, Takafumi Endo | 2015-06-02 |
| 9005873 | Composition for forming resist underlayer film for EUV lithography | Takafumi Endo, Bangching Ho | 2015-04-14 |
| 8993215 | Resist underlayer film forming composition containing phenylindole-containing novolac resin | Hirokazu Nishimaki, Keisuke Hashimoto, Tetsuya Shinjo, Yasunobu Someya, Ryo Karasawa | 2015-03-31 |
| 8962234 | Resist underlayer film forming composition and method for forming resist pattern using the same | Ryuji Ohnishi, Takafumi Endo | 2015-02-24 |
| 8722840 | Resist underlayer film forming composition, and method for forming resist pattern using the same | Noriaki Fujitani, Takafumi Endo, Ryuji Ohnishi, Bangching Ho | 2014-05-13 |
| 8603731 | Resist underlayer film forming composition for electron beam lithography | Tomoyuki Enomoto, Takahiro Sakaguchi, Masaki Nagai | 2013-12-10 |
| 8445175 | Composition containing hydroxylated condensation resin for forming resist underlayer film | Yoshiomi Hiroi, Takahiro Kishioka | 2013-05-21 |
| 8435721 | Resist underlayer film forming composition and forming method of resist pattern using the same | Takafumi Endo | 2013-05-07 |
| 8383320 | Resist underlayer film forming composition and method of forming resist pattern using the same | Yoshiomi Hiroi, Tomohisa Ishida, Takafumi Endo | 2013-02-26 |
| 7846638 | Composition for forming anti-reflective coating for use in lithography | Takahiro Kishioka, Ken-ichi Mizusawa, Tomoyuki Enomoto, Keisuke Nakayama, Yasuo Kawamura | 2010-12-07 |
| 7833681 | Mask blank and mask | Masahiro Hashimoto, Tomoyuki Enomoto, Takahiro Sakaguchi, Masaki Nagai | 2010-11-16 |
| 7790356 | Condensation type polymer-containing anti-reflective coating for semiconductor | Takahiro Kishioka, Yoshiomi Hiroi, Daisuke Maruyama | 2010-09-07 |
| 7736822 | Resist underlayer coating forming composition for mask blank, mask blank and mask | Masahiro Hashimoto, Tomoyuki Enomoto, Takahiro Sakaguchi, Masaki Nagai | 2010-06-15 |
| 7632626 | Anti-reflective coating forming composition for lithography containing polymer having ethylenedicarbonyl structure | — | 2009-12-15 |
| 7501229 | Anti-reflective coating containing sulfur atom | Yoshiomi Hiroi, Takahiro Kishioka, Keisuke Nakayama | 2009-03-10 |
| 7425399 | Composition for forming anti-reflective coating for use in lithography | Takahiro Kishioka, Ken-ichi Mizusawa, Tomoyuki Enomoto, Keisuke Nakayama, Yasuo Kawamura | 2008-09-16 |
| 7309560 | Composition for forming anti-reflective coating | Ken-ichi Mizusawa | 2007-12-18 |