Issued Patents All Time
Showing 1–25 of 49 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12062582 | Method of manufacturing semiconductor devices | Li YIN, Hung-Bin Lin, Hsin-Hsien Wu, Chyi Shyuan Chern, Ming-Hua Lo | 2024-08-13 |
| 11656391 | Aperture design and methods thereof | Hung-Chih Hsieh, Kai-Chiang Wu, Yen-Liang Chen, Kai-Hsiung Chen, Po-Chung Cheng | 2023-05-23 |
| 11513444 | Noise reduction for overlay control | Weimin Hu, Yang-Hung Chang, Kai-Hsiung Chen, Chun-Ming Hu | 2022-11-29 |
| 10983005 | Spectroscopic overlay metrology | Kai-Chiang Wu, Hung-Chih Hsieh, Kai-Hsiung Chen, Yen-Liang Chen | 2021-04-20 |
| 10867116 | Forecasting wafer defects using frequency domain analysis | Yang-Hung Chang, Che-Yuan Sun, Chun-Ming Hu | 2020-12-15 |
| 10866524 | Method and system for overlay control | Yang-Hung Chang, Kai-Hsiung Chen | 2020-12-15 |
| 10684556 | Noise reduction for overlay control | Weimin Hu, Yang-Hung Chang, Kai-Hsiung Chen, Chun-Ming Hu | 2020-06-16 |
| 10663633 | Aperture design and methods thereof | Hung-Chih Hsieh, Kai-Chiang Wu, Yen-Liang Chen, Kai-Hsiung Chen, Po-Chung Cheng | 2020-05-26 |
| 10521548 | Forecasting wafer defects using frequency domain analysis | Yang-Hung Chang, Che-Yuan Sun, Chun-Ming Hu | 2019-12-31 |
| 10514612 | Method and system for overlay control | Yang-Hung Chang, Kai-Hsiung Chen | 2019-12-24 |
| 10281827 | Noise reduction for overlay control | Weimin Hu, Yang-Hung Chang, Kai-Hsiung Chen, Chun-Ming Hu | 2019-05-07 |
| 10274839 | Two-dimensional marks | Wen-Zhan Zhou, Heng-Jen Lee, Chen-Ming Wang, Kai-Hsiung Cheng, Ho-yung David Hwang | 2019-04-30 |
| 10163733 | Method of extracting defects | Jia-Rui Hu, Shu-Chuan Chuang, Che-Yuan Sun | 2018-12-25 |
| 10031426 | Method and system for overlay control | Yang-Hung Chang, Kai-Hsiung Chen | 2018-07-24 |
| 10031997 | Forecasting wafer defects using frequency domain analysis | Yang-Hung Chang, Che-Yuan Sun, Chun-Ming Hu | 2018-07-24 |
| 9766554 | Method and apparatus for estimating focus and dose of an exposure process | Yen-Liang Chen, Kai-Hsiung Chen, Wen-Zhan Zhou | 2017-09-19 |
| 9690212 | Hybrid focus-exposure matrix | Wen-Zhan Zhou, Heng-Jen Lee, Yen-Liang Chen, Kai-Hsiung Chen, Ho-yung David Hwang | 2017-06-27 |
| 9594309 | Method and apparatus to characterize photolithography lens quality | Guo-Tsai Huang | 2017-03-14 |
| 9418199 | Method and apparatus for extracting systematic defects | Jia-Rui Hu, Hua-Tai Lin, Kai-Hsiung Chen, Tsai-Sheng Gau | 2016-08-16 |
| 9360767 | Method and apparatus for maintaining depth of focus | Chang-Tsun Hsieh, Fu-Jye Liang, Li-Jui Chen, Tzung-Chi Fu | 2016-06-07 |
| RE45943 | Measurement of overlay offset in semiconductor processing | Te-Chih Huang, Tsai-Sheng Gau | 2016-03-22 |
| 9201022 | Extraction of systematic defects | Jia-Rui Hu, Te-Chih Huang, Hua-Tai Lin, Tsai-Sheng Gau | 2015-12-01 |
| 9097978 | Method and apparatus to characterize photolithography lens quality | Guo-Tsai Huang | 2015-08-04 |
| 9070622 | Systems and methods for similarity-based semiconductor process control | Ching-Pin Kao, Yang-Hung Chang, Kai-Hsiung Chen, Chun-Ming Hu | 2015-06-30 |
| 9053284 | Method and system for overlay control | Yang-Hung Chang, Kai-Hsiung Chen | 2015-06-09 |