Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12196687 | Method for inspecting pattern defects | Ju-Ying CHEN, Che-Yen Lee, Chia-Fong Chang, Hua-Tai Lin, Chi-Yuan Sun +1 more | 2025-01-14 |
| 12055860 | Multi-function overlay marks for reducing noise and extracting focus and critical dimension information | Yu-Ching Lee, Yu-Piao Fang | 2024-08-06 |
| 11835864 | Multi-function overlay marks for reducing noise and extracting focus and critical dimension information | Yu-Ching Lee, Yu-Piao Fang | 2023-12-05 |
| 11624985 | Methods of defect inspection | Ta-Ching Yu, Shih-Che Wang, Shu-Hao Chang, Yi-Hao Chen, Chen-Yen Kao +1 more | 2023-04-11 |
| 11448975 | Multi-function overlay marks for reducing noise and extracting focus and critical dimension information | Yu-Ching Lee, Yu-Piao Fang | 2022-09-20 |
| 11320745 | Measuring a process parameter for a manufacturing process involving lithography | Maurits Van Der Schaar, Arie Jeffrey Den Boef, Omer Abubaker Omer Adam, Youping Zhang | 2022-05-03 |
| 10915017 | Multi-function overlay marks for reducing noise and extracting focus and critical dimension information | Yu-Ching Lee, Yu-Piao Fang | 2021-02-09 |
| 10795270 | Methods of defect inspection | Ta-Ching Yu, Shih-Che Wang, Shu-Hao Chang, Yi-Hao Chen, Chen-Yen Kao +1 more | 2020-10-06 |
| 10608830 | Power over fiber enabled sensor system | Mei-huan Yang, Cheng-Liang Wu, Terry L. Zahuranec, Remigio Perales, Kun-Hsien Chen +4 more | 2020-03-31 |
| 10180628 | Method of determining critical-dimension-related properties, inspection apparatus and device manufacturing method | Hugo Augustinus Joseph Cramer, Arie Jeffrey Den Boef, Henricus Johannes Lambertus Megens, Maurits Van Der Schaar | 2019-01-15 |
| 10162272 | Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing method | Martin Jacobus Johan Jak, Hendrik Jan Hidde Smilde, Victor Emanuel Calado, Henricus Wilhelmus Maria Van Buel, Richard Johannes Franciscus Van Haren | 2018-12-25 |
| 10073357 | Measuring a process parameter for a manufacturing process involving lithography | Maurits Van Der Schaar, Arie Jeffrey Den Boef, Omer Abubaker Omer Adam, Youping Zhang | 2018-09-11 |
| 9903823 | Metrology method and apparatus | Yen-Wen Lu, Jay Jianhui Chen, Wei-Cheng Liu, Boris Menchtchikov, Jen-Shiang Wang | 2018-02-27 |
| RE45943 | Measurement of overlay offset in semiconductor processing | Chih-Ming Ke, Tsai-Sheng Gau | 2016-03-22 |
| 9201022 | Extraction of systematic defects | Jia-Rui Hu, Chih-Ming Ke, Hua-Tai Lin, Tsai-Sheng Gau | 2015-12-01 |
| 9026957 | Method of defining an intensity selective exposure photomask | Chia-Chu Liu, Kuei-Shun Chen, Chih-Yang Yeh, Wen-Hao Liu, Ying-Chou Cheng +9 more | 2015-05-05 |
| 8837810 | System and method for alignment in semiconductor device fabrication | Yen-Liang Chen, Chen-Ming Wang, Chih-Ming Ke, Tsai-Sheng Gau | 2014-09-16 |
| 8755045 | Detecting method for forming semiconductor device | Jyuh-Fuh Lin, Guo-Tsai Huang, Jia-Rui Hu, Chih-Ming Ke | 2014-06-17 |
| 8673520 | Intensity selective exposure photomask | George Liu, Kuei-Shun Chen, Chih-Yang Yeh, Wen-Hao Liu, Ying-Chou Cheng +9 more | 2014-03-18 |
| 8431291 | Intensity selective exposure photomask | George Liu, Kuei-Shun Chen, Chih-Yang Yeh, Wen-Hao Liu, Ying-Chou Cheng +9 more | 2013-04-30 |
| 8179536 | Measurement of overlay offset in semiconductor processing | Chih-Ming Ke, Tsai-Sheng Gau | 2012-05-15 |
| 8003303 | Intensity selective exposure method and apparatus | George Liu, Kuei-Shun Chen, Chih-Yang Yeh | 2011-08-23 |
| 7858404 | Measurement of overlay offset in semiconductor processing | Chih-Ming Ke, Tsai-Sheng Gau | 2010-12-28 |
| 7796249 | Mask haze early detection | Wen-Chuan Wang, Shy-Jay Lin, Chih-Ming Ke, Wei-Yu Su, Heng-Hsin Liu +2 more | 2010-09-14 |