Issued Patents All Time
Showing 1–25 of 58 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12242201 | Determining hot spot ranking based on wafer measurement | Weixuan HU, Fei Yan, Wei Peng, Vivek Jain | 2025-03-04 |
| 12055904 | Method to predict yield of a device manufacturing process | Boris Menchtchikov, Cyrus E. Tabery, Yi Zou, Chenxi Lin, Yana Cheng +2 more | 2024-08-06 |
| 12044980 | Method of manufacturing devices | Abraham SLACHTER, Wim Tjibbo Tel, Daan Maurits Slotboom, Vadim Yourievich TIMOSHKOV, Koen Wilhelmus Cornelis Adrianus Van Der Straten +7 more | 2024-07-23 |
| 12038694 | Determining pattern ranking based on measurement feedback from printed substrate | Maxime Philippe Frederic Genin, Cong Wu, Jing Su, Weixuan HU, Yi Zou | 2024-07-16 |
| 11966166 | Measurement apparatus and a method for determining a substrate grid | Franciscus Godefridus Casper Bijnen, Edo Maria Hulsebos, Henricus Johannes Lambertus Megens, Robert John Socha | 2024-04-23 |
| 11947266 | Method for controlling a manufacturing process and associated apparatuses | Nicolaas Petrus Marcus Brantjes, Matthijs Cox, Boris Menchtchikov, Cyrus E. Tabery, Yi Zou +4 more | 2024-04-02 |
| 11803127 | Method for determining root cause affecting yield in a semiconductor manufacturing process | Chenxi Lin, Cyrus E. Tabery, Hakki Ergün Cekli, Simon Philip Spencer Hastings, Boris Menchtchikov +5 more | 2023-10-31 |
| 11635699 | Determining pattern ranking based on measurement feedback from printed substrate | Maxime Philippe Frederic Genin, Cong Wu, Jing Su, Weixuan HU, Yi Zou | 2023-04-25 |
| 11568123 | Method for determining an etch profile of a layer of a wafer for a simulation system | Chi-Hsiang Fan, Feng Chen, Wangshi Zhao | 2023-01-31 |
| 11519043 | Roller treatment process and treatment device suitable for total-amount steel slag treatment | Yongqian Li, Yongli Xiao, Yin Liu, Mengqin XIE | 2022-12-06 |
| 11429029 | Method and apparatus for illumination adjustment | Maurits Van Der Schaar, Patrick Warnaar, Arie Jeffrey Den Boef, Feng Xiao, Martin Ebert | 2022-08-30 |
| 11392044 | Method of determining a position of a feature | Ralph Timotheus Huijgen, Marc Jurian Kea, Marcel Theodorus Maria Van Kessel, Masashi Ishibashi, Chi-Hsiang Fan +3 more | 2022-07-19 |
| 11320745 | Measuring a process parameter for a manufacturing process involving lithography | Maurits Van Der Schaar, Arie Jeffrey Den Boef, Omer Abubaker Omer Adam, Te-Chih Huang | 2022-05-03 |
| 11281113 | Method for determining stack configuration of substrate | Danying LI, Chi-Hsiang Fan, Abdalmohsen Elmalk, Jay Jianhui Chen, Kui Huang | 2022-03-22 |
| 11187995 | Metrology using a plurality of metrology target measurement recipes | Victor Emanuel Calado, Maurits Van Der Schaar, Richard Johannes Franciscus Van Haren, Xing Lan Liu | 2021-11-30 |
| 11092900 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Maurits Van Der Schaar, Hendrik Jan Hidde Smilde, Anagnostis Tsiatmas, Adriaan Johan Van Leest, Alok Verma +3 more | 2021-08-17 |
| 11079684 | Measurement apparatus and a method for determining a substrate grid | Franciscus Godefridus Casper Bijnen, Edo Maria Hulsebos, Henricus Johannes Lambertus Megens, Robert John Socha | 2021-08-03 |
| 10802409 | Metrology method and apparatus, substrate, lithographic method and associated computer product | Chi-Hsiang Fan, Maurits Van Der Schaar | 2020-10-13 |
| 10585357 | Alternative target design for metrology using modulation techniques | Maurits Van Der Schaar, Hua XU | 2020-03-10 |
| 10578980 | Method of determining a position of a feature | Ralph Timotheus Huijgen, Marc Jurian Kea, Marcel Theodorus Maria Van Kessel, Masashi Ishibashi, Chi-Hsiang Fan +3 more | 2020-03-03 |
| 10481503 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Maurits Van Der Schaar, Hendrik Jan Hidde Smilde, Anagnostis Tsiatmas, Adriaan Johan Van Leest, Alok Verma +3 more | 2019-11-19 |
| 10423075 | Methods and systems for pattern design with tailored response to wavefront aberration | Hanying Feng, Yu Cao, Jun Ye | 2019-09-24 |
| 10296681 | Process based metrology target design | Guangqing Chen, Shufeng Bai, Eric Kent, Yen-Wen Lu, Paul Anthony Tuffy +3 more | 2019-05-21 |
| 10073357 | Measuring a process parameter for a manufacturing process involving lithography | Maurits Van Der Schaar, Arie Jeffrey Den Boef, Omer Abubaker Omer Adam, Te-Chih Huang | 2018-09-11 |
| 10061212 | Metrology target, method and apparatus, target design method, computer program and lithographic system | Maurits Van Der Schaar, Richard Johannes Franciscus Van Haren, Everhardus Cornelis Mos | 2018-08-28 |