Issued Patents All Time
Showing 1–25 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11966166 | Measurement apparatus and a method for determining a substrate grid | Franciscus Godefridus Casper Bijnen, Edo Maria Hulsebos, Henricus Johannes Lambertus Megens, Youping Zhang | 2024-04-23 |
| 11079684 | Measurement apparatus and a method for determining a substrate grid | Franciscus Godefridus Casper Bijnen, Edo Maria Hulsebos, Henricus Johannes Lambertus Megens, Youping Zhang | 2021-08-03 |
| 10996571 | Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measured | Arie Jeffrey Den Boef, Nitesh Pandey | 2021-05-04 |
| 10670973 | Coloring aware optimization | Yi Zou, Jing Su, Christopher A. Spence, Duan-Fu Stephen Hsu | 2020-06-02 |
| 10670975 | Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measured | Arie Jeffrey Den Boef, Nitesh Pandey | 2020-06-02 |
| 10657641 | Source and mask optimization by changing intensity and shape of the illumination source and magnitude and phase of mask diffraction orders | — | 2020-05-19 |
| 10437158 | Metrology by reconstruction | — | 2019-10-08 |
| 10417359 | Optical metrology of lithographic processes using asymmetric sub-resolution features to enhance measurement | Thomas I. Wallow | 2019-09-17 |
| 10132763 | Inspection method and apparatus, lithographic system and device manufacturing method | Hugo Augustinus Joseph Cramer, Patricius Aloysius Jacobus Tinnemans, Jean-Pierre Agnes Henricus Marie Vaessen | 2018-11-20 |
| 10054862 | Inspection apparatus, inspection method, lithographic apparatus, patterning device and manufacturing method | Anton Bernhard Van Oosten, Paul Christiaan Hinnen, Robertus Cornelis Martinus De Kruif | 2018-08-21 |
| 9053280 | Rule optimization in lithographic imaging based on correlation of functions representing mask and predefined optical conditions | — | 2015-06-09 |
| 8751979 | Determining the gradient and Hessian of the image log slope for design rule optimization for accelerating source mask optimization (SMO) | — | 2014-06-10 |
| 8730452 | Source and mask optimization by changing intensity and shape of the illumination source and magnitude and phase of mask diffraction orders | — | 2014-05-20 |
| 8640058 | Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process | — | 2014-01-28 |
| 8612900 | Rule optimization in lithographic imaging based on correlation of functions representing mask and predefined optical conditions | — | 2013-12-17 |
| 8572521 | Method for performing pattern decomposition for a full chip design | Luoqui Chen, Hong Chen, Jiangwei Li | 2013-10-29 |
| 8495526 | Method, program product and apparatus for performing decomposition of a pattern for use in a DPT process | — | 2013-07-23 |
| 8395757 | Optimized polarization illumination | Donis Flagello, Steve Hansen | 2013-03-12 |
| 8356261 | Determining the gradient and hessian of the image log slope for design rule optimization for accelerating source mask optimization (SMO) | — | 2013-01-15 |
| 8340394 | Method, program product and apparatus for performing a model based coloring process for geometry decomposition for use in a multiple exposure process | — | 2012-12-25 |
| 8224061 | Method, program product, and apparatus for performing a model based coloring process for pattern decomposition for use in a multiple exposure process | — | 2012-07-17 |
| 8060842 | Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process | — | 2011-11-15 |
| 7864301 | Source and mask optimization by changing intensity and shape of the illumination source | — | 2011-01-04 |
| 7865865 | Method, program product and apparatus for performing decomposition of a pattern for use in a DPT process | — | 2011-01-04 |
| 7710544 | Optimized polarization illumination | Donis Flagello, Steve Hansen | 2010-05-04 |