Issued Patents All Time
Showing 25 most recent of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12416854 | Machine learning based subresolution assist feature placement | Jun Tao, Yu Cao | 2025-09-16 |
| 11953823 | Measurement method and apparatus | — | 2024-04-09 |
| 10670973 | Coloring aware optimization | Yi Zou, Jing Su, Robert John Socha, Duan-Fu Stephen Hsu | 2020-06-02 |
| 9250538 | Efficient optical proximity correction repair flow method and apparatus | Guoxiang Ning, Paul Ackmann, Chin Teong Lim | 2016-02-02 |
| 7788609 | Method and apparatus for optimizing an optical proximity correction model | Hung-Eil Kim, Eun Joo Lee | 2010-08-31 |
| 7657864 | System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques | Cyrus E. Tabery, Todd P. Lukanc, Chris Haidinyak, Luigi Capodieci, Carl P. Babcock +1 more | 2010-02-02 |
| 7543256 | System and method for designing an integrated circuit device | Todd P. Lukanc, Cyrus E. Tabery, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim +1 more | 2009-06-02 |
| 7313769 | Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability margin | Todd P. Lukanc, Cyrus E. Tabery, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim +1 more | 2007-12-25 |
| 7269804 | System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques | Cyrus E. Tabery, Todd P. Lukanc, Chris Haidinyak, Luigi Capodieci, Carl P. Babcock +1 more | 2007-09-11 |
| 7207017 | Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results | Cyrus E. Tabery, Chris Haidinyak, Todd P. Lukanc, Luigi Capodieci, Carl P. Babcock +1 more | 2007-04-17 |
| 7194725 | System and method for design rule creation and selection | Todd P. Lukanc, Cyrus E. Tabery, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim +1 more | 2007-03-20 |
| 7120285 | Method for evaluation of reticle image using aerial image simulator | — | 2006-10-10 |
| 7071085 | Predefined critical spaces in IC patterning to reduce line end pull back | Todd P. Lukanc, Luigi Capodieci, Joerg Reiss, Sarah N. McGowan | 2006-07-04 |
| 7027130 | Device and method for determining an illumination intensity profile of an illuminator for a lithography system | Todd P. Lukanc, Luigi Capodieci, Joerg Reiss, Sarah N. McGowan | 2006-04-11 |
| 7015148 | Reduce line end pull back by exposing and etching space after mask one trim and etch | Todd P. Lukanc, Luigi Capodieci, Joerg Reiss, Sarah N. McGowan | 2006-03-21 |
| 6994939 | Semiconductor manufacturing resolution enhancement system and method for simultaneously patterning different feature types | Kouros Ghandehari, Jean Y. Yang | 2006-02-07 |
| 6974652 | Lithographic photomask and method of manufacture to improve photomask test measurement | Todd P. Lukanc, Luigi Capodieci, Bhanwar Singh | 2005-12-13 |
| 6818358 | Method of extending the areas of clear field phase shift generation | Todd P. Lukanc | 2004-11-16 |
| 6797438 | Method and enhancing clear field phase shift masks with border around edges of phase regions | Todd P. Lukanc | 2004-09-28 |
| 6749970 | Method of enhancing clear field phase shift masks with border regions around phase 0 and phase 180 regions | Todd P. Lukanc | 2004-06-15 |
| 6749971 | Method of enhancing clear field phase shift masks with chrome border around phase 180 regions | Todd P. Lukanc | 2004-06-15 |
| 6675369 | Method of enhancing clear field phase shift masks by adding parallel line to phase 0 region | Todd P. Lukanc | 2004-01-06 |
| 6627355 | Method of and system for improving stability of photomasks | Harry J. Levinson, Fan Piao | 2003-09-30 |
| 6562639 | Utilizing electrical performance data to predict CD variations across stepper field | Anna M. Minvielle, Luigi Capodieci | 2003-05-13 |
| 6492066 | Characterization and synthesis of OPC structures by fourier space analysis and/or wavelet transform expansion | Luigi Capodieci | 2002-12-10 |