Issued Patents All Time
Showing 25 most recent of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8924896 | Automated design layout pattern correction based on context-aware patterns | Lynn Wang, Vito Dai | 2014-12-30 |
| 8918745 | Stitch insertion for reducing color density differences in double patterning technology (DPT) | Lynn Wang, Sriram Madhavan | 2014-12-23 |
| 8910090 | Methods involving pattern matching to identify and resolve potential non-double-patterning-compliant patterns in double patterning applications | Lynn Wang, Vito Dai | 2014-12-09 |
| 8898606 | Layout pattern correction for integrated circuits | Rani S. Abou Ghaida, Ahmed Mohyeldin, Piyush Pathak, Swamy Muddu, Vito Dai | 2014-11-25 |
| 8589844 | Methods for analyzing design rules | Swamy Muddu, Abde Ali Hunaid Kagalwalla | 2013-11-19 |
| 8555215 | Methods for decomposing circuit design layouts and for fabricating semiconductor devices using decomposed patterns | Yi Zou, Swamy Maddu, Lynn Wang, Vito Dai, Peng Xie | 2013-10-08 |
| 8516407 | Methods for quantitatively evaluating the quality of double patterning technology-compliant layouts | Lynn Wang, Sriram Madhavan | 2013-08-20 |
| 8418105 | Methods for pattern matching in a double patterning technology-compliant physical design flow | Lynn Wang, Vito Dai | 2013-04-09 |
| 8124300 | Method of lithographic mask correction using localized transmission adjustment | Bhanwar Singh | 2012-02-28 |
| 8103979 | System for generating and optimizing mask assist features based on hybrid (model and rules) methodology | Yi Zou | 2012-01-24 |
| 7799517 | Single/double dipole mask for contact holes | — | 2010-09-21 |
| 7757190 | Design rules checking augmented with pattern matching | Vito Dai, Jie Yang, Norma C. Rodriguez | 2010-07-13 |
| 7657864 | System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques | Cyrus E. Tabery, Todd P. Lukanc, Chris Haidinyak, Carl P. Babcock, Hung-Eil Kim +1 more | 2010-02-02 |
| 7543256 | System and method for designing an integrated circuit device | Todd P. Lukanc, Cyrus E. Tabery, Carl P. Babcock, Hung-Eil Kim, Christopher A. Spence +1 more | 2009-06-02 |
| 7354682 | Chromeless mask for contact holes | — | 2008-04-08 |
| 7313777 | Layout verification based on probability of printing fault | Jie Yang | 2007-12-25 |
| 7313769 | Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability margin | Todd P. Lukanc, Cyrus E. Tabery, Carl P. Babcock, Hung-Eil Kim, Christopher A. Spence +1 more | 2007-12-25 |
| 7310155 | Extraction of tool independent line-edge-roughness (LER) measurements using in-line programmed LER and reliability structures | Amit P. Marathe, Bhanwar Singh, Ramkumar Subramanian | 2007-12-18 |
| 7305645 | Method for manufacturing place & route based on 2-D forbidden patterns | Bhanwar Singh, Ramkumar Subramanian | 2007-12-04 |
| 7269804 | System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques | Cyrus E. Tabery, Todd P. Lukanc, Chris Haidinyak, Carl P. Babcock, Hung-Eil Kim +1 more | 2007-09-11 |
| 7263683 | Simplified optical proximity correction based on 1-dimension versus 2-dimension pattern shape classification | — | 2007-08-28 |
| 7207017 | Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results | Cyrus E. Tabery, Chris Haidinyak, Todd P. Lukanc, Carl P. Babcock, Hung-Eil Kim +1 more | 2007-04-17 |
| 7194725 | System and method for design rule creation and selection | Todd P. Lukanc, Cyrus E. Tabery, Carl P. Babcock, Hung-Eil Kim, Christopher A. Spence +1 more | 2007-03-20 |
| 7080349 | Method of developing optimized optical proximity correction (OPC) fragmentation script for photolithographic processing | Carl P. Babcock | 2006-07-18 |
| 7071085 | Predefined critical spaces in IC patterning to reduce line end pull back | Todd P. Lukanc, Christopher A. Spence, Joerg Reiss, Sarah N. McGowan | 2006-07-04 |