| 8924896 |
Automated design layout pattern correction based on context-aware patterns |
Lynn Wang, Vito Dai |
2014-12-30 |
$1,485,000 |
| 8918745 |
Stitch insertion for reducing color density differences in double patterning technology (DPT) |
Lynn Wang, Sriram Madhavan |
2014-12-23 |
$2,667,000 |
| 8910090 |
Methods involving pattern matching to identify and resolve potential non-double-patterning-compliant patterns in double patterning applications |
Lynn Wang, Vito Dai |
2014-12-09 |
$981,000 |
| 8898606 |
Layout pattern correction for integrated circuits |
Rani S. Abou Ghaida, Ahmed Mohyeldin, Piyush Pathak, Swamy Muddu, Vito Dai |
2014-11-25 |
$6,684,000 |
| 8589844 |
Methods for analyzing design rules |
Swamy Muddu, Abde Ali Hunaid Kagalwalla |
2013-11-19 |
$2,505,000 |
| 8555215 |
Methods for decomposing circuit design layouts and for fabricating semiconductor devices using decomposed patterns |
Yi Zou, Swamy Maddu, Lynn Wang, Vito Dai, Peng Xie |
2013-10-08 |
$4,437,000 |
| 8516407 |
Methods for quantitatively evaluating the quality of double patterning technology-compliant layouts |
Lynn Wang, Sriram Madhavan |
2013-08-20 |
$3,491,000 |
| 8418105 |
Methods for pattern matching in a double patterning technology-compliant physical design flow |
Lynn Wang, Vito Dai |
2013-04-09 |
$4,395,000 |
| 8124300 |
Method of lithographic mask correction using localized transmission adjustment |
Bhanwar Singh |
2012-02-28 |
$5,561,000 |
| 8103979 |
System for generating and optimizing mask assist features based on hybrid (model and rules) methodology |
Yi Zou |
2012-01-24 |
$3,915,000 |
| 7799517 |
Single/double dipole mask for contact holes |
— |
2010-09-21 |
$7,003,000 |
| 7757190 |
Design rules checking augmented with pattern matching |
Vito Dai, Jie Yang, Norma C. Rodriguez |
2010-07-13 |
$9,965,000 |
| 7657864 |
System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques |
Cyrus E. Tabery, Todd P. Lukanc, Chris Haidinyak, Carl P. Babcock, Hung-Eil Kim +1 more |
2010-02-02 |
$18,664,000 |
| 7543256 |
System and method for designing an integrated circuit device |
Todd P. Lukanc, Cyrus E. Tabery, Carl P. Babcock, Hung-Eil Kim, Christopher A. Spence +1 more |
2009-06-02 |
$11,563,000 |
| 7354682 |
Chromeless mask for contact holes |
— |
2008-04-08 |
$4,787,000 |
| 7313777 |
Layout verification based on probability of printing fault |
Jie Yang |
2007-12-25 |
|
| 7313769 |
Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability margin |
Todd P. Lukanc, Cyrus E. Tabery, Carl P. Babcock, Hung-Eil Kim, Christopher A. Spence +1 more |
2007-12-25 |
|
| 7310155 |
Extraction of tool independent line-edge-roughness (LER) measurements using in-line programmed LER and reliability structures |
Amit P. Marathe, Bhanwar Singh, Ramkumar Subramanian |
2007-12-18 |
$12,803,000 |
| 7305645 |
Method for manufacturing place & route based on 2-D forbidden patterns |
Bhanwar Singh, Ramkumar Subramanian |
2007-12-04 |
|
| 7269804 |
System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques |
Cyrus E. Tabery, Todd P. Lukanc, Chris Haidinyak, Carl P. Babcock, Hung-Eil Kim +1 more |
2007-09-11 |
$10,117,000 |
| 7263683 |
Simplified optical proximity correction based on 1-dimension versus 2-dimension pattern shape classification |
— |
2007-08-28 |
$7,142,000 |
| 7207017 |
Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results |
Cyrus E. Tabery, Chris Haidinyak, Todd P. Lukanc, Carl P. Babcock, Hung-Eil Kim +1 more |
2007-04-17 |
$14,172,000 |
| 7194725 |
System and method for design rule creation and selection |
Todd P. Lukanc, Cyrus E. Tabery, Carl P. Babcock, Hung-Eil Kim, Christopher A. Spence +1 more |
2007-03-20 |
$9,786,000 |
| 7080349 |
Method of developing optimized optical proximity correction (OPC) fragmentation script for photolithographic processing |
Carl P. Babcock |
2006-07-18 |
$7,111,000 |
| 7071085 |
Predefined critical spaces in IC patterning to reduce line end pull back |
Todd P. Lukanc, Christopher A. Spence, Joerg Reiss, Sarah N. McGowan |
2006-07-04 |
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