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Advanced process control framework using two-dimensional image analysis |
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System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques |
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System and method for designing an integrated circuit device |
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Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability margin |
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System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques |
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Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results |
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Method and system for determining optimum optical proximity corrections within a photolithography system |
— |
2006-01-03 |
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Method and system for determining optimum optical proximity corrections within a photolithography system |
— |
2004-11-30 |
