Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7875851 | Advanced process control framework using two-dimensional image analysis | Jason P. Cain, Bhanwar Singh | 2011-01-25 |
| 7657864 | System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques | Cyrus E. Tabery, Todd P. Lukanc, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim +1 more | 2010-02-02 |
| 7543256 | System and method for designing an integrated circuit device | Todd P. Lukanc, Cyrus E. Tabery, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim +1 more | 2009-06-02 |
| 7313769 | Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability margin | Todd P. Lukanc, Cyrus E. Tabery, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim +1 more | 2007-12-25 |
| 7269804 | System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques | Cyrus E. Tabery, Todd P. Lukanc, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim +1 more | 2007-09-11 |
| 7207017 | Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results | Cyrus E. Tabery, Todd P. Lukanc, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim +1 more | 2007-04-17 |
| 7194725 | System and method for design rule creation and selection | Todd P. Lukanc, Cyrus E. Tabery, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim +1 more | 2007-03-20 |
| 6982136 | Method and system for determining optimum optical proximity corrections within a photolithography system | — | 2006-01-03 |
| 6824937 | Method and system for determining optimum optical proximity corrections within a photolithography system | — | 2004-11-30 |