Issued Patents All Time
Showing 25 most recent of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8003545 | Method of forming an electronic device including forming features within a mask and a selective removal process | Todd P. Lukanc | 2011-08-23 |
| 7788609 | Method and apparatus for optimizing an optical proximity correction model | Eun Joo Lee, Christopher A. Spence | 2010-08-31 |
| 7657864 | System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques | Cyrus E. Tabery, Todd P. Lukanc, Chris Haidinyak, Luigi Capodieci, Carl P. Babcock +1 more | 2010-02-02 |
| 7543256 | System and method for designing an integrated circuit device | Todd P. Lukanc, Cyrus E. Tabery, Luigi Capodieci, Carl P. Babcock, Christopher A. Spence +1 more | 2009-06-02 |
| 7507661 | Method of forming narrowly spaced flash memory contact openings and lithography masks | Emmanuil H. Lingunis, Ning Cheng, Mark T. Ramsbey, Kouros Ghandehari, Anna M. Minvielle | 2009-03-24 |
| 7422828 | Mask CD measurement monitor outside of the pellicle area | — | 2008-09-09 |
| 7384725 | System and method for fabricating contact holes | Anna M. Minvielle, Cyrus E. Tabery, Jongwook Kye | 2008-06-10 |
| 7368225 | Two mask photoresist exposure pattern for dense and isolated regions | Ramkumar Subramanian, Scott A. Bell, Todd P. Lukanc, Marina V. Plat, Uzodinma Okoroanyanwu | 2008-05-06 |
| 7313769 | Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability margin | Todd P. Lukanc, Cyrus E. Tabery, Luigi Capodieci, Carl P. Babcock, Christopher A. Spence +1 more | 2007-12-25 |
| 7269804 | System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques | Cyrus E. Tabery, Todd P. Lukanc, Chris Haidinyak, Luigi Capodieci, Carl P. Babcock +1 more | 2007-09-11 |
| 7207017 | Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results | Cyrus E. Tabery, Chris Haidinyak, Todd P. Lukanc, Luigi Capodieci, Carl P. Babcock +1 more | 2007-04-17 |
| 7194725 | System and method for design rule creation and selection | Todd P. Lukanc, Cyrus E. Tabery, Luigi Capodieci, Carl P. Babcock, Christopher A. Spence +1 more | 2007-03-20 |
| 7065738 | Method of verifying an optical proximity correction (OPC) model | — | 2006-06-20 |
| 7018922 | Patterning for elongated VSS contact flash memory | Anna M. Minvielle, Christopher F. Lyons, Marina V. Plat, Ramkumar Subramanian | 2006-03-28 |
| 6900124 | Patterning for elliptical Vss contact on flash memory | Anna M. Minvielle, Christopher F. Lyons, Marina V. Plat, Ramkumar Subramanian | 2005-05-31 |
| 6811932 | Method and system for determining flow rates for contact formation | — | 2004-11-02 |
| 6593039 | Photoresist mask that combines attenuated and alternating phase shifting masks | — | 2003-07-15 |
| 6581023 | Accurate contact critical dimension measurement using variable threshold method | — | 2003-06-17 |
| 6576376 | Tri-tone mask process for dense and isolated patterns | — | 2003-06-10 |
| 6566020 | Dark field trench in an alternating phase shift mask to avoid phase conflict | — | 2003-05-20 |
| 6544699 | Method to improve accuracy of model-based optical proximity correction | Carl P. Babcock | 2003-04-08 |
| 5897975 | Phase shift mask for formation of contact holes having micro dimension | Chang Nam Ahn | 1999-04-27 |
| 5817437 | Method for detecting phase error of a phase shift mask | Chang Nam Ahn | 1998-10-06 |
| 5756235 | Phase shift mask and method for fabricating the same | — | 1998-05-26 |
| 5583069 | Method for making a fine annular charge storage electrode in a semiconductor device using a phase-shift mask | Chang Nam Ahn, Ik Boum Hur, Seung Chan Moon, Il Ho Lee | 1996-12-10 |