| 8003545 |
Method of forming an electronic device including forming features within a mask and a selective removal process |
Todd P. Lukanc |
2011-08-23 |
$939,000 |
| 7788609 |
Method and apparatus for optimizing an optical proximity correction model |
Eun Joo Lee, Christopher A. Spence |
2010-08-31 |
$5,571,000 |
| 7657864 |
System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques |
Cyrus E. Tabery, Todd P. Lukanc, Chris Haidinyak, Luigi Capodieci, Carl P. Babcock +1 more |
2010-02-02 |
$18,664,000 |
| 7543256 |
System and method for designing an integrated circuit device |
Todd P. Lukanc, Cyrus E. Tabery, Luigi Capodieci, Carl P. Babcock, Christopher A. Spence +1 more |
2009-06-02 |
$11,563,000 |
| 7507661 |
Method of forming narrowly spaced flash memory contact openings and lithography masks |
Emmanuil H. Lingunis, Ning Cheng, Mark T. Ramsbey, Kouros Ghandehari, Anna M. Minvielle |
2009-03-24 |
$384,000 |
| 7422828 |
Mask CD measurement monitor outside of the pellicle area |
— |
2008-09-09 |
$8,320,000 |
| 7384725 |
System and method for fabricating contact holes |
Anna M. Minvielle, Cyrus E. Tabery, Jongwook Kye |
2008-06-10 |
$9,127,000 |
| 7368225 |
Two mask photoresist exposure pattern for dense and isolated regions |
Ramkumar Subramanian, Scott A. Bell, Todd P. Lukanc, Marina V. Plat, Uzodinma Okoroanyanwu |
2008-05-06 |
$14,545,000 |
| 7313769 |
Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability margin |
Todd P. Lukanc, Cyrus E. Tabery, Luigi Capodieci, Carl P. Babcock, Christopher A. Spence +1 more |
2007-12-25 |
|
| 7269804 |
System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques |
Cyrus E. Tabery, Todd P. Lukanc, Chris Haidinyak, Luigi Capodieci, Carl P. Babcock +1 more |
2007-09-11 |
$10,117,000 |
| 7207017 |
Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results |
Cyrus E. Tabery, Chris Haidinyak, Todd P. Lukanc, Luigi Capodieci, Carl P. Babcock +1 more |
2007-04-17 |
$14,172,000 |
| 7194725 |
System and method for design rule creation and selection |
Todd P. Lukanc, Cyrus E. Tabery, Luigi Capodieci, Carl P. Babcock, Christopher A. Spence +1 more |
2007-03-20 |
$9,786,000 |
| 7065738 |
Method of verifying an optical proximity correction (OPC) model |
— |
2006-06-20 |
$7,818,000 |
| 7018922 |
Patterning for elongated VSS contact flash memory |
Anna M. Minvielle, Christopher F. Lyons, Marina V. Plat, Ramkumar Subramanian |
2006-03-28 |
$11,294,000 |
| 6900124 |
Patterning for elliptical Vss contact on flash memory |
Anna M. Minvielle, Christopher F. Lyons, Marina V. Plat, Ramkumar Subramanian |
2005-05-31 |
$6,268,000 |
| 6811932 |
Method and system for determining flow rates for contact formation |
— |
2004-11-02 |
$2,431,000 |
| 6593039 |
Photoresist mask that combines attenuated and alternating phase shifting masks |
— |
2003-07-15 |
$1,952,000 |
| 6581023 |
Accurate contact critical dimension measurement using variable threshold method |
— |
2003-06-17 |
$2,827,000 |
| 6576376 |
Tri-tone mask process for dense and isolated patterns |
— |
2003-06-10 |
$2,757,000 |
| 6566020 |
Dark field trench in an alternating phase shift mask to avoid phase conflict |
— |
2003-05-20 |
$2,116,000 |
| 6544699 |
Method to improve accuracy of model-based optical proximity correction |
Carl P. Babcock |
2003-04-08 |
$2,382,000 |
| 5897975 |
Phase shift mask for formation of contact holes having micro dimension |
Chang Nam Ahn |
1999-04-27 |
|
| 5817437 |
Method for detecting phase error of a phase shift mask |
Chang Nam Ahn |
1998-10-06 |
|
| 5756235 |
Phase shift mask and method for fabricating the same |
— |
1998-05-26 |
|
| 5583069 |
Method for making a fine annular charge storage electrode in a semiconductor device using a phase-shift mask |
Chang Nam Ahn, Ik Boum Hur, Seung Chan Moon, Il Ho Lee |
1996-12-10 |
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