| 8309457 |
Multilayer low reflectivity hard mask and process therefor |
Kouros Ghandehari, Anna M. Minvielle, Hirokazu Tokuno |
2012-11-13 |
$2,840,000 |
| 8048797 |
Multilayer low reflectivity hard mask and process therefor |
Kouros Ghandehari, Anna M. Minvielle, Hirokazu Tokuno |
2011-11-01 |
$1,838,000 |
| 7964905 |
Anti-reflective interpoly dielectric |
Robert B. Ogle, Mark T. Ramsbey |
2011-06-21 |
$2,620,000 |
| 7659166 |
Integration approach to form the core floating gate for flash memory using an amorphous carbon hard mask and ArF lithography |
Scott A. Bell |
2010-02-09 |
$15,199,000 |
| 7538026 |
Multilayer low reflectivity hard mask and process therefor |
Kouros Ghandehari, Anna M. Minvielle, Hirokazu Tokuno |
2009-05-26 |
$27,641,000 |
| 7427457 |
Methods for designing grating structures for use in situ scatterometry to detect photoresist defects |
Calvin T. Gabriel, Christopher F. Lyons, Anna M. Minvielle |
2008-09-23 |
$38,156,000 |
| 7368225 |
Two mask photoresist exposure pattern for dense and isolated regions |
Ramkumar Subramanian, Scott A. Bell, Todd P. Lukanc, Uzodinma Okoroanyanwu, Hung-Eil Kim |
2008-05-06 |
$14,545,000 |
| 7268066 |
Method for semiconductor gate line dimension reduction |
Douglas J. Bonser, Chih-Yuh Yang, Scott A. Bell, Srikanteswara Dakshina-Murthy, Philip A. Fisher +1 more |
2007-09-11 |
$10,117,000 |
| 7122455 |
Patterning with rigid organic under-layer |
Christopher F. Lyons, Srikanteswara Dakshina-Murthy, Scott A. Bell, Cyrus E. Tabery |
2006-10-17 |
$21,769,000 |
| 7112489 |
Negative resist or dry develop process for forming middle of line implant layer |
Christopher F. Lyons, Anna M. Minvielle |
2006-09-26 |
$43,067,000 |
| 7052921 |
System and method using in situ scatterometry to detect photoresist pattern integrity during the photolithography process |
Bhanwar Singh, Calvin T. Gabriel, Christopher F. Lyons, Scott A. Bell, Ramkumar Subramanian +1 more |
2006-05-30 |
$15,789,000 |
| 7018922 |
Patterning for elongated VSS contact flash memory |
Hung-Eil Kim, Anna M. Minvielle, Christopher F. Lyons, Ramkumar Subramanian |
2006-03-28 |
$11,294,000 |
| 7015134 |
Method for reducing anti-reflective coating layer removal during removal of photoresist |
Angela T. Hui |
2006-03-21 |
$13,217,000 |
| 7008832 |
Damascene process for a T-shaped gate electrode |
Ramkumar Subramanian, Christopher F. Lyons, Bhanwar Singh |
2006-03-07 |
$15,826,000 |
| 6913958 |
Method for patterning a feature using a trimmed hardmask |
Marilyn I. Wright, Chih-Yuh Yang, Douglas J. Bonser |
2005-07-05 |
$11,775,000 |
| 6900124 |
Patterning for elliptical Vss contact on flash memory |
Hung-Eil Kim, Anna M. Minvielle, Christopher F. Lyons, Ramkumar Subramanian |
2005-05-31 |
$6,268,000 |
| 6900002 |
Antireflective bi-layer hardmask including a densified amorphous carbon layer |
Marilyn I. Wright, Lu You, Scott A. Bell |
2005-05-31 |
$6,268,000 |
| 6869888 |
E-beam flood exposure of spin-on material to eliminate voids in vias |
Ramkumar Subramanian, Christopher F. Lyons, Bhanwar Singh |
2005-03-22 |
$6,839,000 |
| 6867097 |
Method of making a memory cell with polished insulator layer |
Mark T. Ramsbey, Robert B. Ogle, Tommy Hsiao, Angela T. Hui, Tuan Pham +1 more |
2005-03-15 |
$4,259,000 |
| 6864556 |
CVD organic polymer film for advanced gate patterning |
Lu You, Chih-Yuh Yang, Scott A. Bell, Richard J. Huang, Christopher F. Lyons +2 more |
2005-03-08 |
$6,020,000 |
| 6849530 |
Method for semiconductor gate line dimension reduction |
Douglas J. Bonser, Chih-Yuh Yang, Scott A. Bell, Srikanteswara Dakshina-Murthy, Philip A. Fisher +1 more |
2005-02-01 |
$6,992,000 |
| 6828259 |
Enhanced transistor gate using E-beam radiation |
Philip A. Fisher, Chih-Yuh Yang, Russell R.A. Callahan, Ashok M. Khathuria |
2004-12-07 |
$8,137,000 |
| 6818141 |
Application of the CVD bilayer ARC as a hard mask for definition of the subresolution trench features between polysilicon wordlines |
Kouros Ghandehari |
2004-11-16 |
$6,082,000 |
| 6803178 |
Two mask photoresist exposure pattern for dense and isolated regions |
Ramkumar Subramanian, Scott A. Bell, Todd P. Lukanc, Uzodinma Okoroanyanwu, Hung-Eli Kim |
2004-10-12 |
$4,245,000 |
| 6797552 |
Method for defect reduction and enhanced control over critical dimensions and profiles in semiconductor devices |
Mark S. Chang, Douglas J. Bonser, Chih-Yuh Yang, Scott A. Bell, Srikanteswara Dakshina-Murthy |
2004-09-28 |
$1,915,000 |
