HK

Hung-Eli Kim

AM AMD: 1 patents #5,683 of 9,279Top 65%
Overall (All Time): #3,492,518 of 4,157,543Top 85%
1
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
6803178 Two mask photoresist exposure pattern for dense and isolated regions Ramkumar Subramanian, Scott A. Bell, Todd P. Lukanc, Marina V. Plat, Uzodinma Okoroanyanwu 2004-10-12