| 12237387 |
Method of spacer formation with straight sidewall of memory cells |
Angela T. Hui, Shenqing Fang |
2025-02-25 |
|
| 10593688 |
Split-gate semiconductor device with L-shaped gate |
Chun Chen, Lei Xue, Shenqing Fang, Angela T. Hui |
2020-03-17 |
$58,440,000 |
| 10020316 |
Split-gate semiconductor device with L-shaped gate |
Chun Chen, Lei Xue, Shenqing Fang, Angela T. Hui |
2018-07-10 |
$5,897,000 |
| 9735289 |
Ion implantation-assisted etch-back process for improving spacer shape and spacer width control |
Gong Chen |
2017-08-15 |
$7,315,000 |
| 9673206 |
Buried hard mask for embedded semiconductor device patterning |
Angela T. Hui, Simon S. Chan |
2017-06-06 |
$11,420,000 |
| 9589805 |
Split-gate semiconductor device with L-shaped gate |
Chun Chen, Lei Xue, Shenqing Fang, Angela T. Hui |
2017-03-07 |
$3,144,000 |
| 9466496 |
Spacer formation with straight sidewall |
Angela T. Hui, Shenqing Fang |
2016-10-11 |
$5,640,000 |
| 9431503 |
Integrating transistors with different poly-silicon heights on the same die |
Chuan Lin, Hidehiko Shiraiwa, Bradley Marc Davis, Lei Xue, Simon S. Chan +2 more |
2016-08-30 |
$6,776,000 |
| 9318498 |
Buried hard mask for embedded semiconductor device patterning |
Angela T. Hui, Simon S. Chan |
2016-04-19 |
$2,645,000 |
| 9252221 |
Formation of gate sidewall structure |
Rinji Sugino, Chun Chen, Shenging Fang |
2016-02-02 |
$2,750,000 |
| 8901720 |
Method for forming narrow structures in a semiconductor device |
Michael Brennan |
2014-12-02 |
|
| 8815727 |
Integrated circuit with metal and semi-conducting gate |
Angela T. Hui, Mark S. Chang, Kuo-Tung Chang |
2014-08-26 |
|
| 8652907 |
Integrating transistors with different poly-silicon heights on the same die |
Chuan Lin, Hidehiko Shiraiwa, Bradley Marc Davis, Lei Xue, Simon S. Chan +2 more |
2014-02-18 |
$2,278,000 |
| 8629535 |
Mask for forming integrated circuit |
Richard J. Huang, Srikanteswara Dakshina-Murthy, Philip A. Fisher, Richard Nguyen, Cyrus E. Tabery +1 more |
2014-01-14 |
$18,205,000 |
| 8384146 |
Methods for forming a memory cell having a top oxide spacer |
Shenqing Fang, Angela T. Hui, Gang Xue, Alexander H. Nickel, Kashmir Sahota +2 more |
2013-02-26 |
$1,815,000 |
| 8283718 |
Integrated circuit system with metal and semi-conducting gate |
Angela T. Hui, Mark S. Chang, Kuo-Tung Chang |
2012-10-09 |
|
| 8202779 |
Methods for forming a memory cell having a top oxide spacer |
Shenqing Fang, Angela T. Hui, Gang Xue, Alexander H. Nickel, Kashmir Sahota +2 more |
2012-06-19 |
$1,687,000 |
| 7928005 |
Method for forming narrow structures in a semiconductor device |
Michael Brennan |
2011-04-19 |
|
| 7675104 |
Integrated circuit memory system employing silicon rich layers |
Amol Joshi, Harpreet Sachar, Youseok Suh, Shenqing Fang, Chih-Yuh Yang +6 more |
2010-03-09 |
$42,003,000 |
| 7659166 |
Integration approach to form the core floating gate for flash memory using an amorphous carbon hard mask and ArF lithography |
Marina V. Plat |
2010-02-09 |
$15,199,000 |
| 7521304 |
Method for forming integrated circuit |
Richard J. Huang, Srikanteswara Dakshina-Murthy, Philip A. Fisher, Richard Nguyen, Cyrus E. Tabery +1 more |
2009-04-21 |
$10,235,000 |
| 7498222 |
Enhanced etching of a high dielectric constant layer |
John Foster, Allison Holbrook, Simon S. Chan, Phillip Jones |
2009-03-03 |
|
| 7465644 |
Isolation region bird's beak suppression |
Simon S. Chan, Weidong Qian, Phillip Jones, Allison Holbrook |
2008-12-16 |
|
| 7368225 |
Two mask photoresist exposure pattern for dense and isolated regions |
Ramkumar Subramanian, Todd P. Lukanc, Marina V. Plat, Uzodinma Okoroanyanwu, Hung-Eil Kim |
2008-05-06 |
$14,545,000 |
| 7361588 |
Etch process for CD reduction of arc material |
Phillip Jones, Mark S. Chang |
2008-04-22 |
$9,226,000 |
