Issued Patents All Time
Showing 25 most recent of 72 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9274410 | Method and system for automated generation of masks for spacer formation from a desired final wafer pattern | Wai Lo, Christie R. K. Marrian | 2016-03-01 |
| 9064078 | Methods and systems for designing and manufacturing optical lithography masks | Piyush Verma | 2015-06-23 |
| 8975195 | Methods for optical proximity correction in the design and fabrication of integrated circuits | Christopher Heinz Clifford, Tamer Coskun | 2015-03-10 |
| 8003545 | Method of forming an electronic device including forming features within a mask and a selective removal process | Hung-Eil Kim | 2011-08-23 |
| 7657864 | System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques | Cyrus E. Tabery, Chris Haidinyak, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim +1 more | 2010-02-02 |
| 7543256 | System and method for designing an integrated circuit device | Cyrus E. Tabery, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim, Christopher A. Spence +1 more | 2009-06-02 |
| 7487492 | Method for increasing manufacturability of a circuit layout | Ajay Singhal | 2009-02-03 |
| 7368225 | Two mask photoresist exposure pattern for dense and isolated regions | Ramkumar Subramanian, Scott A. Bell, Marina V. Plat, Uzodinma Okoroanyanwu, Hung-Eil Kim | 2008-05-06 |
| 7313769 | Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability margin | Cyrus E. Tabery, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim, Christopher A. Spence +1 more | 2007-12-25 |
| 7269804 | System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques | Cyrus E. Tabery, Chris Haidinyak, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim +1 more | 2007-09-11 |
| 7207017 | Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results | Cyrus E. Tabery, Chris Haidinyak, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim +1 more | 2007-04-17 |
| 7194725 | System and method for design rule creation and selection | Cyrus E. Tabery, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim, Christopher A. Spence +1 more | 2007-03-20 |
| 7108946 | Method of lithographic image alignment for use with a dual mask exposure technique | Sarah N. McGowan, Bhanwar Singh, Joerg Reiss | 2006-09-19 |
| 7076750 | Method and apparatus for generating trenches for vias | — | 2006-07-11 |
| 7071085 | Predefined critical spaces in IC patterning to reduce line end pull back | Luigi Capodieci, Christopher A. Spence, Joerg Reiss, Sarah N. McGowan | 2006-07-04 |
| 7027130 | Device and method for determining an illumination intensity profile of an illuminator for a lithography system | Christopher A. Spence, Luigi Capodieci, Joerg Reiss, Sarah N. McGowan | 2006-04-11 |
| 7015148 | Reduce line end pull back by exposing and etching space after mask one trim and etch | Luigi Capodieci, Christopher A. Spence, Joerg Reiss, Sarah N. McGowan | 2006-03-21 |
| 6995433 | Microdevice having non-linear structural component and method of fabrication | Sarah N. McGowan, Luigi Capodieci, Bhanwar Singh, Joerg Reiss | 2006-02-07 |
| 6974652 | Lithographic photomask and method of manufacture to improve photomask test measurement | Luigi Capodieci, Bhanwar Singh, Christopher A. Spence | 2005-12-13 |
| 6818358 | Method of extending the areas of clear field phase shift generation | Christopher A. Spence | 2004-11-16 |
| 6803178 | Two mask photoresist exposure pattern for dense and isolated regions | Ramkumar Subramanian, Scott A. Bell, Marina V. Plat, Uzodinma Okoroanyanwu, Hung-Eli Kim | 2004-10-12 |
| 6797438 | Method and enhancing clear field phase shift masks with border around edges of phase regions | Christopher A. Spence | 2004-09-28 |
| 6768204 | Self-aligned conductive plugs in a semiconductor device | Fei Wang, Darrell M. Erb | 2004-07-27 |
| 6753266 | Method of enhancing gate patterning properties with reflective hard mask | Scott A. Bell, Christopher F. Lyons, Marina V. Plat, Ramkumar Subramanian | 2004-06-22 |
| 6749971 | Method of enhancing clear field phase shift masks with chrome border around phase 180 regions | Christopher A. Spence | 2004-06-15 |