| 9274410 |
Method and system for automated generation of masks for spacer formation from a desired final wafer pattern |
Wai Lo, Christie R. K. Marrian |
2016-03-01 |
$10,348,000 |
| 9064078 |
Methods and systems for designing and manufacturing optical lithography masks |
Piyush Verma |
2015-06-23 |
$1,346,000 |
| 8975195 |
Methods for optical proximity correction in the design and fabrication of integrated circuits |
Christopher Heinz Clifford, Tamer Coskun |
2015-03-10 |
$1,941,000 |
| 8003545 |
Method of forming an electronic device including forming features within a mask and a selective removal process |
Hung-Eil Kim |
2011-08-23 |
$939,000 |
| 7657864 |
System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques |
Cyrus E. Tabery, Chris Haidinyak, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim +1 more |
2010-02-02 |
$18,664,000 |
| 7543256 |
System and method for designing an integrated circuit device |
Cyrus E. Tabery, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim, Christopher A. Spence +1 more |
2009-06-02 |
$11,563,000 |
| 7487492 |
Method for increasing manufacturability of a circuit layout |
Ajay Singhal |
2009-02-03 |
$11,769,000 |
| 7368225 |
Two mask photoresist exposure pattern for dense and isolated regions |
Ramkumar Subramanian, Scott A. Bell, Marina V. Plat, Uzodinma Okoroanyanwu, Hung-Eil Kim |
2008-05-06 |
$14,545,000 |
| 7313769 |
Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability margin |
Cyrus E. Tabery, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim, Christopher A. Spence +1 more |
2007-12-25 |
|
| 7269804 |
System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques |
Cyrus E. Tabery, Chris Haidinyak, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim +1 more |
2007-09-11 |
$10,117,000 |
| 7207017 |
Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results |
Cyrus E. Tabery, Chris Haidinyak, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim +1 more |
2007-04-17 |
$14,172,000 |
| 7194725 |
System and method for design rule creation and selection |
Cyrus E. Tabery, Luigi Capodieci, Carl P. Babcock, Hung-Eil Kim, Christopher A. Spence +1 more |
2007-03-20 |
$9,786,000 |
| 7108946 |
Method of lithographic image alignment for use with a dual mask exposure technique |
Sarah N. McGowan, Bhanwar Singh, Joerg Reiss |
2006-09-19 |
$35,691,000 |
| 7076750 |
Method and apparatus for generating trenches for vias |
— |
2006-07-11 |
$11,570,000 |
| 7071085 |
Predefined critical spaces in IC patterning to reduce line end pull back |
Luigi Capodieci, Christopher A. Spence, Joerg Reiss, Sarah N. McGowan |
2006-07-04 |
|
| 7027130 |
Device and method for determining an illumination intensity profile of an illuminator for a lithography system |
Christopher A. Spence, Luigi Capodieci, Joerg Reiss, Sarah N. McGowan |
2006-04-11 |
$9,016,000 |
| 7015148 |
Reduce line end pull back by exposing and etching space after mask one trim and etch |
Luigi Capodieci, Christopher A. Spence, Joerg Reiss, Sarah N. McGowan |
2006-03-21 |
$13,217,000 |
| 6995433 |
Microdevice having non-linear structural component and method of fabrication |
Sarah N. McGowan, Luigi Capodieci, Bhanwar Singh, Joerg Reiss |
2006-02-07 |
$12,481,000 |
| 6974652 |
Lithographic photomask and method of manufacture to improve photomask test measurement |
Luigi Capodieci, Bhanwar Singh, Christopher A. Spence |
2005-12-13 |
$8,414,000 |
| 6818358 |
Method of extending the areas of clear field phase shift generation |
Christopher A. Spence |
2004-11-16 |
$6,082,000 |
| 6803178 |
Two mask photoresist exposure pattern for dense and isolated regions |
Ramkumar Subramanian, Scott A. Bell, Marina V. Plat, Uzodinma Okoroanyanwu, Hung-Eli Kim |
2004-10-12 |
$4,245,000 |
| 6797438 |
Method and enhancing clear field phase shift masks with border around edges of phase regions |
Christopher A. Spence |
2004-09-28 |
$1,915,000 |
| 6768204 |
Self-aligned conductive plugs in a semiconductor device |
Fei Wang, Darrell M. Erb |
2004-07-27 |
$2,306,000 |
| 6753266 |
Method of enhancing gate patterning properties with reflective hard mask |
Scott A. Bell, Christopher F. Lyons, Marina V. Plat, Ramkumar Subramanian |
2004-06-22 |
$4,162,000 |
| 6749971 |
Method of enhancing clear field phase shift masks with chrome border around phase 180 regions |
Christopher A. Spence |
2004-06-15 |
$4,556,000 |
