Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10147877 | Method of forming controllably conductive oxide | Matthew S. Buynoski, Seungmoo Choi, Chakravarthy Gopalan, Dongxiang Liao | 2018-12-04 |
| 9461247 | Method of forming controllably conductive oxide | Matthew S. Buynoski, Seungmoo Choi, Chakravarthy Gopalan, Dongxiang Liao | 2016-10-04 |
| 9274410 | Method and system for automated generation of masks for spacer formation from a desired final wafer pattern | Wai Lo, Todd P. Lukanc | 2016-03-01 |
| 8946020 | Method of forming controllably conductive oxide | Matthew S. Buynoski, Seungmoo Choi, Chakravarthy Gopalan, Dongxiang Liao | 2015-02-03 |
| 7682866 | Non-planarized, self-aligned, non-volatile phase-change memory array and method of formation | Mark Whitney Hart, Gary M. McClelland, Charles Thomas Rettner, Hemantha K. Wickramasinghe | 2010-03-23 |
| 7038231 | Non-planarized, self-aligned, non-volatile phase-change memory array and method of formation | Mark Whitney Hart, Gary M. McClelland, Charles Thomas Rettner, Hermantha K. Wickramasinghe | 2006-05-02 |
| 7038204 | Method for reducing proximity effects in electron beam lithography | Charles Thomas Rettner | 2006-05-02 |
| 7009694 | Indirect switching and sensing of phase change memory cells | Mark Whitney Hart, Chung H. Lam, Gary M. McClelland, Simone Raoux, Charles Thomas Rettner +1 more | 2006-03-07 |
| 6392242 | Fiducial beam position monitor | F. Keith Perkins, Daniel McCarthy, Martin C. Peckerar, Eric S. Snow | 2002-05-21 |
| 6017658 | Lithographic mask and method for fabrication thereof | Kee W. Rhee, Martin C. Peckerar, Elizabeth Dobisz | 2000-01-25 |
| 5825040 | Bright beam method for super-resolution in e-beam lithography | Martin C. Peckerar | 1998-10-20 |
| 5703373 | Alignment fiducial for improving patterning placement accuracy in e-beam masks for x-ray lithography | Martin C. Peckerar | 1997-12-30 |
| 5575888 | Sidewall passivation by oxidation during refractory-metal plasma etching | John Kosakowski, William Chu, Kelly W. Foster, Martin C. Peckerar | 1996-11-19 |
| 5504338 | Apparatus and method using low-voltage and/or low-current scanning probe lithography | Eric S. Snow, Elizabeth Dobisz | 1996-04-02 |
| 5336892 | Method and system for electron beam lithography | Elizabeth Dobisz, Martin C. Peckerar, Kee W. Rhee | 1994-08-09 |
| 5171608 | Method of pattern transfer in photolithography using laser induced metallization | Richard F. Greene, Joseph Zahavi, Pehr E. Pehrsson | 1992-12-15 |
| 5113367 | Cross entropy deconvolver circuit adaptable to changing convolution functions | Martin C. Peckerar | 1992-05-12 |
| 5079600 | High resolution patterning on solid substrates | Joel M. Schnur, Paul E. Schoen, Martin C. Peckerar, Jeffrey M. Calvert, Jacque H. Georger, Jr. | 1992-01-07 |
| 5077085 | High resolution metal patterning of ultra-thin films on solid substrates | Joel M. Schnur, Paul E. Schoen, Martin C. Peckerar, Jeffrey M. Calvert, Jacque H. Georger, Jr. | 1991-12-31 |
| 4849925 | Maximum entropy deconvolver circuit based on neural net principles | Martin C. Peckerar | 1989-07-18 |
| 4492866 | Method for predicting the performance of cathode materials | George A. Haas, Arnold Shih | 1985-01-08 |