Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11888839 | Continuous authentication through orchestration and risk calculation post-authentication system and method | Shahrokh Shahidzadeh, Nadal Shahidzadeh, Haitham Akkary, Seyedamir Karimikho | 2024-01-30 |
| 11699017 | Die yield assessment based on pattern-failure rate simulation | Young-Chang Kim, John L. Sturtevant, Andrew Burbine | 2023-07-11 |
| 11552940 | System and method for continuous authentication of user entity identity using context and behavior for real-time modeling and anomaly detection | Shahrokh Shahidzadeh, Nahal Shahidzadeh, Haitham Akkary, Seyedamir Karimikho | 2023-01-10 |
| 11023644 | Optical proximity correction modeling with density-based gauge weighting | Germain Louis Fenger, Andrew Burbine | 2021-06-01 |
| 10951606 | Continuous authentication through orchestration and risk calculation post-authorization system and method | Shahrokh Shahidzadeh, Nahal Shahidzadeh, Haitham Akkary, Seyedamir Karimikho | 2021-03-16 |
| 10496780 | Dynamic model generation for lithographic simulation | Michael C. Lam, Germain Louis Fenger, Ananthan Raghunathan, Konstantinos Adam | 2019-12-03 |
| 8975195 | Methods for optical proximity correction in the design and fabrication of integrated circuits | Todd P. Lukanc, Tamer Coskun | 2015-03-10 |
| 8775981 | Correcting for overexposure due to overlapping exposures in lithography | — | 2014-07-08 |
| 8739098 | EUV mask defect reconstruction and compensation repair | Fan Jiang, Pawitter Mangat | 2014-05-27 |
| 8612903 | Technique for repairing a reflective photo-mask | Linyong Pang | 2013-12-17 |
| 8555214 | Technique for analyzing a reflective photo-mask | — | 2013-10-08 |