Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11699017 | Die yield assessment based on pattern-failure rate simulation | Young-Chang Kim, Andrew Burbine, Christopher Heinz Clifford | 2023-07-11 |
| 11270054 | Method and system for calculating printed area metric indicative of stochastic variations of the lithographic process | Hyejin Jin, Shumay D. Shang, Azat Latypov, Germain Louis Fenger, Gurdaman Khaira | 2022-03-08 |
| 11061373 | Method and system for calculating probability of success or failure for a lithographic process due to stochastic variations of the lithographic process | Gurdaman Khaira, Germain Louis Fenger, Azat Latypov, Yuri Granik | 2021-07-13 |
| 10445452 | Simulation-assisted wafer rework determination | Shumay D. Shang, Konstantinos Adam | 2019-10-15 |
| 8607168 | Contour alignment for model calibration | Ir Kusnadi, Thuy Q Do, Yuri Granik | 2013-12-10 |
| 7349752 | Dynamically coupled metrology and lithography | Yiming Gu | 2008-03-25 |
| 6913872 | Dual-wavelength exposure for reduction of implant shadowing | Yiming Gu, Dyiann Chou, Chantha Lom | 2005-07-05 |
| 6797456 | Dual-layer deep ultraviolet photoresist process and structure | Yiming Gu, Anging Zhang | 2004-09-28 |
| 6733936 | Method for generating a swing curve and photoresist feature formed using swing curve | Yiming Gu | 2004-05-11 |
| 5516608 | Method for controlling a line dimension arising in photolithographic processes | Philip Charles Danby Hobbs, Steven J. Holmes, Robert Jackson, Jerry Shaw, Theodore G. van Kessel | 1996-05-14 |