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Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
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John L. Sturtevant — 10 Patents

ITIntegrated Device Technology: 4 patents #156 of 758Top 25%
SSSiemens Industry Software: 3 patents #27 of 391Top 7%
MGMentor Graphics: 2 patents #191 of 698Top 30%
IBM: 1 patents #44,878 of 70,183Top 65%
Portland, OR: #1,745 of 9,213 inventorsTop 20%
Oregon: #4,318 of 28,073 inventorsTop 20%
Overall (All Time): #481,000 of 4,157,543Top 15%
10 Patents All Time
John L. Sturtevant has been granted 10 US patents while listed as an inventor at Integrated Device Technology. The first was granted in 1996 and the most recent in July 2023. John L. Sturtevant ranks #481,000 of 4,157,543 US inventors in our database (top 11.6%). Patent records list John L. Sturtevant in Portland, OR, US.

Patents per Year

Patents granted per year, 1996 to 2023Bar chart with a peak of 2 patents in 2004.peak 21996: 1 patents19962004: 2 patents20042005: 1 patents20052008: 1 patents20082013: 1 patents20132019: 1 patents20192021: 1 patents20212022: 1 patents20222023: 1 patents2023

Issued Patents All Time

Showing 1–10 of 10 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
11699017 Die yield assessment based on pattern-failure rate simulation Young-Chang Kim, Andrew Burbine, Christopher Heinz Clifford 2023-07-11
11270054 Method and system for calculating printed area metric indicative of stochastic variations of the lithographic process Hyejin Jin, Shumay D. Shang, Azat Latypov, Germain Louis Fenger, Gurdaman Khaira 2022-03-08
11061373 Method and system for calculating probability of success or failure for a lithographic process due to stochastic variations of the lithographic process Gurdaman Khaira, Germain Louis Fenger, Azat Latypov, Yuri Granik 2021-07-13
10445452 Simulation-assisted wafer rework determination Shumay D. Shang, Konstantinos Adam 2019-10-15
8607168 Contour alignment for model calibration Ir Kusnadi, Thuy Q Do, Yuri Granik 2013-12-10 $5,152,000
7349752 Dynamically coupled metrology and lithography Yiming Gu 2008-03-25 $10,747,000
6913872 Dual-wavelength exposure for reduction of implant shadowing Yiming Gu, Dyiann Chou, Chantha Lom 2005-07-05 $10,718,000
6797456 Dual-layer deep ultraviolet photoresist process and structure Yiming Gu, Anging Zhang 2004-09-28 $3,904,000
6733936 Method for generating a swing curve and photoresist feature formed using swing curve Yiming Gu 2004-05-11 $16,137,000
5516608 Method for controlling a line dimension arising in photolithographic processes Philip Charles Danby Hobbs, Steven J. Holmes, Robert Jackson, Jerry Shaw, Theodore G. van Kessel 1996-05-14 $11,662,000