Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11975726 | Systems and methods for interaction-based trajectory prediction | Galen Clark Haynes, Anh-Tuan Hoang, Sumit Kumar, Micol Marchetti-Bowick | 2024-05-07 |
| 11891087 | Systems and methods for generating behavioral predictions in reaction to autonomous vehicle movement | Micol Marchetti-Bowick | 2024-02-06 |
| 10424654 | Power device with high aspect ratio trench contacts and submicron pitches between trenches | Wenjun Li, Paul Thorup, Hong Chang, Yeeheng Lee, Yang Xiang +2 more | 2019-09-24 |
| 10020380 | Power device with high aspect ratio trench contacts and submicron pitches between trenches | Wenjun Li, Paul Thorup, Hong Chang, Yeeheng Lee, Yang Xiang +2 more | 2018-07-10 |
| 9865694 | Split-gate trench power mosfet with protected shield oxide | Yeeheng Lee, Lingpeng Guan, Hongyong Xue, Yang Xiang, Terence Huang +6 more | 2018-01-09 |
| 9741808 | Split-gate trench power MOSFET with protected shield oxide | Yeeheng Lee, Lingpeng Guan, Hongyong Xue, Yang Xiang, Terence Huang +6 more | 2017-08-22 |
| 9679822 | Method for monitoring epitaxial growth geometry shift | Boxiu Cai, Lingbing Chen | 2017-06-13 |
| 9421567 | Recycle photochemical to reduce cost of material and environmental impact | Winston Wu | 2016-08-23 |
| 9323163 | Cylindrical reticle system, exposure apparatus and exposure method | Qiang Wu | 2016-04-26 |
| 9298099 | Exposure apparatus and exposure method thereof | Qiang Wu, Yanlei Zu, Huayong Hu | 2016-03-29 |
| 9281368 | Split-gate trench power MOSFET with protected shield oxide | Yeeheng Lee, Lingpeng Guan, Hongyong Xue, Yang Xiang, Terence Huang +6 more | 2016-03-08 |
| 9223229 | Exposure device and exposure method | Qiang Wu, Jing'an Hao, Chang-Miao Liu, Xin Yao, Tianhui Li +1 more | 2015-12-29 |
| 9134624 | Lithography machine and scanning and exposing method thereof | Qiang Wu, Jing'an Hao, Chang-Miao Liu, Xin Yao, Tianhui Li +1 more | 2015-09-15 |
| 9081149 | Method, optical module and auto-focusing system for wafer edge exposure | Qiang Wu | 2015-07-14 |
| 9070557 | Method of forming double pattern in a structure | Daniel Hu, Ken Wu | 2015-06-30 |
| 8982314 | Photolithographic apparatus | Qiang Wu | 2015-03-17 |
| 8853093 | Method for forming double patterned structure | Daniel Hu, Ken Wu | 2014-10-07 |
| 8304317 | Gate line edge roughness reduction by using 2P/2E process together with high temperature bake | James Walter Blatchford | 2012-11-06 |
| 7349752 | Dynamically coupled metrology and lithography | John L. Sturtevant | 2008-03-25 |
| 7235336 | Method for determining photoresist thickness and structure formed using determined photoresist thickness | — | 2007-06-26 |
| 7129149 | Method for forming shallow trench isolation structure with anti-reflective liner | Chih-Hsiang Chen, Guo-Qiang Lo | 2006-10-31 |
| 6913872 | Dual-wavelength exposure for reduction of implant shadowing | John L. Sturtevant, Dyiann Chou, Chantha Lom | 2005-07-05 |
| 6797456 | Dual-layer deep ultraviolet photoresist process and structure | John L. Sturtevant, Anging Zhang | 2004-09-28 |
| 6733936 | Method for generating a swing curve and photoresist feature formed using swing curve | John L. Sturtevant | 2004-05-11 |