Issued Patents All Time
Showing 1–25 of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11270054 | Method and system for calculating printed area metric indicative of stochastic variations of the lithographic process | Hyejin Jin, John L. Sturtevant, Shumay D. Shang, Germain Louis Fenger, Gurdaman Khaira | 2022-03-08 |
| 11061373 | Method and system for calculating probability of success or failure for a lithographic process due to stochastic variations of the lithographic process | Gurdaman Khaira, Germain Louis Fenger, John L. Sturtevant, Yuri Granik | 2021-07-13 |
| 10153162 | Shrink process aware assist features | Ryan Ryoung-Han Kim, Wenhui Wang, Tamer Coskun, Lei Sun | 2018-12-11 |
| 9530662 | Methods for fabricating integrated circuits using directed self-assembly including a substantially periodic array of topographical features that includes etch resistant topographical features for transferability control | Tamer Coskun, Moshe E. Preil | 2016-12-27 |
| 9305800 | Methods for fabricating integrated circuits using directed self-assembly including lithographically-printable assist features | Tamer Coskun, Wei-Long Wang, Yi Zou | 2016-04-05 |
| 9305834 | Methods for fabricating integrated circuits using designs of integrated circuits adapted to directed self-assembly fabrication to form via and contact structures | Ji Xu | 2016-04-05 |
| 9286434 | Methods for fabricating integrated circuits including generating photomasks for directed self-assembly (DSA) using DSA target patterns | Yi Zou, Wei-Long Wang, Tamer Coskun | 2016-03-15 |
| 9208275 | Methods for fabricating integrated circuits including generating photomasks for directed self-assembly | Wei-Long Wang, Yi Zou, Tamer Coskun | 2015-12-08 |
| 9170501 | Methods for fabricating integrated circuits including generating photomasks for directed self-assembly | Yi Zou, Vito Dai | 2015-10-27 |
| 9053923 | Methods for fabricating integrated circuits including topographical features for directed self-assembly | Edward Teoh Kah Ching, He Yi | 2015-06-09 |
| 9023730 | Methods for fabricating integrated circuits including generating e-beam patterns for directed self-assembly | Yi Zou, Vito Dai | 2015-05-05 |
| 9009634 | Methods for fabricating integrated circuits including generating photomasks for directed self-assembly | Yi Zou, Vito Dai | 2015-04-14 |
| 8856698 | Method and apparatus for providing metric relating two or more process parameters to yield | — | 2014-10-07 |
| 8667428 | Methods for directed self-assembly process/proximity correction | — | 2014-03-04 |
| 8667430 | Methods for directed self-assembly process/proximity correction | — | 2014-03-04 |
| 8089038 | Reticle image generation using polarizers and metamaterial filters | — | 2012-01-03 |
| 7889411 | System and method for calculating aerial image of a spatial light modulator | — | 2011-02-15 |
| 7826142 | Method for improved optical design using deterministically defined surfaces | Nora-Jean Harned, Richard Gontin, Robert D. Harned, Stanislav Smirnov | 2010-11-02 |
| 7777861 | Methods, systems, and computer program products for printing patterns on photosensitive surfaces | Karel Diederick Van Der Mast | 2010-08-17 |
| 7773199 | Methods and systems to compensate for a stitching disturbance of a printed pattern | Arno Jan Bleeker, Wenceslao A. Cebuhar, Justin Kreuzer, Yuli Vladimirsky | 2010-08-10 |
| 7773287 | Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation | Kars Troost, Johannes Jacobus Matheus Baselmans | 2010-08-10 |
| 7768653 | Method and system for wavefront measurements of an optical system | Sherman K. Poultney, Yuli Vladimirsky | 2010-08-03 |
| 7713667 | System and method for generating pattern data used to control a pattern generator | Arno Jan Bleeker, Jang Fung Chen, Kars Zeger Troost | 2010-05-11 |
| 7688423 | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones | Arno Jan Bleeker, Wenceslao A. Cebuhar | 2010-03-30 |
| 7630054 | Methods and systems to compensate for a stitching disturbance of a printed pattern | Arno Jan Bleeker, Wenceslao A. Cebuhar, Justin Kreuzer, Yuli Vladimirsky | 2009-12-08 |