Issued Patents All Time
Showing 1–25 of 50 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11024481 | Scanning electron microscope | Adrianus Franciscus Johannes Hammen, Wilhelmus Henrica Cornelis Theuws, Sander Richard Marie Stoks | 2021-06-01 |
| 10796879 | Scanning electron microscope | Adrianus Franciscus Johannes Hammen, Wilhelmus Henrica Cornelis Theuws, Sander Richard Marie Stoks | 2020-10-06 |
| 10580613 | Sample stage | Gerhardus Bernardus Stamsnijder, Paul Cornelis Maria van den Bos, Ton Antonius Cornelis Henricus Kluijtmans, Sander Richard Marie Stoks, Adrianus Franciscus Johannes Hammen | 2020-03-03 |
| 9610727 | Imprint lithography | Yvonne Wendela Kruijt-Stegeman, Johan Frederik Dijksman, Aleksey Yurievich Kolesnychenko, Klaus Simon, Raymond Jacobus Wilhelmus Knaapen +2 more | 2017-04-04 |
| 8848195 | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a property of a substrate | Christian Marinus Leewis, Marcus Adrianus Van De Kerkhof, Peter Clement Paul Vanoppen, Ruben Alvarez Sanchez | 2014-09-30 |
| 8753557 | Imprint lithography | Yvonne Wendela Kruijt-Stegeman, Johan Frederik Dijksman, Aleksey Yurievich Kolesnychenko, Klaus Simon, Raymond Jacobus Wilhelmus Knaapen +2 more | 2014-06-17 |
| 8363220 | Method of determining overlay error and a device manufacturing method | Willem Marie Julia Marcel Coene, Maurits Van Der Schaar | 2013-01-29 |
| 8100684 | Imprint lithography | Yvonne Wendela Kruijt-Stegeman, Johan Frederik Dijksman, Aleksey Yurievich Kolesnychenko, Klaus Simon, Raymond Jacobus Wilhelmus Knaapen +2 more | 2012-01-24 |
| 7961309 | Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate | Reinder Teun Plug, Arie Jeffrey Den Boef | 2011-06-14 |
| 7878791 | Imprint lithography | Klaus Simon, Johan Frederik Dijksman | 2011-02-01 |
| 7777861 | Methods, systems, and computer program products for printing patterns on photosensitive surfaces | Azat Latypov | 2010-08-17 |
| 7656518 | Method of measuring asymmetry in a scatterometer, a method of measuring an overlay error in a substrate and a metrology apparatus | Arie Jeffrey Den Boef, Maurits Van Der Schaar | 2010-02-02 |
| 7586598 | Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate | Reinder Teun Plug, Arie Jeffrey Den Boef | 2009-09-08 |
| 7517211 | Imprint lithography | Yvonne Wendela Kruijt-Stegeman, Raymond Jacobus Wilhelmus Knaapen, Johan Frederik Dijksman, Krassimir Todorov Krastev, Sander Frederik Wuister +2 more | 2009-04-14 |
| 7502103 | Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate | Reinder Teun Plug, Arie Jeffrey Den Boef | 2009-03-10 |
| 7500218 | Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using same | Kars Zeger Troost, Johannes Jacobus Matheus Baselmans | 2009-03-03 |
| 7403266 | Maskless lithography systems and methods utilizing spatial light modulator arrays | Arno Jan Bleeker, Wenceslao A. Cebuhar, Jason Hintersteiner, Andrew W. McCullough, Solomon Wasserman | 2008-07-22 |
| 7379579 | Imaging apparatus | Arno Jan Bleeker | 2008-05-27 |
| 7349068 | Lithographic apparatus and device manufacturing method | Kars Zeger Troost | 2008-03-25 |
| 7259831 | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation | Azat Latypov | 2007-08-21 |
| 7167231 | Method and apparatus for printing large data flows | Anders Thuren, Arno Jan Bleeker | 2007-01-23 |
| 7116403 | Lithographic apparatus and device manufacturing method | Kars Zeger Troost | 2006-10-03 |
| 7102732 | Method of manufacturing a device by employing a lithographic apparatus including a sliding electron-optical element | Pieter Willem Herman De Jager, Pieter Kruit, Arno Jan Bleeker | 2006-09-05 |
| 7046413 | System and method for dose control in a lithographic system | Jason Hintersteiner, Arno Jan Bleeker | 2006-05-16 |
| 7023526 | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation | Azat Latypov | 2006-04-04 |