Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10871716 | Metrology robustness based on through-wavelength similarity | Miguel GARCIA GRANDA, Frank Staals | 2020-12-22 |
| 10394132 | Metrology robustness based on through-wavelength similarity | Miguel GARCIA GRANDA, Frank Staals | 2019-08-27 |
| 9939735 | Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method | Paul Christiaan Hinnen, Shu-jin Wang, Kuo-Feng PAO | 2018-04-10 |
| 9594299 | Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method | Paul Christiaan Hinnen, Shu-jin Wang, Kuo-Feng PAO | 2017-03-14 |
| 9436099 | Lithographic focus and dose measurement using a 2-D target | Hugo Augustinus Joseph Cramer, Marcus Adrianus Van De Kerkhof, Johannes Anna Quaedackers, Christine Corinne Mattheus | 2016-09-06 |
| 8982328 | Method and apparatus for overlay measurement | Henricus Johannes Lambertus Megens, Johannes Anna Quaedackers, Peter Clement Paul Vanoppen | 2015-03-17 |
| 8891061 | Lithographic focus and dose measurement using a 2-D target | Hugo Augustinus Joseph Cramer, Marcus Adrianus Van De Kerkhof, Johannes Anna Quaedackers, Christine Corinne Mattheus | 2014-11-18 |
| 8848195 | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a property of a substrate | Marcus Adrianus Van De Kerkhof, Karel Diederick Van Der Mast, Peter Clement Paul Vanoppen, Ruben Alvarez Sanchez | 2014-09-30 |
| 8685626 | Method of measuring a characteristic | Johannes Anna Quaedackers, Paul Christiaan Hinnen, Antoine Gaston Marie Kiers | 2014-04-01 |
| 8502955 | Method of determining a characteristic | Henricus Johannes Lambertus Megens, Johannes Anna Quaedackers, Peter Clement Paul Vanoppen | 2013-08-06 |