Issued Patents All Time
Showing 25 most recent of 57 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12346031 | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method | Fei Liu, Jin LIAN, Zhuangxiong HUANG, Laurentius Cornelius De Winter | 2025-07-01 |
| 12287582 | Method for controlling a lithographic apparatus and associated apparatuses | Simon Hendrik Celine Van Gorp | 2025-04-29 |
| 12197136 | Method of determining control parameters of a device manufacturing process | Wim Tjibbo Tel, Mark John Maslow, Koenraad VAN INGEN SCHENAU, Patrick Warnaar, Abraham SLACHTER +3 more | 2025-01-14 |
| 12112260 | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate | Lorenzo Tripodi, Patrick Warnaar, Grzegorz Grzela, Mohammadreza Hajiahmadi, Farzad Farhadzadeh +5 more | 2024-10-08 |
| 12050406 | Method for controlling a lithographic apparatus and associated apparatuses | — | 2024-07-30 |
| 11977334 | Wavefront optimization for tuning scanner based on performance matching | Duan-Fu Stephen Hsu, Christoph Rene Konrad Cebulla Hennerkes, Rafael C. Howell, Zhan Shi, Xiaoyang Li | 2024-05-07 |
| 11768442 | Method of determining control parameters of a device manufacturing process | Wim Tjibbo Tel, Mark John Maslow, Koenraad VAN INGEN SCHENAU, Patrick Warnaar, Abraham SLACHTER +3 more | 2023-09-26 |
| 11733615 | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method | Christoph Hennerkes | 2023-08-22 |
| 11733610 | Method and system to monitor a process apparatus | Wim Tjibbo Tel, Mark John Maslow, Paul Christiaan Hinnen | 2023-08-22 |
| 11586114 | Wavefront optimization for tuning scanner based on performance matching | Duan-Fu Stephen Hsu, Christoph Hennerkes, Rafael C. Howell, Zhan Shi, Xiaoyang Li | 2023-02-21 |
| 11520239 | Separation of contributions to metrology data | Wim Tjibbo Tel, Mark John Maslow, Roy ANUNCIADO, Marinus Jochemsen, Hugo Augustinus Joseph Cramer +2 more | 2022-12-06 |
| 11513442 | Method of determining control parameters of a device manufacturing process | Wim Tjibbo Tel, Mark John Maslow, Koenraad VAN INGEN SCHENAU, Patrick Warnaar, Abraham SLACHTER +3 more | 2022-11-29 |
| 11487209 | Method for controlling a lithographic apparatus and associated apparatuses | — | 2022-11-01 |
| 11480884 | Method for optimization of a lithographic process | Everhardus Cornelis Mos, Jochem Sebastiaan Wildenberg, Erik Johannes Maria Wallerbos, Maurits Van Der Schaar, Franciscus Hendricus Arnoldus Elich | 2022-10-25 |
| 11422476 | Methods and apparatus for monitoring a lithographic manufacturing process | Emil Peter Schmitt-Weaver, Kaustuve Bhattacharyya, Wim Tjibbo Tel, Leon Martin Levasier | 2022-08-23 |
| 11385554 | Metrology apparatus and method for determining a characteristic relating to one or more structures on a substrate | Miguel GARCIA GRANDA, Steven E. Steen, Eric Brouwer, Bart Peter Bert Segers, Pierre-Yves Guittet +1 more | 2022-07-12 |
| 11378891 | Method for determining contribution to a fingerprint | Davit Harutyunyan, Fei Jia, Fuming Wang, Hugo Thomas Looijestijn, Cornelis Johannes Rijnierse +8 more | 2022-07-05 |
| 11360395 | Control method for a scanning exposure apparatus | Valerio ALTINI | 2022-06-14 |
| 11314174 | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method | Laurentius Cornelius De Winter, Roland Pieter Stolk, Anton Bernhard Van Oosten, Paul Christiaan Hinnen, Marinus Jochemsen +2 more | 2022-04-26 |
| 11204557 | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method | — | 2021-12-21 |
| 11194258 | Method and apparatus for determining a fingerprint of a performance parameter | Léon Maria Albertus Van Der Logt, Bart Peter Bert Segers, Simon Hendrik Celine Van Gorp, Carlo Cornelis Maria Luijten | 2021-12-07 |
| 11067902 | Computational metrology | Patrick Warnaar, Patricius Aloysius Jacobus Tinnemans, Grzegorz Grzela, Everhardus Cornelis Mos, Wim Tjibbo Tel +2 more | 2021-07-20 |
| 11054754 | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method | Anton Bernhard Van Oosten, Yasri Yudhistira, Carlo Cornelis Maria Luijten, Bert Verstraeten, Jan-Willem Gemmink | 2021-07-06 |
| 11029614 | Level sensor apparatus, method of measuring topographical variation across a substrate, method of measuring variation of a physical parameter related to a lithographic process, and lithographic apparatus | Wim Tjibbo Tel, Martin Jules Marie-Emile De Nivelle, Tanbir HASAN | 2021-06-08 |
| 10871716 | Metrology robustness based on through-wavelength similarity | Miguel GARCIA GRANDA, Christian Marinus Leewis | 2020-12-22 |