| 12276919 |
Method for controlling a semiconductor manufacturing process |
Marc Hauptmann, Cornelis Johannes Henricus LAMBREGTS, Amir Bin Ismail, Rizvi Rahman, Allwyn Boustheen +4 more |
2025-04-15 |
| 12189302 |
Computational metrology |
Wim Tjibbo Tel, Bart Peter Bert Segers, Emil Peter Schmitt-Weaver, Yichen Zhang, Petrus Gerardus Van Rhee +4 more |
2025-01-07 |
| 12045555 |
Method to label substrates based on process parameters |
Vahid BASTANI, Alexander Ypma, Dag Sonntag, Hakki Ergün Cekli, Chenxi Lin |
2024-07-23 |
| 12044981 |
Method and apparatus for optimization of lithographic process |
Marc Hauptmann, Weitian Kou, Alexander Ypma, Michiel Kupers, Hyunwoo Yu +1 more |
2024-07-23 |
| 11977034 |
Methods and apparatus for measuring a property of a substrate |
Wouter Lodewijk Elings, Franciscus Bernardus Maria Van Bilsen, Christianus Gerardus Maria De Mol, Hoite Pieter Theodoor Tolsma, Peter Ten Berge +5 more |
2024-05-07 |
| RE49460 |
Inspection method and apparatus and lithographic processing cell |
Hubertus Johannes Gertrudus Simons, Peter Ten Berge, Nicole Schoumans, Michael Kubis, Paul Cornelis Hubertus Aben |
2023-03-14 |
| 11480884 |
Method for optimization of a lithographic process |
Jochem Sebastiaan Wildenberg, Erik Johannes Maria Wallerbos, Maurits Van Der Schaar, Frank Staals, Franciscus Hendricus Arnoldus Elich |
2022-10-25 |
| RE49199 |
Inspection method and apparatus and lithographic processing cell |
Hubertus Johannes Gertrudus Simons, Peter Ten Berge, Nicole Schoumans, Michael Kubis, Paul Cornelis Hubertus Aben |
2022-09-06 |
| 11378891 |
Method for determining contribution to a fingerprint |
Davit Harutyunyan, Fei Jia, Frank Staals, Fuming Wang, Hugo Thomas Looijestijn +8 more |
2022-07-05 |
| 11347150 |
Computational metrology |
Wim Tjibbo Tel, Bart Peter Bert Segers, Emil Peter Schmitt-Weaver, Yichen Zhang, Petrus Gerardus Van Rhee +4 more |
2022-05-31 |
| 11300891 |
Methods and apparatus for calculating substrate model parameters and controlling lithographic processing |
Jasper Menger, Paul Cornelis Hubertus Aben |
2022-04-12 |
| 11300887 |
Method to change an etch parameter |
Richard Johannes Franciscus Van Haren, Victor Emanuel Calado, Leon Paul VAN DIJK, Roy Werkman, Jochem Sebastiaan Wildenberg +4 more |
2022-04-12 |
| 11170072 |
Method and apparatus for inspection and metrology |
Velislava IGNATOVA, Erik Weber Jensen, Michael Kubis, Hubertus Johannes Gertrudus Simons, Peter Ten Berge +2 more |
2021-11-09 |
| 11099487 |
Method and apparatus for optimization of lithographic process |
Marc Hauptmann, Weitian Kou, Alexander Ypma, Michiel Kupers, Hyunwoo Yu +1 more |
2021-08-24 |
| 11067902 |
Computational metrology |
Patrick Warnaar, Patricius Aloysius Jacobus Tinnemans, Grzegorz Grzela, Wim Tjibbo Tel, Marinus Jochemsen +2 more |
2021-07-20 |
| 11061336 |
Device manufacturing method |
Hubertus Johannes Gertrudus Simons, Xiuhong Wei, Reza Mahmoodi Baram, Hadi YAGUBIZADE, Yichen Zhang |
2021-07-13 |
| 11036146 |
Method and apparatus to reduce effects of nonlinear behavior |
Richard Johannes Franciscus Van Haren, Peter Ten Berge, Peter Hanzen Wardenier, Erik Weber Jensen, Hakki Ergün Cekli |
2021-06-15 |
| 10996176 |
Methods and apparatus for measuring a property of a substrate |
Wouter Lodewijk Elings, Franciscus Bernardus Maria Van Bilsen, Christianus Gerardus Maria De Mol, Hoite Pieter Theodoor Tolsma, Peter Ten Berge +5 more |
2021-05-04 |
| 10990018 |
Computational metrology |
Wim Tjibbo Tel, Bart Peter Bert Segers, Emil Peter Schmitt-Weaver, Yichen Zhang, Petrus Gerardus Van Rhee +4 more |
2021-04-27 |
| 10928737 |
Method for characterizing distortions in a lithographic process, lithographic apparatus, lithographic cell and computer program |
Jochem Sebastiaan Wildenberg, Roy Werkman, Erik Johannes Maria Wallerbos |
2021-02-23 |
| 10915689 |
Method and apparatus to correct for patterning process error |
Peter Ten Berge, Richard Johannes Franciscus Van Haren, Peter Hanzen Wardenier, Erik Weber Jensen, Bernardo Kastrup +5 more |
2021-02-09 |
| 10859930 |
Methods and apparatus for calculating substrate model parameters and controlling lithographic processing |
Jasper Menger, Paul Cornelis Hubertus Aben |
2020-12-08 |
| 10816904 |
Method for determining contribution to a fingerprint |
Davit Harutyunyan, Fei Jia, Frank Staals, Fuming Wang, Hugo Thomas Looijestijn +8 more |
2020-10-27 |
| 10809631 |
Method of monitoring and device manufacturing method |
Jochem Sebastiaan Wildenberg, Marcel Hendrikus Maria Beems, Erik Johannes Maria Wallerbos |
2020-10-20 |
| 10802408 |
Method for optimization of a lithographic process |
Jochem Sebastiaan Wildenberg, Erik Johannes Maria Wallerbos, Maurits Van Der Schaar, Frank Staals, Franciscus Hendricus Arnoldus Elich |
2020-10-13 |