| 12254392 |
Apparatus and method for property joint interpolation and prediction |
Faegheh Hasibi, Maialen LARRANAGA, Alexander Ypma, Richard Johannes Franciscus Van Haren |
2025-03-18 |
| 12189308 |
Method for adjusting a target feature in a model of a patterning process based on local electric fields |
Richard Johannes Franciscus Van Haren, Oktay Yildirim, Orion Jonathan Pierre Mouraille |
2025-01-07 |
| 11619884 |
Method for adjusting a target feature in a model of a patterning process based on local electric fields |
Richard Johannes Franciscus Van Haren, Oktay Yildirim, Orion Jonathan Pierre Mouraille |
2023-04-04 |
| 11320750 |
Determining an optimal operational parameter setting of a metrology system |
Victor Emanuel Calado, Xing Lan Liu, Richard Johannes Franciscus Van Haren |
2022-05-03 |
| 11300888 |
Methods of determining stress in a substrate, control system for controlling a lithographic process, lithographic apparatus and computer program product |
Richard Johannes Franciscus Van Haren, Ilya MALAKHOVSKY, Ronald Henricus Johannes OTTEN |
2022-04-12 |
| 11300889 |
Metrology apparatus |
Richard Johannes Franciscus Van Haren, Subodh Singh, Ilya MALAKHOVSKY, Ronald Henricus Johannes OTTEN, Amandev Singh |
2022-04-12 |
| 11300887 |
Method to change an etch parameter |
Richard Johannes Franciscus Van Haren, Victor Emanuel Calado, Roy Werkman, Everhardus Cornelis Mos, Jochem Sebastiaan Wildenberg +4 more |
2022-04-12 |
| 11294294 |
Alignment mark positioning in a lithographic process |
Richard Johannes Franciscus Van Haren, Orion Jonathan Pierre Mouraille, Anne Marie Pastol |
2022-04-05 |
| 11226567 |
Methods and apparatus for use in a device manufacturing method |
Richard Johannes Franciscus Van Haren, Ilya MALAKHOVSKY, Ronald Henricus Johannes OTTEN, Mahdi SADEGHINIA |
2022-01-18 |
| 11126093 |
Focus and overlay improvement by modifying a patterning device |
Richard Johannes Franciscus Van Haren, Reiner Maria Jungblut, Willem Seine Christian Roelofs, Wim Tjibbo Tel, Stefan Hunsche +1 more |
2021-09-21 |
| 10788761 |
Determining an optimal operational parameter setting of a metrology system |
Victor Emanuel Calado, Xing Lan Liu, Richard Johannes Franciscus Van Haren |
2020-09-29 |
| 10545410 |
Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product |
Hakki Ergün Cekli, Masashi Ishibashi, Richard Johannes Franciscus Van Haren, Xing Lan Liu, Reiner Maria Jungblut +2 more |
2020-01-28 |
| 10474045 |
Lithographic apparatus and device manufacturing method |
Franciscus Godefridus Casper Bijnen, Arie Jeffrey Den Boef, Richard Johannes Franciscus Van Haren, Patricius Aloysius Jacobus Tinnemans, Alexander Ypma +6 more |
2019-11-12 |