Issued Patents All Time
Showing 1–25 of 69 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12332573 | Method for determining defectiveness of pattern based on after development image | Marleen KOOIMAN, Maxim PISARENCO, Abraham SLACHTER, Mark John Maslow, Bernardo Andres OYARZUN RIVERA +1 more | 2025-06-17 |
| 12315175 | Method in the manufacturing process of a device, a non-transitory computer-readable medium and a system configured to perform the method | Antoine Gaston Marie Kiers, Vadim Yourievich TIMOSHKOV, Hermanus Adrianus DILLEN, Yichen Zhang, Te-Sheng WANG +1 more | 2025-05-27 |
| 12228862 | Selection of measurement locations for patterning processes | Hans Van Der Laan, Marinus Jochemsen, Stefan Hunsche | 2025-02-18 |
| 12210293 | Method for determining a measurement recipe and associated apparatuses | Adriaan Johan Van Leest | 2025-01-28 |
| 12197136 | Method of determining control parameters of a device manufacturing process | Mark John Maslow, Koenraad VAN INGEN SCHENAU, Patrick Warnaar, Abraham SLACHTER, Roy ANUNCIADO +3 more | 2025-01-14 |
| 12189302 | Computational metrology | Bart Peter Bert Segers, Everhardus Cornelis Mos, Emil Peter Schmitt-Weaver, Yichen Zhang, Petrus Gerardus Van Rhee +4 more | 2025-01-07 |
| 12124179 | Method of wafer alignment using at resolution metrology on product features | Hermanus Adrianus DILLEN, Marc Jurian Kea, Roy Werkman, Weitian Kou | 2024-10-22 |
| 12044980 | Method of manufacturing devices | Abraham SLACHTER, Daan Maurits Slotboom, Vadim Yourievich TIMOSHKOV, Koen Wilhelmus Cornelis Adrianus Van Der Straten, Boris Menchtchikov +7 more | 2024-07-23 |
| 12044979 | Computational metrology based sampling scheme | Yichen Zhang, Sarathi ROY | 2024-07-23 |
| 11972922 | Method for calibrating a scanning charged particle microscope | Hermanus Adrianus DILLEN, Willem Louis VAN MIERLO | 2024-04-30 |
| 11860548 | Method for characterizing a manufacturing process of semiconductor devices | Hermanus Adrianus DILLEN, Marc Jurian Kea, Mark John Maslow, Koen Thuijs, Peter David Engblom +3 more | 2024-01-02 |
| 11822255 | Process window based on defect probability | Abraham SLACHTER, Stefan Hunsche, Anton Bernhard Van Oosten, Koenraad VAN INGEN SCHENAU, Gijsbert Rispens +1 more | 2023-11-21 |
| 11768442 | Method of determining control parameters of a device manufacturing process | Mark John Maslow, Koenraad VAN INGEN SCHENAU, Patrick Warnaar, Abraham SLACHTER, Roy ANUNCIADO +3 more | 2023-09-26 |
| 11733610 | Method and system to monitor a process apparatus | Mark John Maslow, Frank Staals, Paul Christiaan Hinnen | 2023-08-22 |
| 11709432 | Method to characterize post-processing data in terms of individual contributions from processing stations | Ekaterina Mikhailovna Viatkina, Tom Van Hemert | 2023-07-25 |
| 11681229 | Selection of measurement locations for patterning processes | Hans Van Der Laan, Marinus Jochemsen, Stefan Hunsche | 2023-06-20 |
| 11646174 | Method for calibrating a scanning charged particle microscope | Hermanus Adrianus DILLEN, Willem Louis VAN MIERLO | 2023-05-09 |
| 11635698 | Computational metrology based sampling scheme | Yichen Zhang, Sarathi ROY | 2023-04-25 |
| 11599027 | Lithographic process and apparatus and inspection process and apparatus | Hans Erik KATTOUW, Valerio ALTINI, Bearrach Moest | 2023-03-07 |
| 11520239 | Separation of contributions to metrology data | Frank Staals, Mark John Maslow, Roy ANUNCIADO, Marinus Jochemsen, Hugo Augustinus Joseph Cramer +2 more | 2022-12-06 |
| 11513442 | Method of determining control parameters of a device manufacturing process | Mark John Maslow, Koenraad VAN INGEN SCHENAU, Patrick Warnaar, Abraham SLACHTER, Roy ANUNCIADO +3 more | 2022-11-29 |
| 11448973 | Computational metrology based correction and control | Manouk RIJPSTRA, Cornelis Johannes Henricus LAMBREGTS, Sarathi ROY, Cédric Désiré Grouwstra, Chi-Fei NIEN +3 more | 2022-09-20 |
| 11422476 | Methods and apparatus for monitoring a lithographic manufacturing process | Emil Peter Schmitt-Weaver, Kaustuve Bhattacharyya, Frank Staals, Leon Martin Levasier | 2022-08-23 |
| 11415899 | Method of determining a focus of a projection system, device manufacturing method, and apparatus for determining a focus of a projection system | Bart Laenens | 2022-08-16 |
| 11347150 | Computational metrology | Bart Peter Bert Segers, Everhardus Cornelis Mos, Emil Peter Schmitt-Weaver, Yichen Zhang, Petrus Gerardus Van Rhee +4 more | 2022-05-31 |