Issued Patents All Time
Showing 26–50 of 69 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11281110 | Methods using fingerprint and evolution analysis | Jeroen VAN DONGEN, Sarathi ROY, Yichen Zhang, Andrea Cavalli, Bart Laurens Sjenitzer +1 more | 2022-03-22 |
| 11249404 | System and method for measurement of alignment | Emil Peter Schmitt-Weaver, Kaustuve Bhattacharyya, Rene Marinus Gerardus Johan Queens, Wolfgang Henke, Theodorus Franciscus Adrianus Maria Linschoten | 2022-02-15 |
| 11199782 | Lithographic process and apparatus and inspection process and apparatus | Hans Erik KATTOUW, Valerio ALTINI, Bearrach Moest | 2021-12-14 |
| 11143971 | Control based on probability density function of parameter | Marc Jurian Kea, Roy ANUNCIADO | 2021-10-12 |
| 11126093 | Focus and overlay improvement by modifying a patterning device | Richard Johannes Franciscus Van Haren, Reiner Maria Jungblut, Leon Paul VAN DIJK, Willem Seine Christian Roelofs, Stefan Hunsche +1 more | 2021-09-21 |
| 11112700 | Optimization of a lithographic projection apparatus accounting for an interlayer characteristic | Laurent Michel Marcel Depre, Jorge Humberto Salvador Entradas | 2021-09-07 |
| 11079687 | Process window based on defect probability | Abraham SLACHTER, Stefan Hunsche, Anton Bernhard Van Oosten, Koenraad VAN INGEN SCHENAU, Gijsbert Rispens +1 more | 2021-08-03 |
| 11067902 | Computational metrology | Patrick Warnaar, Patricius Aloysius Jacobus Tinnemans, Grzegorz Grzela, Everhardus Cornelis Mos, Marinus Jochemsen +2 more | 2021-07-20 |
| 11029614 | Level sensor apparatus, method of measuring topographical variation across a substrate, method of measuring variation of a physical parameter related to a lithographic process, and lithographic apparatus | Frank Staals, Martin Jules Marie-Emile De Nivelle, Tanbir HASAN | 2021-06-08 |
| 10990018 | Computational metrology | Bart Peter Bert Segers, Everhardus Cornelis Mos, Emil Peter Schmitt-Weaver, Yichen Zhang, Petrus Gerardus Van Rhee +4 more | 2021-04-27 |
| 10962886 | Selection of measurement locations for patterning processes | Hans Van Der Laan, Marinus Jochemsen, Stefan Hunsche | 2021-03-30 |
| 10866523 | Process window tracker | Frank Staals, Mark John Maslow | 2020-12-15 |
| 10866527 | Methods and apparatus for monitoring a lithographic manufacturing process | Emil Peter Schmitt-Weaver, Kaustuve Bhattacharyya, Frank Staals, Leon Martin Levasier | 2020-12-15 |
| 10775705 | Patterning stack optimization | Jozef Maria Finders, Orion Jonathan Pierre Mouraille, Anton Bernhard Van Oosten | 2020-09-15 |
| 10725372 | Method and apparatus for reticle optimization | Marinus Jochemsen, Frank Staals, Christopher PRENTICE, Laurent Michel Marcel Depre, Johannes Marcus Maria Beltman +3 more | 2020-07-28 |
| 10712672 | Method of predicting patterning defects caused by overlay error | Marinus Jochemsen, Stefan Hunsche | 2020-07-14 |
| 10627722 | Etch-assist features | Thomas I. Wallow | 2020-04-21 |
| 10571806 | Method and system to monitor a process apparatus | Mark John Maslow, Frank Staals, Paul Christiaan Hinnen | 2020-02-25 |
| 10394136 | Metrology method for process window definition | Marinus Jochemsen | 2019-08-27 |
| 10289009 | Lithographic apparatus, control method and computer program product | Bram Van Hoof | 2019-05-14 |
| 10133191 | Method for determining a process window for a lithographic process, associated apparatuses and a computer program | Frank Staals, Paul Christiaan Hinnen, Reiner Maria Jungblut | 2018-11-20 |
| 10078273 | Lithographic apparatus with data processing apparatus | Emil Peter Schmitt-Weaver, Wolfgang Henke, Christopher PRENTICE, Frank Staals | 2018-09-18 |
| 10025193 | Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product | Hakki Ergün Cekli, Xing Lan Liu, Daan Maurits Slotboom, Stefan Cornelis Theodorus Van Der Sanden, Richard Johannes Franciscus Van Haren | 2018-07-17 |
| 9977344 | Metrology target, method and apparatus, computer program and lithographic system | Frank Staals | 2018-05-22 |
| 9360769 | Method of determining focus corrections, lithographic processing cell and device manufacturing method | Arend Johannes Kisteman, Thomas Theeuwes, Antoine Gaston Marie Kiers | 2016-06-07 |