Issued Patents All Time
Showing 25 most recent of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11658004 | Method for scanning a sample by a charged particle beam system | Adam Lyons | 2023-05-23 |
| 11127563 | Method for scanning a sample by a charged particle beam system | Adam Lyons | 2021-09-21 |
| 10754256 | Method and apparatus for pattern correction and verification | Peng Yang, Adam Lyons, Mir Farrokh SHAYEGAN SALEK, Hermanus Adrianus DILLEN | 2020-08-25 |
| 10663870 | Gauge pattern selection | Jun Chen, Bart Laenens, Yi-Hsing Peng | 2020-05-26 |
| 10627722 | Etch-assist features | Wim Tjibbo Tel | 2020-04-21 |
| 10417359 | Optical metrology of lithographic processes using asymmetric sub-resolution features to enhance measurement | Robert John Socha | 2019-09-17 |
| 8889343 | Optimizing lithographic processes using laser annealing techniques | Moshe E. Preil, Gerard Schmid, Richard A. Farrell, Ji Xu | 2014-11-18 |
| 8852854 | Method for forming a photoresist pattern on a semiconductor wafer using oxidation-based catalysis | Uzodinma Okoroanyanwu | 2014-10-07 |
| 8815748 | Method of forming semiconductor device with multiple level patterning | Ryoung-Han Kim, Jongwook Kye, Harry J. Levinson | 2014-08-26 |
| 8715912 | Method for producing a high resolution resist pattern on a semiconductor wafer | Uzodinma Okoroanyanwu | 2014-05-06 |
| 8642474 | Spacer lithography | Ryoung-Han Kim, Yunfei Deng, Bruno La Fontaine | 2014-02-04 |
| 8586269 | Method for forming a high resolution resist pattern on a semiconductor wafer | Uzodinma Okoroanyanwu, Harry J. Levinson, Ryoung-Han Kim | 2013-11-19 |
| 8236592 | Method of forming semiconductor device | Ryoung-Han Kim, Harry J. Levinson, Jongwook Kye, Alden Acheta | 2012-08-07 |
| 8153351 | Methods for performing photolithography using BARCs having graded optical properties | Jongwook Kye | 2012-04-10 |
| 8067252 | Method for determining low-noise power spectral density for characterizing line edge roughness in semiconductor wafer processing | Yuansheng Ma, Harry J. Levinson | 2011-11-29 |
| 7858276 | Method for determining suitability of a resist in semiconductor wafer fabrication | Bruno M. LaFontaine | 2010-12-28 |
| 7851136 | Stabilization of deep ultraviolet photoresist | Harry J. Levinson, Ryoung-Han Kim | 2010-12-14 |
| 7723704 | EUV pellicle with increased EUV light transmittance | Obert R. Wood, II, Ryoung-Han Kim | 2010-05-25 |
| 7718529 | Inverse self-aligned spacer lithography | Yunfei Deng, Ryoung-Han Kim | 2010-05-18 |
| 7663127 | EUV debris mitigation filter and method for fabricating semiconductor dies using same | Obert R. Wood, II, Ryoung-Han Kim | 2010-02-16 |
| 7504198 | Methods for enhancing resolution of a chemically amplified photoresist | Bruno M. LaFontaine, Adam R. Pawloski | 2009-03-17 |
| 7390377 | Bonding thermoplastic polymers | Marion C. Hunter, Karen Krafcik, Alfredo M. Morales, Blake A. Simmons, Linda A. Domeier | 2008-06-24 |
| 6794459 | Modified polycyclic polymers | Saikumar Jayaraman, George M. Benedikt, Larry F. Rhodes, Richard Vicari, Robert David Allen +2 more | 2004-09-21 |
| 6723486 | Photoresist compositions comprising polycyclic polymers with acid labile pendant groups | Brian L. Goodall, Saikumar Jayaraman, Robert A. Shick, Larry F. Rhodes, Robert David Allen +1 more | 2004-04-20 |
| 6677419 | Preparation of copolymers | Phillip Brock, Eiichi Kobayashi, Isao Nishimura, Yukio Nishimura, Masafumi Yamamoto | 2004-01-13 |