RS

Robert A. Shick

PR Promerus: 12 patents #12 of 140Top 9%
BG B. F. Goodrich: 8 patents #50 of 734Top 7%
SC Sumitomo Bakelite Co.: 5 patents #56 of 790Top 8%
IBM: 3 patents #26,272 of 70,183Top 40%
3M: 1 patents #7,233 of 11,543Top 65%
Overall (All Time): #155,125 of 4,157,543Top 4%
26
Patents All Time

Issued Patents All Time

Showing 25 most recent of 26 patents

Patent #TitleCo-InventorsDate
9263416 Methods and materials useful for chip stacking, chip and wafer bonding Christopher Apanius, Hendra Ng, Andrew Bell, Wei Zhang, Phillip S. Neal 2016-02-16
8816485 Methods and materials useful for chip stacking, chip and wafer bonding Chris Apanius, Hendra Ng, Andrew Bell, Wei Zhang, Phil Neal 2014-08-26
8729215 Sacrificial polymer compositions including polycarbonates having repeat units derived from stereospecific polycyclic 2,3-diol monomers Andrew Bell, Leah Langsdorf, Keitaro Seto, W. C. Peter Tsang 2014-05-20
8575297 Sacrificial polymer compositions including polycarbonates having repeat units derived from stereospecific polycyclic 2,3-diol monomers Andrew Bell, Leah Langsdorf, Keitaro Seto, W. C. Peter Tsang 2013-11-05
8120168 Methods and materials useful for chip stacking, chip and wafer bonding Chris Apanius, Hendra Ng, Andrew Bell, Wei Zhang, Phil Neal 2012-02-21
8053515 Directly photodefinable polymer compositions and methods thereof Edmund Elce, Andrew Bell, Brian Knapp, Hendra Ng, Larry F. Rhodes +8 more 2011-11-08
8030425 Photosensitive compositions based on polycyclic polymers for low stress, high temperature films Christopher Apanius, Matthew Apanius, Edmund Elce, Hendra Ng, Brian Knapp +2 more 2011-10-04
7932161 Methods and materials useful for chip stacking, chip and wafer bonding Chris Apanius, Hendra Ng, Andrew Bell, Wei Zhang, Phil Neal 2011-04-26
7858721 Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films Dino Amoroso, Brian Bedwell, Andrew Bell, Edmund Elce, Rajesh Raja Puthenkovilakom +7 more 2010-12-28
7851575 Polycyclic polymers containing pendant ion conducting moieties Ramakrishna Ravikiran, Xiaoming Wu, Larry F. Rhodes, Hiroko Nakano, Hirotaka Nonaka +4 more 2010-12-14
7524594 Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films Dino Amoroso, Brian Bedwell, Andrew Bell, Edmund Elce, Rajesh Raja Puthenkovilakom +7 more 2009-04-28
7378456 Directly photodefinable polymer compositions and methods thereof Edmund Elce, Ramakrishna Ravikiran, Larry F. Rhodes, Saikumar Jayaraman 2008-05-27
7312292 Polycyclic polymers containing pendant ion conducting moieties Ravi Ravikiran, Xiaoming Wu, Larry F. Rhodes, Hiroko Nakano, Hirotaka Nonaka +4 more 2007-12-25
6790579 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups Brian L. Goodall, Saikumar Jayaraman, Larry F. Rhodes 2004-09-14
6723486 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups Brian L. Goodall, Saikumar Jayaraman, Larry F. Rhodes, Robert David Allen, Richard Anthony DiPietro +1 more 2004-04-20
6677175 Optical waveguides and methods for making the same Xiao-Mei Zhao, Ramakrishna Ravikiran, Phillip S. Neal, James E. Watson, Thomas M. Kafka +2 more 2004-01-13
6649707 Blends and alloys of polycyclic polymers Larry F. Rhodes, Brian L. Goodall, Rolf Mulhaupt, George M. Benedikt, Sai Kumar Jayaraman +2 more 2003-11-18
6538087 Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same Xiao-Mei Zhao, Ramakrishna Ravikiran, Phillip S. Neal, Larry F. Rhodes, Andrew Bell 2003-03-25
6451499 Polycyclic resist compositions with increased etch resistance Saikumar Jayaraman, Brian L. Goodall, Larry F. Rhodes, Richard Vicari, Robert David Allen +3 more 2002-09-17
6294616 Blends and alloys of polycyclic polymers Larry F. Rhodes, Brian L. Goodall, Rolf Mulhaupt, George M. Benedikt, Sai Kumar Jayaraman +2 more 2001-09-25
6232417 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups Larry F. Rhodes, Andrew Bell, Saikumar Jayaraman, John-Henry Lipian, Brian L. Goodall 2001-05-15
6147177 Polycyclic resist compositions with increased etch resistance Saikumar Jayaraman, Brian L. Goodall, Larry F. Rhodes, Richard Vicari, Robert David Allen +3 more 2000-11-14
6136499 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups Brian L. Goodall, Saikumar Jayaraman, Larry F. Rhodes 2000-10-24
6121340 Photodefinable dielectric compositions comprising polycyclic polymers Saikumar Jayaraman, Edmund Elce, Brian L. Goodall 2000-09-19
6031058 Addition polymers of polycycloolefins containing silyl functional groups Lester Howard McIntosh, III, Brian L. Goodall, Saikumar Jayaraman 2000-02-29