| 9263416 |
Methods and materials useful for chip stacking, chip and wafer bonding |
Christopher Apanius, Hendra Ng, Andrew Bell, Wei Zhang, Phillip S. Neal |
2016-02-16 |
|
| 8816485 |
Methods and materials useful for chip stacking, chip and wafer bonding |
Chris Apanius, Hendra Ng, Andrew Bell, Wei Zhang, Phil Neal |
2014-08-26 |
|
| 8729215 |
Sacrificial polymer compositions including polycarbonates having repeat units derived from stereospecific polycyclic 2,3-diol monomers |
Andrew Bell, Leah Langsdorf, Keitaro Seto, W. C. Peter Tsang |
2014-05-20 |
|
| 8575297 |
Sacrificial polymer compositions including polycarbonates having repeat units derived from stereospecific polycyclic 2,3-diol monomers |
Andrew Bell, Leah Langsdorf, Keitaro Seto, W. C. Peter Tsang |
2013-11-05 |
|
| 8120168 |
Methods and materials useful for chip stacking, chip and wafer bonding |
Chris Apanius, Hendra Ng, Andrew Bell, Wei Zhang, Phil Neal |
2012-02-21 |
|
| 8053515 |
Directly photodefinable polymer compositions and methods thereof |
Edmund Elce, Andrew Bell, Brian Knapp, Hendra Ng, Larry F. Rhodes +8 more |
2011-11-08 |
|
| 8030425 |
Photosensitive compositions based on polycyclic polymers for low stress, high temperature films |
Christopher Apanius, Matthew Apanius, Edmund Elce, Hendra Ng, Brian Knapp +2 more |
2011-10-04 |
|
| 7932161 |
Methods and materials useful for chip stacking, chip and wafer bonding |
Chris Apanius, Hendra Ng, Andrew Bell, Wei Zhang, Phil Neal |
2011-04-26 |
|
| 7858721 |
Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films |
Dino Amoroso, Brian Bedwell, Andrew Bell, Edmund Elce, Rajesh Raja Puthenkovilakom +7 more |
2010-12-28 |
|
| 7851575 |
Polycyclic polymers containing pendant ion conducting moieties |
Ramakrishna Ravikiran, Xiaoming Wu, Larry F. Rhodes, Hiroko Nakano, Hirotaka Nonaka +4 more |
2010-12-14 |
|
| 7524594 |
Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films |
Dino Amoroso, Brian Bedwell, Andrew Bell, Edmund Elce, Rajesh Raja Puthenkovilakom +7 more |
2009-04-28 |
|
| 7378456 |
Directly photodefinable polymer compositions and methods thereof |
Edmund Elce, Ramakrishna Ravikiran, Larry F. Rhodes, Saikumar Jayaraman |
2008-05-27 |
|
| 7312292 |
Polycyclic polymers containing pendant ion conducting moieties |
Ravi Ravikiran, Xiaoming Wu, Larry F. Rhodes, Hiroko Nakano, Hirotaka Nonaka +4 more |
2007-12-25 |
|
| 6790579 |
Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
Brian L. Goodall, Saikumar Jayaraman, Larry F. Rhodes |
2004-09-14 |
|
| 6723486 |
Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
Brian L. Goodall, Saikumar Jayaraman, Larry F. Rhodes, Robert David Allen, Richard Anthony DiPietro +1 more |
2004-04-20 |
$6,170,000 |
| 6677175 |
Optical waveguides and methods for making the same |
Xiao-Mei Zhao, Ramakrishna Ravikiran, Phillip S. Neal, James E. Watson, Thomas M. Kafka +2 more |
2004-01-13 |
$16,496,000 |
| 6649707 |
Blends and alloys of polycyclic polymers |
Larry F. Rhodes, Brian L. Goodall, Rolf Mulhaupt, George M. Benedikt, Sai Kumar Jayaraman +2 more |
2003-11-18 |
|
| 6538087 |
Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same |
Xiao-Mei Zhao, Ramakrishna Ravikiran, Phillip S. Neal, Larry F. Rhodes, Andrew Bell |
2003-03-25 |
|
| 6451499 |
Polycyclic resist compositions with increased etch resistance |
Saikumar Jayaraman, Brian L. Goodall, Larry F. Rhodes, Richard Vicari, Robert David Allen +3 more |
2002-09-17 |
|
| 6294616 |
Blends and alloys of polycyclic polymers |
Larry F. Rhodes, Brian L. Goodall, Rolf Mulhaupt, George M. Benedikt, Sai Kumar Jayaraman +2 more |
2001-09-25 |
$5,873,000 |
| 6232417 |
Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
Larry F. Rhodes, Andrew Bell, Saikumar Jayaraman, John-Henry Lipian, Brian L. Goodall |
2001-05-15 |
$36,536,000 |
| 6147177 |
Polycyclic resist compositions with increased etch resistance |
Saikumar Jayaraman, Brian L. Goodall, Larry F. Rhodes, Richard Vicari, Robert David Allen +3 more |
2000-11-14 |
|
| 6136499 |
Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
Brian L. Goodall, Saikumar Jayaraman, Larry F. Rhodes |
2000-10-24 |
$40,600,000 |
| 6121340 |
Photodefinable dielectric compositions comprising polycyclic polymers |
Saikumar Jayaraman, Edmund Elce, Brian L. Goodall |
2000-09-19 |
$41,154,000 |
| 6031058 |
Addition polymers of polycycloolefins containing silyl functional groups |
Lester Howard McIntosh, III, Brian L. Goodall, Saikumar Jayaraman |
2000-02-29 |
$12,533,000 |
