| 8792161 |
Optical polarizer with nanotube array |
Ryoung-Han Kim, Harry J. Levinson, Uzodinma Okoroanyanwu |
2014-07-29 |
| 8198611 |
Laser beam formatting module and method for fabricating semiconductor dies using same |
Obert R. Wood, II |
2012-06-12 |
| 7858276 |
Method for determining suitability of a resist in semiconductor wafer fabrication |
Thomas I. Wallow |
2010-12-28 |
| 7855048 |
Wafer assembly having a contrast enhancing top anti-reflecting coating and method of lithographic processing |
Cyrus E. Tabery, Adam R. Pawloski, Jongwook Kye |
2010-12-21 |
| 7741012 |
Method for removal of immersion lithography medium in immersion lithography processes |
Adam R. Pawloski, Amr Y. Abdo, Gilles Amblard, Ivan Lalovic, Harry J. Levinson +3 more |
2010-06-22 |
| 7504198 |
Methods for enhancing resolution of a chemically amplified photoresist |
Adam R. Pawloski, Thomas I. Wallow |
2009-03-17 |
| 7276328 |
Lithography mask utilizing asymmetric light source |
Cyrus E. Tabery, Ivan Lavolic |
2007-10-02 |
| 7087907 |
Detection of contamination in imaging systems by fluorescence and/or absorption spectroscopy |
Ivan Lalovic |
2006-08-08 |
| 7081956 |
Method and device for determining reflection lens pupil transmission distribution and illumination intensity distribution in reflective imaging system |
Ivan Lalovic |
2006-07-25 |
| 7060401 |
Phase-shift reflective mask for lithography, and method of using and fabricating |
Adam R. Pawloski, Yunfei Deng |
2006-06-13 |
| 7014966 |
Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems |
Adam R. Pawloski, Amr Y. Abdo, Gilles Amblard, Ivan Lalovic, Harry J. Levinson +3 more |
2006-03-21 |
| 6984475 |
Extreme ultraviolet (EUV) lithography masks |
Harry J. Levinson, Ivan Lalovic, Adam R. Pawloski |
2006-01-10 |
| 6977717 |
Method and device for determining projection lens pupil transmission distribution and illumination intensity distribution in photolithographic imaging system |
Ivan Lalovic, Jongwook Kye |
2005-12-20 |
| 6977718 |
Lithography method and system with adjustable reflector |
— |
2005-12-20 |
| 6950176 |
Method and system for monitoring EUV lithography mask flatness |
Ivan Lavolic |
2005-09-27 |
| 6806007 |
EUV mask which facilitates electro-static chucking |
Amr Y. Abdo |
2004-10-19 |
| 6696847 |
Photo assisted electrical linewidth measurement method and apparatus |
Jongwook Kye, Harry J. Levinson |
2004-02-24 |
| 6673524 |
Attenuating extreme ultraviolet (EUV) phase-shifting mask fabrication method |
Kouros Ghandehari, Bhanwar Singh |
2004-01-06 |
| 6664030 |
System for and method of constructing an alternating phase-shifting mask |
Kouros Ghandehari, Bhanwar Singh |
2003-12-16 |
| 6593037 |
EUV mask or reticle having reduced reflections |
Calvin T. Gabriel, Harry J. Levinson |
2003-07-15 |
| 6589717 |
Photon assisted deposition of hard mask formation for use in manufacture of both devices and masks |
Kouros Ghandehari, Bhanwar Singh |
2003-07-08 |
