Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7276328 | Lithography mask utilizing asymmetric light source | Cyrus E. Tabery, Bruno M. LaFontaine | 2007-10-02 |
| 6950176 | Method and system for monitoring EUV lithography mask flatness | Bruno M. LaFontaine | 2005-09-27 |