Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7799514 | Surface treatment with an acidic composition to prevent substrate and environmental contamination | Ramkumar Subramanian, Bhanwar Singh | 2010-09-21 |
| 7741012 | Method for removal of immersion lithography medium in immersion lithography processes | Adam R. Pawloski, Amr Y. Abdo, Bruno M. LaFontaine, Ivan Lalovic, Harry J. Levinson +3 more | 2010-06-22 |
| 7704674 | Method for patterning a photo-resist in an immersion lithography process | Rohit Rosario | 2010-04-27 |
| 7405032 | Combination of non-lithographic shrink techniques and trim process for gate formation and line-edge roughness reduction | Srikanteswara Dakshina-Murthy, Bhanwar Singh | 2008-07-29 |
| 7262138 | Organic BARC with adjustable etch rate | Bhanwar Singh, Ramkumar Subramanian | 2007-08-28 |
| 7159205 | Use of non-lithographic shrink techniques for fabrication/making of imprints masks | Bhanwar Singh, Khoi A. Phan | 2007-01-02 |
| 7064846 | Non-lithographic shrink techniques for improving line edge roughness and using imperfect (but simpler) BARCs | Bhanwar Singh, Khoi A. Phan, Ramkumar Subramanian | 2006-06-20 |
| 7056646 | Use of base developers as immersion lithography fluid | Bhanwar Singh, Khoi A. Phan | 2006-06-06 |
| 7014966 | Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems | Adam R. Pawloski, Amr Y. Abdo, Bruno M. LaFontaine, Ivan Lalovic, Harry J. Levinson +3 more | 2006-03-21 |
| 6764946 | Method of controlling line edge roughness in resist films | — | 2004-07-20 |