| 7799514 |
Surface treatment with an acidic composition to prevent substrate and environmental contamination |
Ramkumar Subramanian, Bhanwar Singh |
2010-09-21 |
| 7741012 |
Method for removal of immersion lithography medium in immersion lithography processes |
Adam R. Pawloski, Amr Y. Abdo, Bruno M. LaFontaine, Ivan Lalovic, Harry J. Levinson +3 more |
2010-06-22 |
| 7704674 |
Method for patterning a photo-resist in an immersion lithography process |
Rohit Rosario |
2010-04-27 |
| 7405032 |
Combination of non-lithographic shrink techniques and trim process for gate formation and line-edge roughness reduction |
Srikanteswara Dakshina-Murthy, Bhanwar Singh |
2008-07-29 |
| 7262138 |
Organic BARC with adjustable etch rate |
Bhanwar Singh, Ramkumar Subramanian |
2007-08-28 |
| 7159205 |
Use of non-lithographic shrink techniques for fabrication/making of imprints masks |
Bhanwar Singh, Khoi A. Phan |
2007-01-02 |
| 7064846 |
Non-lithographic shrink techniques for improving line edge roughness and using imperfect (but simpler) BARCs |
Bhanwar Singh, Khoi A. Phan, Ramkumar Subramanian |
2006-06-20 |
| 7056646 |
Use of base developers as immersion lithography fluid |
Bhanwar Singh, Khoi A. Phan |
2006-06-06 |
| 7014966 |
Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems |
Adam R. Pawloski, Amr Y. Abdo, Bruno M. LaFontaine, Ivan Lalovic, Harry J. Levinson +3 more |
2006-03-21 |
| 6764946 |
Method of controlling line edge roughness in resist films |
— |
2004-07-20 |
