| 11313034 |
Methods for depositing amorphous silicon layers or silicon oxycarbide layers via physical vapor deposition |
Weimin Zeng, Yong Cao, Daniel Lee Diehl, Huixiong Dai, Christopher S. Ngai +2 more |
2022-04-26 |
$43,127,000 |
| 8028531 |
Mitigating heat in an integrated circuit |
Bharath Rangarajan, Bhanwar Singh |
2011-10-04 |
$5,077,000 |
| 7709373 |
System and method for imprint lithography to facilitate dual damascene integration in a single imprint act |
Srikanteswara Dakshina-Murthy, Bhanwar Singh |
2010-05-04 |
$39,204,000 |
| 7604903 |
Mask having sidewall absorbers to enable the printing of finer features in nanoprint lithography (1XMASK) |
Bhanwar Singh, Srikanteswara Dakshina-Murthy, Bharath Rangarajan, Ramkumar Subramanian |
2009-10-20 |
$11,080,000 |
| 7591902 |
Recirculation and reuse of dummy dispensed resist |
Bharath Rangarajan, Ramkumar Subramanian, Ursula Q. Quinto, Michael Templeton |
2009-09-22 |
$35,579,000 |
| 7449348 |
Feedback control of imprint mask feature profile using scatterometry and spacer etchback |
Srikanteswara Dakshina-Murthy, Bhanwar Singh, Ramkumar Subramanian |
2008-11-11 |
$5,286,000 |
| 7381278 |
Using supercritical fluids to clean lenses and monitor defects |
Ramkumar Subramanian, Bhanwar Singh, Srikanteswara Dakshina-Murthy |
2008-06-03 |
$5,507,000 |
| 7295288 |
Systems and methods of imprint lithography with adjustable mask |
Ramkumar Subramanian, Bhanwar Singh |
2007-11-13 |
$5,321,000 |
| 7289193 |
Frame structure for turbulence control in immersion lithography |
Ramkumar Subramanian, Bhanwar Singh |
2007-10-30 |
$11,707,000 |
| 7262422 |
Use of supercritical fluid to dry wafer and clean lens in immersion lithography |
Ramkumar Subramanian, Bhanwar Singh |
2007-08-28 |
|
| 7251033 |
In-situ reticle contamination detection system at exposure wavelength |
Bhanwar Singh, Bharath Rangarajan, Ramkumar Subramanian |
2007-07-31 |
$9,995,000 |
| 7224456 |
In-situ defect monitor and control system for immersion medium in immersion lithography |
Bhanwar Singh, Bharath Rangarajan, Ramkumar Subramanian |
2007-05-29 |
$8,835,000 |
| 7221060 |
Composite alignment mark scheme for multi-layers in lithography |
Bhanwar Singh, Bharath Rangarajan, Iraj Emami, Ramkumar Subramanian |
2007-05-22 |
$14,345,000 |
| 7187796 |
Systems and methods that employ exposure compensation to provide uniform CD control on reticle during fabrication |
Ramkumar Subramanian, Bhanwar Singh |
2007-03-06 |
$9,465,000 |
| 7173648 |
System and method for visually monitoring a semiconductor processing system |
Bharath Rangarajan, Bhanwar Singh, Bryan K. Choo |
2007-02-06 |
$46,392,000 |
| 7159205 |
Use of non-lithographic shrink techniques for fabrication/making of imprints masks |
Gilles Amblard, Bhanwar Singh |
2007-01-02 |
|
| 7156925 |
Using supercritical fluids to clean lenses and monitor defects |
Ramkumar Subramanian, Bhanwar Singh, Srikanteswara Dakshina-Murthy |
2007-01-02 |
|
| 7158896 |
Real time immersion medium control using scatterometry |
Bhanwar Singh, Srikanteswara Dakshina-Murthy, Ramkumar Subramanian, Bharath Rangarajan, Iraj Emami |
2007-01-02 |
|
| 7153364 |
Re-circulation and reuse of dummy-dispensed resist |
Bharath Rangarajan, Ramkumar Subramanian, Ursula Q. Quinto, Michael K. Templeton |
2006-12-26 |
$21,181,000 |
| 7148142 |
System and method for imprint lithography to facilitate dual damascene integration in a single imprint act |
Srikanteswara Dakshina-Murthy, Bhanwar Singh |
2006-12-12 |
$19,854,000 |
| 7109046 |
Surface oxide tabulation and photo process control and cost savings |
Ramkumar Subramanian, Bhanwar Singh |
2006-09-19 |
$35,691,000 |
| 7100826 |
Barcode marking of wafer products for inventory control |
Michael K. Templeton, Bhanwar Singh |
2006-09-05 |
$18,723,000 |
| 7076320 |
Scatterometry monitor in cluster process tool environment for advanced process control (APC) |
Bhanwar Singh, Ramkumar Subramanian |
2006-07-11 |
$11,570,000 |
| 7069155 |
Real time analytical monitor for soft defects on reticle during reticle inspection |
Bhanwar Singh, Bharath Rangarajan |
2006-06-27 |
$11,248,000 |
| 7065737 |
Multi-layer overlay measurement and correction technique for IC manufacturing |
Bharath Rangarajan, Bhanwar Singh |
2006-06-20 |
$7,818,000 |
