Issued Patents All Time
Showing 25 most recent of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12198985 | Contact over active gate structure | Wenhui Wang, Huixiong Dai | 2025-01-14 |
| 12201030 | Spin-orbit torque MRAM structure and manufacture thereof | Minrui Yu, Wenhui Wang, Jaesoo Ahn, Jong Mun Kim, Sahil Patel +5 more | 2025-01-14 |
| 11914299 | Lithography process window enhancement for photoresist patterning | Huixiong Dai, Mangesh Ashok BANGAR, Srinivas D. Nemani, Ellie Yieh | 2024-02-27 |
| 11880137 | Film structure for electric field guided photoresist patterning process | Huixiong Dai, Mangesh Ashok BANGAR, Srinivas D. Nemani, Ellie Yieh, Steven Hiloong WELCH | 2024-01-23 |
| 11723283 | Spin-orbit torque MRAM structure and manufacture thereof | Minrui Yu, Wenhui Wang, Jaesoo Ahn, Jong Mun Kim, Sahil Patel +5 more | 2023-08-08 |
| 11650506 | Film structure for electric field guided photoresist patterning process | Huixiong Dai, Mangesh Ashok BANGAR, Srinivas D. Nemani, Ellie Yieh, Steven Hiloong WELCH | 2023-05-16 |
| 11609505 | Apparatus and methods for verification and re-use of process fluids | Mangesh Ashok BANGAR, Gautam Pisharody, Lancelot HUANG, Alan Tso, Douglas A. Buchberger, Jr. +3 more | 2023-03-21 |
| 11437284 | Contact over active gate structure | Wenhui Wang, Huixiong Dai | 2022-09-06 |
| 11429026 | Lithography process window enhancement for photoresist patterning | Huixiong Dai, Mangesh Ashok BANGAR, Srinivas D. Nemani, Ellie Yieh | 2022-08-30 |
| 11313034 | Methods for depositing amorphous silicon layers or silicon oxycarbide layers via physical vapor deposition | Weimin Zeng, Yong Cao, Daniel Lee Diehl, Huixiong Dai, Khoi A. Phan +2 more | 2022-04-26 |
| 10957590 | Method for forming a layer | Wenhui Wang, Huixiong Dai, Liqi Wu, Wenyu Zhang, Yongmei Chen +3 more | 2021-03-23 |
| 10930556 | Contact over active gate structure | Wenhui Wang, Huixiong Dai | 2021-02-23 |
| 10930555 | Contact over active gate structure | Wenhui Wang, Huixiong Dai | 2021-02-23 |
| 10927450 | Methods and apparatus for patterning substrates using asymmetric physical vapor deposition | Bencherki Mebarki, Wenhui Wang, Huixiong Dai, Joung Joo Lee, Xianmin Tang | 2021-02-23 |
| 9865464 | Nanocrystalline diamond carbon film for 3D NAND hardmask application | Yongmei Chen, Jingjing Liu, Jun Xue, Chentsau Ying, Ludovic Godet | 2018-01-09 |
| 9815091 | Roll to roll wafer backside particle and contamination removal | Huixiong Dai, Ludovic Godet, Ellie Yieh | 2017-11-14 |
| 9728406 | Multi materials and selective removal enabled reverse tone process | Huixiong Dai | 2017-08-08 |
| 9502262 | Nanocrystalline diamond carbon film for 3D NAND hardmask application | Yongmei Chen, Jingjing Liu, Jun Xue, Chentsau Ying, Ludovic Godet | 2016-11-22 |
| 9337051 | Method for critical dimension reduction using conformal carbon films | Bencherki Mebarki, Bok Hoen Kim, Deenesh Padhi, Li Yan Miao, Pramit Manna +4 more | 2016-05-10 |
| 8501395 | Line edge roughness reduction and double patterning | Huixiong Dai, Xumou Xu | 2013-08-06 |
| 8323451 | System and method for self-aligned dual patterning | — | 2012-12-04 |
| 8293460 | Double exposure patterning with carbonaceous hardmask | Hui-Wan Chen, Chorng-Ping Chang, Yongmei Chen, Huixiong Dai, Jiahua Yu +7 more | 2012-10-23 |
| 8183150 | Semiconductor device having silicon carbide and conductive pathway interface | Judy H. Huang, Christopher Dennis Bencher, Sudha Rathi, Bok Hoen Kim | 2012-05-22 |
| 7935464 | System and method for self-aligned dual patterning | — | 2011-05-03 |
| 7335462 | Method of depositing an amorphous carbon layer | Kevin Fairbairn, Michael R. Rice, Timothy Weidman, Ian Latchford, Christopher Dennis Bencher +1 more | 2008-02-26 |