Issued Patents All Time
Showing 25 most recent of 77 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12211694 | Ultra-high modulus and etch selectivity boron-carbon hardmask films | Prashant Kumar Kulshreshtha, Ziqing Duan, Karthik Thimmavajjula Narasimha, Kwangduk Douglas Lee | 2025-01-28 |
| 11898249 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2024-02-13 |
| 11728168 | Ultra-high modulus and etch selectivity boron-carbon hardmask films | Prashant Kumar Kulshreshtha, Ziqing Duan, Karthik Thimmavajjula Narasimha, Kwangduk Douglas Lee | 2023-08-15 |
| 11613812 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2023-03-28 |
| 11365476 | Plasma enhanced chemical vapor deposition of films for improved vertical etch performance in 3D NAND memory devices | Praket P. Jha, Allen Ko, Xinhai Han, Thomas Jongwan Kwon, Byung Ho Kil +2 more | 2022-06-21 |
| 11276562 | Plasma processing using multiple radio frequency power feeds for improved uniformity | Zheng John Ye, Ganesh Balasubramanian, Thuy Britcher, Jay D. Pinson, II, Hiroji Hanawa +4 more | 2022-03-15 |
| 10971364 | Ultra-high modulus and etch selectivity boron carbon hardmask films | Prashant Kumar Kulshreshtha, Ziqing Duan, Karthik Thimmavajjula Narasimha, Kwangduk Douglas Lee | 2021-04-06 |
| 10793954 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2020-10-06 |
| 10688538 | Aluminum fluoride mitigation by plasma treatment | Vivek Shah, Anup K. Singh, Bhaskar Kumar, Ganesh Balasubramanian | 2020-06-23 |
| 10580623 | Plasma processing using multiple radio frequency power feeds for improved uniformity | Zheng John Ye, Ganesh Balasubramanian, Thuy Britcher, Jay D. Pinson, II, Hiroji Hanawa +4 more | 2020-03-03 |
| 10510518 | Methods of dry stripping boron-carbon films | Kwangduk Douglas Lee, Sudha Rathi, Ramprakash Sankarakrishnan, Martin Jay Seamons, Irfan Jamil | 2019-12-17 |
| 10483282 | VNAND tensile thick TEOS oxide | Michael Wenyoung Tsiang, Praket P. Jha, Xinhai Han, Sang Hyuk Kim, Myung Hun Ju +8 more | 2019-11-19 |
| 10475644 | Dielectric-metal stack for 3D flash memory application | Xinhai Han, Nagarajan Rajagopalan, Sung Hyun Hong, Mukund Srinivasan | 2019-11-12 |
| 10418243 | Ultra-high modulus and etch selectivity boron-carbon hardmask films | Prashant Kumar Kulshreshtha, Ziqing Duan, Karthik Thimmavajjula Narasimha, Kwangduk Douglas Lee | 2019-09-17 |
| 10403535 | Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system | Zheng John Ye, Jay D. Pinson, II, Hiroji Hanawa, Jianhua Zhou, Xing Lin +11 more | 2019-09-03 |
| 10373822 | Gas flow profile modulated control of overlay in plasma CVD films | Prashant Kumar Kulshreshtha, Sudha Rathi, Praket P. Jha, Saptarshi Basu, Kwangduk Douglas Lee +5 more | 2019-08-06 |
| 10325800 | High temperature electrostatic chucking with dielectric constant engineered in-situ charge trap materials | Prashant Kumar Kulshreshtha, Kwangduk Douglas Lee, Zheng John Ye, Swayambhu Prasad Behera, Ganesh Balasubramanian +2 more | 2019-06-18 |
| 10276353 | Dual-channel showerhead for formation of film stacks | Kaushik Alayavalli, Xinhai Han, Praket P. Jha, Masaki Ogata, Zhijun Jiang +6 more | 2019-04-30 |
| 10246772 | Plasma enhanced chemical vapor deposition of films for improved vertical etch performance in 3D NAND memory devices | Praket P. Jha, Allen Ko, Xinhai Han, Thomas Jongwan Kwon, Byung Ho Kil +2 more | 2019-04-02 |
| 10236182 | Conformal amorphous carbon for spacer and spacer protection applications | Sungjin Kim, Deenesh Padhi, Sung Hyun Hong, Derek R. Witty | 2019-03-19 |
| 10199388 | VNAND tensile thick TEOS oxide | Michael Wenyoung Tsiang, Praket P. Jha, Xinhai Han, Sang Hyuk Kim, Myung Hun Ju +8 more | 2019-02-05 |
| 10100408 | Edge hump reduction faceplate by plasma modulation | Sungwon Ha, Kwangduk Douglas Lee, Ganesh Balasubramanian, Juan Carlos Rocha-Alvarez, Martin Jay Seamons +5 more | 2018-10-16 |
| 10074534 | Ultra-conformal carbon film deposition | Swayambhu Prasad Behera, Shahid Shaikh, Pramit Manna, Mandar B. Pandit, Tersem Summan +4 more | 2018-09-11 |
| 10060032 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2018-08-28 |
| 10030306 | PECVD apparatus and process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2018-07-24 |