Issued Patents All Time
Showing 25 most recent of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12417933 | Wafer far edge temperature measurement system with lamp bank alignment | Rutvij Naik, Shujin Huang, Junwei Su | 2025-09-16 |
| 12394659 | Susceptors with film deposition control features | Shujin Huang, Junwei Su, Alexandros T. Demos, Rutvij Naik, Wentao Wang +6 more | 2025-08-19 |
| 12378665 | High temperature coatings for a preclean and etch apparatus and related methods | Peipei Gao, Alexandros T. Demos, Chuang Wei, Wentao Wang, Mingyang Ma +1 more | 2025-08-05 |
| 12354893 | Fixture and method for determining position of a target in a reaction chamber | Siyao Luan, Peipei Gao, Alexandros T. Demos, Kishor Patil | 2025-07-08 |
| 12272527 | Apparatus for use with hydrogen radicals and method of using same | Chuang Wei, Wentao Wang, Peipei Gao, Fei Wang, Bubesh Babu Jotheeswaran | 2025-04-08 |
| D1067204 | Susceptor | Shujin Huang, Junwei Su, Wentao Wang | 2025-03-18 |
| 12234554 | Semiconductor deposition reactor and components for reduced quartz devitrification | Rutvij Naik, Junwei Su, Wentao Wang, Chuqin Zhou | 2025-02-25 |
| 12112938 | Semiconductor processing preclean methods and apparatus | Chuang Wei, Aditya Chaudhury, Prahlad Kulkarni, Xiaoda Sun, Woo-Jung Shin +7 more | 2024-10-08 |
| D1031676 | Combined susceptor, support, and lift system | Peipei Gao, Wentao Wang, Han Ye, Ion Hong Chao, Siyao Luan +2 more | 2024-06-18 |
| D1030687 | Susceptor | Shujin Huang, Junwei Su, Wentao Wang | 2024-06-11 |
| 12006572 | Reactor system including a gas distribution assembly for use with activated species and method of using same | Peipei Gao, Prajwal Nagaraj, Mingyang Ma, Wentao Wang, Ion Hong Chao +3 more | 2024-06-11 |
| D1028913 | Semiconductor deposition reactor ring | Rutvij Naik, Junwei Su, Wentao Wang, Chuqin Zhou | 2024-05-28 |
| 11764101 | Susceptor for semiconductor substrate processing | Saket Rathi, Shiva K.T. Rajavelu Muralidhar, Siyao Luan, Alexandros T. Demos | 2023-09-19 |
| 11053591 | Multi-port gas injection system and reactor system including same | Mingyang Ma, Junwei Su, Alexandros T. Demos, Sam Yong Kim, Gregory Bartlett | 2021-07-06 |
| 10971389 | Multi-zone pedestal for plasma processing | Bozhi Yang, Jianhua Zhou, Dale R. DuBois, Juan Carlos Rocha-Alvarez, Ramprakash Sankarakrishnan | 2021-04-06 |
| 10950477 | Ceramic heater and esc with enhanced wafer edge performance | Jianhua Zhou, Zheng John Ye, Jian J. Chen, Juan Carlos Rocha-Alvarez | 2021-03-16 |
| 10879041 | Method and apparatus of achieving high input impedance without using ferrite materials for RF filter applications in plasma chambers | Zheng John Ye, Abdul Aziz Khaja, Amit Kumar BANSAL, Kwangduk Douglas Lee, Jianhua Zhou +2 more | 2020-12-29 |
| 10811301 | Dual-zone heater for plasma processing | Jianhua Zhou, Juan Carlos Rocha-Alvarez, Ramprakash Sankarakrishnan | 2020-10-20 |
| 10770328 | Substrate support with symmetrical feed structure | Douglas A. Buchberger, Jr., Xiaoping Zhou, Andrew Nguyen, Anchel Sheyner | 2020-09-08 |
| 10692703 | Ceramic heater with enhanced RF power delivery | Jianhua Zhou, Ningli Liu, Juan Carlos Rocha-Alvarez | 2020-06-23 |
| 10497606 | Dual-zone heater for plasma processing | Jianhua Zhou, Juan Carlos Rocha-Alvarez, Ramprakash Sankarakrishnan | 2019-12-03 |
| 10403535 | Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system | Zheng John Ye, Jay D. Pinson, II, Hiroji Hanawa, Jianhua Zhou, Ren-Guan Duan +11 more | 2019-09-03 |
| 10096494 | Substrate support with symmetrical feed structure | Douglas A. Buchberger, Jr., Xiaoping Zhou, Andrew Nguyen, Anchel Sheyner | 2018-10-09 |
| 10090187 | Multi-zone pedestal for plasma processing | Bozhi Yang, Jianhua Zhou, Dale R. DuBois, Juan Carlos Rocha-Alvarez, Ramprakash Sankarakrishnan | 2018-10-02 |
| 9948214 | High temperature electrostatic chuck with real-time heat zone regulating capability | Dmitry Lubomirsky, Jennifer Y. Sun, Sehn Thach, Michael D. Willwerth, Konstantin Makhratchev | 2018-04-17 |