Issued Patents All Time
Showing 1–25 of 75 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12428726 | Gas injection system and reactor system including same | Tomas Hernandez Acosta, Peter Westrom, Caleb Miskin, Amir Kajbafvala, Ali Moballegh | 2025-09-30 |
| 12394659 | Susceptors with film deposition control features | Shujin Huang, Junwei Su, Xing Lin, Rutvij Naik, Wentao Wang +6 more | 2025-08-19 |
| 12378665 | High temperature coatings for a preclean and etch apparatus and related methods | Peipei Gao, Xing Lin, Chuang Wei, Wentao Wang, Mingyang Ma +1 more | 2025-08-05 |
| 12354893 | Fixture and method for determining position of a target in a reaction chamber | Siyao Luan, Peipei Gao, Xing Lin, Kishor Patil | 2025-07-08 |
| D1031676 | Combined susceptor, support, and lift system | Peipei Gao, Wentao Wang, Xing Lin, Han Ye, Ion Hong Chao +2 more | 2024-06-18 |
| 12006572 | Reactor system including a gas distribution assembly for use with activated species and method of using same | Xing Lin, Peipei Gao, Prajwal Nagaraj, Mingyang Ma, Wentao Wang +3 more | 2024-06-11 |
| 11764101 | Susceptor for semiconductor substrate processing | Saket Rathi, Shiva K.T. Rajavelu Muralidhar, Siyao Luan, Xing Lin | 2023-09-19 |
| 11482533 | Apparatus and methods for plug fill deposition in 3-D NAND applications | Bokheon Kim, David Kohen | 2022-10-25 |
| 11296189 | Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures | Chi-Wei Lo, Raj Kumar | 2022-04-05 |
| 11053591 | Multi-port gas injection system and reactor system including same | Mingyang Ma, Junwei Su, Xing Lin, Sam Yong Kim, Gregory Bartlett | 2021-07-06 |
| 10797133 | Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures | Chi-Wei Lo, Raj Kumar | 2020-10-06 |
| 10236197 | Processing system containing an isolation region separating a deposition chamber from a treatment chamber | Karthik Janakiraman, Abhijit Basu Mallick, Hari Ponnekanti, Mandyam Sriram, Mukund Srinivasan +2 more | 2019-03-19 |
| 10113234 | UV assisted silylation for porous low-k film sealing | Bo Xie, Vu Ngoc Tran Nguyen, Kelvin Chan, He Ren, Kang Sub Yim +1 more | 2018-10-30 |
| 9850574 | Forming a low-k dielectric layer with reduced dielectric constant and strengthened mechanical properties | Taewan Kim, Kang Sub Yim | 2017-12-26 |
| 9793108 | Interconnect integration for sidewall pore seal and via cleanliness | He Ren, Mehul Naik, Deenesh Padhi, Priyanka DASH, Bhaskar Kumar | 2017-10-17 |
| 9659765 | Enhancement of modulus and hardness for UV-cured ultra low-k dielectric films | Kang Sub Yim, Mahendra CHHABRA, Kelvin Chan, Priyanka DASH | 2017-05-23 |
| 9646876 | Aluminum nitride barrier layer | Deenesh Padhi, Srinivas Guggilla, Bhaskar Kumar, He Ren, Priyanka DASH | 2017-05-09 |
| 9613908 | Ultra-thin dielectric diffusion barrier and etch stop layer for advanced interconnect applications | Deenesh Padhi, Yihong Chen, Kelvin Chan, Abhijit Basu Mallick, Mukund Srinivasan | 2017-04-04 |
| 9580801 | Enhancing electrical property and UV compatibility of ultrathin blok barrier film | Xiaolan Ba, Weifeng YE, Mei-Yee Shek, Yu Jin, Li-Qun Xia +1 more | 2017-02-28 |
| 9506145 | Method and hardware for cleaning UV chambers | Sanjeev Baluja, Kelvin Chan, Juan Carlos Rocha-Alvarez, Scott A. Hendrickson, Abhijit A. Kangude +6 more | 2016-11-29 |
| 9502263 | UV assisted CVD AlN film for BEOL etch stop application | Deenesh Padhi | 2016-11-22 |
| 9391024 | Multi-layer dielectric stack for plasma damage protection | Bo Xie, Kang Sub Yim, Cheng Pan, Sure Ngo, Taewan Kim | 2016-07-12 |
| 9364871 | Method and hardware for cleaning UV chambers | Sanjeev Baluja, Kelvin Chan, Juan Carlos Rocha-Alvarez, Scott A. Hendrickson, Abhijit A. Kangude +6 more | 2016-06-14 |
| 9324571 | Post treatment for dielectric constant reduction with pore generation on low K dielectric films | Kang Sub Yim, Pendar Ardalan, Sure Ngo | 2016-04-26 |
| 9312167 | Air-gap structure formation with ultra low-k dielectric layer on PECVD low-k chamber | Taewan Kim, Kang Sub Yim | 2016-04-12 |