Issued Patents All Time
Showing 25 most recent of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12198925 | Systems and methods for depositing low-k dielectric films | Shaunak Mukherjee, Deenesh Padhi, Abhijit A. Kangude, Rahul Rajeev, Shubham Chowdhuri | 2025-01-14 |
| 12119223 | Single precursor low-k film deposition and UV cure for advanced technology node | Bo Xie, Ruitong Xiong, Sure Ngo, Yijun Liu, Li-Qun Xia | 2024-10-15 |
| 11967498 | Systems and methods for depositing low-k dielectric films | Bo Xie, Yijun Liu, Li-Qun Xia, Ruitong Xiong | 2024-04-23 |
| 11621162 | Systems and methods for forming UV-cured low-κ dielectric films | Bo Xie, Ruitong Xiong, Sure Ngo, Yijun Liu, Li-Qun Xia | 2023-04-04 |
| 11600486 | Systems and methods for depositing low-κdielectric films | Bo Xie, Ruitong Xiong, Sure Ngo, Yijun Liu, Li-Qun Xia | 2023-03-07 |
| 11594409 | Systems and methods for depositing low-k dielectric films | Shaunak Mukherjee, Deenesh Padhi, Abhijit A. Kangude, Rahul Rajeev, Shubham Chowdhuri | 2023-02-28 |
| 11572622 | Systems and methods for cleaning low-k deposition chambers | Bo Xie, Ruitong Xiong, Yijun Liu, Li-Qun Xia, Sure Ngo | 2023-02-07 |
| 11393678 | Low-k dielectric films | William J. Durand, Mark Saly, Lakmal C. Kalutarage, Shaunak Mukherjee | 2022-07-19 |
| 11289369 | Low-k dielectric with self-forming barrier layer | Yi Ding, Shaunak Mukherjee, Bo Xie, Deenesh Padhi | 2022-03-29 |
| 10553427 | Low dielectric constant oxide and low resistance OP stack for 3D NAND application | Xinhai Han, Zhijun Jiang, Deenesh Padhi | 2020-02-04 |
| 10113234 | UV assisted silylation for porous low-k film sealing | Bo Xie, Alexandros T. Demos, Vu Ngoc Tran Nguyen, Kelvin Chan, He Ren +1 more | 2018-10-30 |
| 9850574 | Forming a low-k dielectric layer with reduced dielectric constant and strengthened mechanical properties | Taewan Kim, Alexandros T. Demos | 2017-12-26 |
| 9659765 | Enhancement of modulus and hardness for UV-cured ultra low-k dielectric films | Mahendra CHHABRA, Kelvin Chan, Alexandros T. Demos, Priyanka DASH | 2017-05-23 |
| 9478460 | Cobalt selectivity improvement in selective cobalt process sequence | Mei-Yee Shek, Weifeng YE, Li-Qun Xia, Kelvin Chan | 2016-10-25 |
| 9391024 | Multi-layer dielectric stack for plasma damage protection | Bo Xie, Cheng Pan, Sure Ngo, Taewan Kim, Alexandros T. Demos | 2016-07-12 |
| 9324571 | Post treatment for dielectric constant reduction with pore generation on low K dielectric films | Pendar Ardalan, Sure Ngo, Alexandros T. Demos | 2016-04-26 |
| 9312167 | Air-gap structure formation with ultra low-k dielectric layer on PECVD low-k chamber | Taewan Kim, Alexandros T. Demos | 2016-04-12 |
| 9165998 | Adhesion layer to minimize dielectric constant increase with good adhesion strength in a PECVD process | Pendar Ardalan, Sure Ngo, Alexandros T. Demos | 2015-10-20 |
| 9105695 | Cobalt selectivity improvement in selective cobalt process sequence | Mei-Yee Shek, Weifeng YE, Li-Qun Xia, Kelvin Chan | 2015-08-11 |
| 8993444 | Method to reduce dielectric constant of a porous low-k film | Kelvin Chan, Jin Xu, Alexandros T. Demos | 2015-03-31 |
| 8492170 | UV assisted silylation for recovery and pore sealing of damaged low K films | Bo Xie, Alexandros T. Demos, Thomas Nowak, Kelvin Chan | 2013-07-23 |
| 8481422 | Prevention and reduction of solvent and solution penetration into porous dielectrics using a thin barrier layer | Kelvin Chan, Khaled A. Elsheref, Alexandros T. Demos, Mei-Yee Shek, Lipan Li +1 more | 2013-07-09 |
| 8349746 | Microelectronic structure including a low k dielectric and a method of controlling carbon distribution in the structure | Bo Xie, Alexandros T. Demos, Daemian Raj, Sure Ngo | 2013-01-08 |
| 8236684 | Prevention and reduction of solvent and solution penetration into porous dielectrics using a thin barrier layer | Kelvin Chan, Khaled A. Elsheref, Alexandros T. Demos, Meiyee Shek, Lipan Li +1 more | 2012-08-07 |
| 8216861 | Dielectric recovery of plasma damaged low-k films by UV-assisted photochemical deposition | Thomas Nowak, Bo Xie, Alexandros T. Demos | 2012-07-10 |