Issued Patents All Time
Showing 25 most recent of 72 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12422210 | Techniques and device structures based upon directional dielectric deposition and bottom-up fill | M. Arif Zeeshan, Tristan Y. Ma | 2025-09-23 |
| 12406837 | Reaction cell for species sensing | Abdullah Zafar, Philip Allan Kraus | 2025-09-02 |
| 12394670 | Nucleation-free gap fill ALD process | Yihong Chen, Xinliang Lu, Srinivas Gandikota, Yong Wu, Susmit Singha Roy +1 more | 2025-08-19 |
| 12368024 | Methods and apparatus for processing a substrate | Abdullah Zafar, William J. Durand, Xinyuan Chong, Kenric Choi, Weize Hu +4 more | 2025-07-22 |
| 12325910 | Deposition of conformal and gap-fill amorphous silicon thin-films | Yihong Chen, Rui Cheng, Pramit Manna, Karthik Janakiraman, Abhijit Basu Mallick +1 more | 2025-06-10 |
| 12300491 | Deposition of semiconductor integration films | Lakmal C. Kalutarage, Mark Saly, Bhaskar Jyoti Bhuyan, Thomas Knisley, Regina Freed +3 more | 2025-05-13 |
| 12282256 | Photoresist deposition using independent multichannel showerhead | Farzad Houshmand, Wayne French, Anantha K. Subramani, Lakmal C. Kalutarage, Mark Saly | 2025-04-22 |
| 12228534 | Capacitive sensor for monitoring gas concentration | Xiaopu Li, Kallol Bera, Yaoling Pan, Amir Bayati, Philip Allan Kraus +2 more | 2025-02-18 |
| 12131948 | Techniques for void-free material depositions | M. Arif Zeeshan, Shantanu Kallakuri, Sony Varghese, John Hautala | 2024-10-29 |
| 12094707 | Plasma enhanced CVD with periodic high voltage bias | Travis Koh, Simon Huang, Philip Allan Kraus | 2024-09-17 |
| 12012652 | Single process volume to perform high-pressure and low-pressure processes with features to reduce cross-contamination | Yang Guo, Ashish Goel, Anantha K. Subramani, Philip Allan Kraus | 2024-06-18 |
| 11959868 | Capacitive sensor for monitoring gas concentration | Xiaopu Li, Kallol Bera, Yaoling Pan, Amir Bayati, Philip Allan Kraus +2 more | 2024-04-16 |
| 11956978 | Techniques and device structure based upon directional seeding and selective deposition | M. Arif Zeeshan, Shantanu Kallakuri, Sony Varghese | 2024-04-09 |
| 11955331 | Method of forming silicon nitride films using microwave plasma | Hanhong Chen, Philip Allan Kraus, Thai Cheng Chua | 2024-04-09 |
| 11887856 | Enhanced spatial ALD of metals through controlled precursor mixing | Yihong Chen, Jared Ahmad Lee, Kevin Griffin, Srinivas Gandikota, Joseph Yudovsky +1 more | 2024-01-30 |
| 11886120 | Deposition of semiconductor integration films | Lakmal C. Kalutarage, Mark Saly, Bhaskar Jyoti Bhuyan, Thomas Knisley, Regina Freed +3 more | 2024-01-30 |
| 11817320 | CVD based oxide-metal multi structure for 3D NAND memory devices | Susmit Singha Roy, Hien Minh Le, Sanjay Kamath, Abhijit Basu Mallick, Srinivas Gandikota +1 more | 2023-11-14 |
| 11776805 | Selective oxidation and simplified pre-clean | Bencherki Mebarki, Joung Joo Lee, Yi Xu, Yu Lei, Xianmin Tang +2 more | 2023-10-03 |
| 11749564 | Techniques for void-free material depositions | M. Arif Zeeshan, Shantanu Kallakuri, Sony Varghese, John Hautala | 2023-09-05 |
| 11702742 | Methods of forming nucleation layers with halogenated silanes | Yihong Chen | 2023-07-18 |
| 11621160 | Doped and undoped vanadium oxides for low-k spacer applications | Eswaranand Venkatasubramanian, Srinivas Gandikota, Atashi Basu, Abhijit Basu Mallick | 2023-04-04 |
| 11562902 | Hydrogen management in plasma deposited films | Rui Cheng, Diwakar Kedlaya, Karthik Janakiraman, Gautam K. Hemani, Krishna Nittala +4 more | 2023-01-24 |
| 11562904 | Deposition of semiconductor integration films | Lakmal C. Kalutarage, Mark Saly, Bhaskar Jyoti Bhuyan, Thomas Knisley, Regina Freed +3 more | 2023-01-24 |
| 11551905 | Resonant process monitor | Yaoling Pan, Vijaykumar Krithivasan, Shimin Mao, Michael D. Willwerth, Anantha K. Subramani +5 more | 2023-01-10 |
| 11459652 | Techniques and device structures based upon directional dielectric deposition and bottom-up fill | M. Arif Zeeshan, Tristan Y. Ma | 2022-10-04 |