Issued Patents All Time
Showing 51–72 of 72 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9659765 | Enhancement of modulus and hardness for UV-cured ultra low-k dielectric films | Kang Sub Yim, Mahendra CHHABRA, Alexandros T. Demos, Priyanka DASH | 2017-05-23 |
| 9613908 | Ultra-thin dielectric diffusion barrier and etch stop layer for advanced interconnect applications | Deenesh Padhi, Yihong Chen, Abhijit Basu Mallick, Alexandros T. Demos, Mukund Srinivasan | 2017-04-04 |
| 9508545 | Selectively lateral growth of silicon oxide thin film | Yihong Chen, Shaunak Mukherjee, Abhijit Basu Mallick | 2016-11-29 |
| 9506145 | Method and hardware for cleaning UV chambers | Sanjeev Baluja, Alexandros T. Demos, Juan Carlos Rocha-Alvarez, Scott A. Hendrickson, Abhijit A. Kangude +6 more | 2016-11-29 |
| 9478460 | Cobalt selectivity improvement in selective cobalt process sequence | Mei-Yee Shek, Weifeng YE, Li-Qun Xia, Kang Sub Yim | 2016-10-25 |
| 9364871 | Method and hardware for cleaning UV chambers | Sanjeev Baluja, Alexandros T. Demos, Juan Carlos Rocha-Alvarez, Scott A. Hendrickson, Abhijit A. Kangude +6 more | 2016-06-14 |
| 9330231 | Method for determining a flow behavior of a medium | Goetz G. FELDMANN | 2016-05-03 |
| 9330900 | Layer-by-layer deposition of carbon-doped oxide films through cyclical silylation | — | 2016-05-03 |
| 9123532 | Low-k dielectric damage repair by vapor-phase chemical exposure | Alexandros T. Demos | 2015-09-01 |
| 9105695 | Cobalt selectivity improvement in selective cobalt process sequence | Mei-Yee Shek, Weifeng YE, Li-Qun Xia, Kang Sub Yim | 2015-08-11 |
| 9058980 | UV-assisted photochemical vapor deposition for damaged low K films pore sealing | Bo Xie, Alexandros T. Demos | 2015-06-16 |
| 8993444 | Method to reduce dielectric constant of a porous low-k film | Jin Xu, Kang Sub Yim, Alexandros T. Demos | 2015-03-31 |
| 8877659 | Low-k dielectric damage repair by vapor-phase chemical exposure | Alexandros T. Demos | 2014-11-04 |
| 8702870 | Superimposition of rapid periodic and extensive post multiple substrate UV-ozone clean sequences for high throughput and stable substrate to substrate performance | Sang In Yi, Thomas Nowak, Alexandros T. Demos | 2014-04-22 |
| 8492170 | UV assisted silylation for recovery and pore sealing of damaged low K films | Bo Xie, Alexandros T. Demos, Kang Sub Yim, Thomas Nowak | 2013-07-23 |
| 8481422 | Prevention and reduction of solvent and solution penetration into porous dielectrics using a thin barrier layer | Khaled A. Elsheref, Alexandros T. Demos, Mei-Yee Shek, Lipan Li, Li-Qun Xia +1 more | 2013-07-09 |
| 8236684 | Prevention and reduction of solvent and solution penetration into porous dielectrics using a thin barrier layer | Khaled A. Elsheref, Alexandros T. Demos, Meiyee Shek, Lipan Li, Li-Qun Xia +1 more | 2012-08-07 |
| 7947611 | Method of improving initiation layer for low-k dielectric film by digital liquid flow meter | Dustin W. Ho, Juan Carlos Rocha-Alvarez, Alexandros T. Demos, Nagarajan Rajagopalan, Visweswaren Sivaramakrishnan | 2011-05-24 |
| 7563734 | Chemical vapor deposition of antimicrobial polymer coatings | Karen K. Gleason, Tyler Martin | 2009-07-21 |
| 7431969 | Chemical vapor deposition of hydrogel films | Karen K. Gleason | 2008-10-07 |
| 7410916 | Method of improving initiation layer for low-k dielectric film by digital liquid flow meter | Dustin W. Ho, Juan Carlos Rocha-Alvarez, Alexandros T. Demos, Nagarajan Rajagopalan, Visweswaren Sivaramakrishnan | 2008-08-12 |
| 7297376 | Method to reduce gas-phase reactions in a PECVD process with silicon and organic precursors to deposit defect-free initial layers | Kang Sub Yim, Nagarajan Rajagopalan, Josephine Ju-Hwei Chang Liu, Sang-Hoon Ahn, Yi Zheng +3 more | 2007-11-20 |