DH

Dustin W. Ho

Applied Materials: 12 patents #1,120 of 7,310Top 20%
TL The Boc Group Limited: 1 patents #283 of 612Top 50%
Overall (All Time): #345,819 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11114285 Apparatus for exhaust cooling Michael S. Cox, Brian T. West, Roger M. Johnson, Yan Rozenzon, Dinkesh Somanna 2021-09-07
8382885 Fluid filtration for substrate processing chamber Juan Carlos Rocha-Alvarez, Hichem M'Saad 2013-02-26
8338809 Ultraviolet reflector with coolant gas holes and method Yao-Hung YANG, Tuan Nguyen, Sanjeev Baluja, Andrzej Kaszuba, Juan Carlos Rocha +1 more 2012-12-25
8203126 Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation Juan Carlos Rocha-Alvarez, Thomas Nowak, Dale R. Du Bois, Sanjeev Baluja, Scott A. Hendrickson +2 more 2012-06-19
7964858 Ultraviolet reflector with coolant gas holes and method Yao-Hung YANG, Tuan Nguyen, Sanjeev Baluja, Andrzej Kaszuba, Juan Carlos Rocha +1 more 2011-06-21
7947611 Method of improving initiation layer for low-k dielectric film by digital liquid flow meter Juan Carlos Rocha-Alvarez, Alexandros T. Demos, Kelvin Chan, Nagarajan Rajagopalan, Visweswaren Sivaramakrishnan 2011-05-24
7777198 Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation Juan Carlos Rocha-Alvarez, Thomas Nowak, Dale R. Du Bois, Sanjeev Baluja, Scott A. Hendrickson +2 more 2010-08-17
7692171 Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors Andrzei Kaszuba, Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Tom K. Cho, Hichem M'Saad +2 more 2010-04-06
7663121 High efficiency UV curing system Thomas Nowak, Juan Carlos Rocha-Alvarez, Andrzej Kaszuba, Scott A. Hendrickson, Sanjeev Baluja +3 more 2010-02-16
7611996 Multi-stage curing of low K nano-porous films Francimar Schmitt, Yi Zheng, Kang Sub Yim, Sang-Hoon Ahn, Lester D'Cruz +4 more 2009-11-03
7566891 Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors Juan Carlos Rocha-Alvarez, Thomas Nowak, Dale R. Du Bois, Sanjeev Baluja, Scott A. Hendrickson +2 more 2009-07-28
7501354 Formation of low K material utilizing process having readily cleaned by-products Derek R. Witty, Helen R. Armer, Hichem M'Saad 2009-03-10
7410916 Method of improving initiation layer for low-k dielectric film by digital liquid flow meter Juan Carlos Rocha-Alvarez, Alexandros T. Demos, Kelvin Chan, Nagarajan Rajagopalan, Visweswaren Sivaramakrishnan 2008-08-12
6576044 Process for the purification of nitric oxide Deming Tang, Walter H. Whitlock 2003-06-10