Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11728141 | Gas hub for plasma reactor | Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna | 2023-08-15 |
| 11251067 | Pedestal lift for semiconductor processing chambers | Brian T. West, Miroslav Gelo, Roger M. Johnson, Mark William Covington, Soundarrajan JEMBULINGAM +2 more | 2022-02-15 |
| 11244811 | Plasma reactor with highly symmetrical four-fold gas injection | Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna | 2022-02-08 |
| 11139150 | Nozzle for multi-zone gas injection assembly | Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna | 2021-10-05 |
| 11114285 | Apparatus for exhaust cooling | Michael S. Cox, Brian T. West, Roger M. Johnson, Dinkesh Somanna, Dustin W. Ho | 2021-09-07 |
| 10861681 | Apparatus for collection and subsequent reaction of liquid and solid effluent into gaseous effluent | James L'HEUREUX, Ryan T. DOWNEY, David Muquing HOU | 2020-12-08 |
| 10410841 | Side gas injection kit for multi-zone gas injection assembly | Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna | 2019-09-10 |
| 10163606 | Plasma reactor with highly symmetrical four-fold gas injection | Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna | 2018-12-25 |
| 10008368 | Multi-zone gas injection assembly with azimuthal and radial distribution control | Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna | 2018-06-26 |
| 9441295 | Multi-channel gas-delivery system | Robert T. Trujillo, Steven C. Beese | 2016-09-13 |
| 9240513 | Dynamic support system for quartz process chamber | Robert T. Trujillo, Steven C. Beese | 2016-01-19 |
| 8968473 | Stackable multi-port gas nozzles | Steve Poppe, Peijun Ding | 2015-03-03 |
| 8845809 | Scalable, high-throughput, multi-chamber epitaxial reactor for silicon deposition | Steve Poppe, David Z. Chen, Xiaole Yan, Peijun Ding, Zheng Xu | 2014-09-30 |
| 8652259 | Scalable, high-throughput, multi-chamber epitaxial reactor for silicon deposition | Steve Poppe, David Z. Chen, Xiaole Yan, Peijun Ding, Zheng Xu | 2014-02-18 |
| 8562745 | Stable wafer-carrier system | Robert T. Trujillo, Steven C. Beese | 2013-10-22 |
| 6916399 | Temperature controlled window with a fluid supply system | Gil Lavi, Evans Lee, Dong Ho Choi, Matt Hamrah, Paul Luscher +3 more | 2005-07-12 |
| 5716484 | Contaminant reduction improvements for plasma etch chambers | Greg Blackburn, Joseph Kava, Richard McGovern | 1998-02-10 |
| 5714036 | Chlorine reduction module | George Wong, Jeffrey P. Schmidt | 1998-02-03 |
| 5693179 | Contaminant reduction improvements for plasma etch chambers | Greg Blackburn, Joseph Kava, Richard McGovern | 1997-12-02 |
| 5484486 | Quick release process kit | Greg Blackburn, Donald L. Johnson, Richard McGovern | 1996-01-16 |