| 11728141 |
Gas hub for plasma reactor |
Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna |
2023-08-15 |
$42,730,000 |
| 11251067 |
Pedestal lift for semiconductor processing chambers |
Brian T. West, Miroslav Gelo, Roger M. Johnson, Mark William Covington, Soundarrajan JEMBULINGAM +2 more |
2022-02-15 |
$65,265,000 |
| 11244811 |
Plasma reactor with highly symmetrical four-fold gas injection |
Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna |
2022-02-08 |
$81,917,000 |
| 11139150 |
Nozzle for multi-zone gas injection assembly |
Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna |
2021-10-05 |
$94,201,000 |
| 11114285 |
Apparatus for exhaust cooling |
Michael S. Cox, Brian T. West, Roger M. Johnson, Dinkesh Somanna, Dustin W. Ho |
2021-09-07 |
$49,370,000 |
| 10861681 |
Apparatus for collection and subsequent reaction of liquid and solid effluent into gaseous effluent |
James L'HEUREUX, Ryan T. DOWNEY, David Muquing HOU |
2020-12-08 |
$52,028,000 |
| 10410841 |
Side gas injection kit for multi-zone gas injection assembly |
Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna |
2019-09-10 |
$15,043,000 |
| 10163606 |
Plasma reactor with highly symmetrical four-fold gas injection |
Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna |
2018-12-25 |
|
| 10008368 |
Multi-zone gas injection assembly with azimuthal and radial distribution control |
Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna |
2018-06-26 |
$35,949,000 |
| 9441295 |
Multi-channel gas-delivery system |
Robert T. Trujillo, Steven C. Beese |
2016-09-13 |
$36,033,000 |
| 9240513 |
Dynamic support system for quartz process chamber |
Robert T. Trujillo, Steven C. Beese |
2016-01-19 |
$48,254,000 |
| 8968473 |
Stackable multi-port gas nozzles |
Steve Poppe, Peijun Ding |
2015-03-03 |
|
| 8845809 |
Scalable, high-throughput, multi-chamber epitaxial reactor for silicon deposition |
Steve Poppe, David Z. Chen, Xiaole Yan, Peijun Ding, Zheng Xu |
2014-09-30 |
|
| 8652259 |
Scalable, high-throughput, multi-chamber epitaxial reactor for silicon deposition |
Steve Poppe, David Z. Chen, Xiaole Yan, Peijun Ding, Zheng Xu |
2014-02-18 |
|
| 8562745 |
Stable wafer-carrier system |
Robert T. Trujillo, Steven C. Beese |
2013-10-22 |
|
| 6916399 |
Temperature controlled window with a fluid supply system |
Gil Lavi, Evans Lee, Dong Ho Choi, Matt Hamrah, Paul Luscher +3 more |
2005-07-12 |
|
| 5716484 |
Contaminant reduction improvements for plasma etch chambers |
Greg Blackburn, Joseph Kava, Richard McGovern |
1998-02-10 |
$89,643,000 |
| 5714036 |
Chlorine reduction module |
George Wong, Jeffrey P. Schmidt |
1998-02-03 |
$87,756,000 |
| 5693179 |
Contaminant reduction improvements for plasma etch chambers |
Greg Blackburn, Joseph Kava, Richard McGovern |
1997-12-02 |
$153,006,000 |
| 5484486 |
Quick release process kit |
Greg Blackburn, Donald L. Johnson, Richard McGovern |
1996-01-16 |
$37,781,000 |
