IY

Imad Yousif

Applied Materials: 29 patents #387 of 7,310Top 6%
Overall (All Time): #129,673 of 4,157,543Top 4%
29
Patents All Time

Issued Patents All Time

Showing 25 most recent of 29 patents

Patent #TitleCo-InventorsDate
12094752 Wafer edge ring lifting solution Michael R. Rice, Yogananda Sarode Vishwanath, Sunil Srinivasan, Rajinder Dhindsa, Steven E. Babayan +2 more 2024-09-17
11728141 Gas hub for plasma reactor Yan Rozenzon, Kyle Tantiwong, Vladimir Knyazik, Bojenna Keating, Samer Banna 2023-08-15
11574831 Method and apparatus for substrate transfer and radical confinement Jared Ahmad Lee, Martin Jeffrey Salinas, Paul B. Reuter, Aniruddha Pal 2023-02-07
11393710 Wafer edge ring lifting solution Michael R. Rice, Yogananda Sarode Vishwanath, Sunil Srinivasan, Rajinder Dhindsa, Steven E. Babayan +2 more 2022-07-19
11244811 Plasma reactor with highly symmetrical four-fold gas injection Yan Rozenzon, Kyle Tantiwong, Vladimir Knyazik, Bojenna Keating, Samer Banna 2022-02-08
11177136 Abatement and strip process chamber in a dual loadlock configuration Jared Ahmad Lee, Martin Jeffrey Salinas, Paul B. Reuter, Aniruddha Pal 2021-11-16
11171008 Abatement and strip process chamber in a dual load lock configuration Jared Ahmad Lee, Martin Jeffrey Salinas, Paul B. Reuter, Aniruddha Pal 2021-11-09
11139150 Nozzle for multi-zone gas injection assembly Yan Rozenzon, Kyle Tantiwong, Vladimir Knyazik, Bojenna Keating, Samer Banna 2021-10-05
10825708 Process kit components for use with an extended and independent RF powered cathode substrate for extreme edge tunability Valentin N. Todorow, Samer Banna, Albert Wang, Gary Leray 2020-11-03
10468282 Method and apparatus for substrate transfer and radical confinement Jared Ahmad Lee, Martin Jeff Salinas, Paul B. Reuter, Aniruddha Pal 2019-11-05
10453694 Abatement and strip process chamber in a dual loadlock configuration Jared Ahmad Lee, Martin Jeffrey Salinas, Paul B. Reuter, Aniruddha Pal 2019-10-22
10410841 Side gas injection kit for multi-zone gas injection assembly Yan Rozenzon, Kyle Tantiwong, Vladimir Knyazik, Bojenna Keating, Samer Banna 2019-09-10
10204805 Thin heated substrate support Martin Jeffrey Salinas, Paul B. Reuter, Aniruddha Pal, Jared Ahmad Lee 2019-02-12
10163606 Plasma reactor with highly symmetrical four-fold gas injection Yan Rozenzon, Kyle Tantiwong, Vladimir Knyazik, Bojenna Keating, Samer Banna 2018-12-25
10090181 Method and apparatus for substrate transfer and radical confinement Jared Ahmad Lee, Martin Jeffrey Salinas, Paul B. Reuter, Aniruddha Pal 2018-10-02
10008368 Multi-zone gas injection assembly with azimuthal and radial distribution control Yan Rozenzon, Kyle Tantiwong, Vladimir Knyazik, Bojenna Keating, Samer Banna 2018-06-26
9947559 Thermal management of edge ring in semiconductor processing Aniruddha Pal, Martin Jeffrey Salinas, Dmitry Lubomirsky, Andrew Nguyen 2018-04-17
9464732 Apparatus for uniform pumping within a substrate process chamber Paul B. Reuter, Martin Jeffrey Salinas, Jared Ahmad Lee 2016-10-11
9330887 Plasma reactor with tiltable overhead RF inductive source Kenneth S. Collins, Andrew Nguyen, Martin Jeffrey Salinas, Ming Xu 2016-05-03
8988848 Extended and independent RF powered cathode substrate for extreme edge tunability Valentin N. Todorow, Samer Banna, Albert Wang, Gary Leray 2015-03-24
D699692 Upper liner 2014-02-18
8414736 Plasma reactor with tiltable overhead RF inductive source Kenneth S. Collins, Andrew Nguyen, Martin Jeffrey Salinas, Ming Xu 2013-04-09
8329593 Method and apparatus for removing polymer from the wafer backside and edge Anchel Sheyner, Ajit Balakrishna, Nancy Fung, Ying Rui, Martin Jeffrey Salinas +2 more 2012-12-11
8092605 Magnetic confinement of a plasma Steven C. Shannon, Masao Drexel, James A. Stinnett, Ying Rui, Ying Xiao +1 more 2012-01-10
7967996 Process for wafer backside polymer removal and wafer front side photoresist removal Kenneth S. Collins, Hiroji Hanawa, Andrew Nguyen, Shahid Rauf, Ajit Balakrishna +6 more 2011-06-28