Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
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Gary Leray — 16 Patents

Applied Materials: 15 patents #912 of 7,310Top 15%
CNCNRS: 1 patents #3,857 of 11,908Top 35%
EPEcole Polytechnique: 1 patents #79 of 320Top 25%
Mountain View, CA: #1,359 of 11,022 inventorsTop 15%
California: #37,952 of 386,348 inventorsTop 10%
Overall (All Time): #284,196 of 4,157,543Top 7%
16 Patents All Time
Gary Leray has been granted 16 US patents while listed as an inventor at Applied Materials. The first was granted in 2014 and the most recent in September 2023. Gary Leray ranks #284,196 of 4,157,543 US inventors in our database (top 6.8%). Patent records list Gary Leray in Mountain View, CA, US.

Patents per Year

Patents granted per year, 2014 to 2023Bar chart with a peak of 4 patents in 2015.peak 42014: 2 patents20142015: 4 patents20152016: 2 patents20162017: 2 patents20172019: 2 patents20192020: 2 patents20202021: 1 patents20212023: 1 patents2023

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
11749504 Methods and apparatus for common excitation of frequency generators 2023-09-05 $42,922,000
11177115 Dual-level pulse tuning Valentin N. Todorow, James Rogers 2021-11-16 $84,921,000
10825708 Process kit components for use with an extended and independent RF powered cathode substrate for extreme edge tunability Valentin N. Todorow, Samer Banna, Imad Yousif, Albert Wang 2020-11-03 $108,601,000
10553400 Methods and apparatus for frequency generator and match network communication 2020-02-04 $27,329,000
10290469 Enhanced plasma source for a plasma reactor Valentin N. Todorow, Michael D. Willwerth, Li-Sheng Chiang 2019-05-14 $40,982,000
10233912 Electronegative plasma thruster with optimized injection Pascal Chabert, Ane Aanesland, Albert Meige 2019-03-19
9839109 Dynamic control band for RF plasma current ratio control 2017-12-05 $41,374,000
9595423 Frequency tuning for dual level radio frequency (RF) pulsing Valentin N. Todorow 2017-03-14 $16,778,000
9406540 Self-bias calculation on a substrate in a process chamber with bias power for single or multiple frequencies Valentin N. Todorow, Samer Banna 2016-08-02 $10,698,000
9318304 Frequency tuning for dual level radio frequency (RF) pulsing Valentin N. Todorow 2016-04-19 $19,369,000
9190247 Measurement of plural RF sensor devices in a pulsed RF plasma reactor 2015-11-17 $15,900,000
9129777 Electron beam plasma source with arrayed plasma sources for uniform plasma generation Leonid Dorf, Shahid Rauf, Kenneth S. Collins, Nipun Misra, James D. Carducci +1 more 2015-09-08 $6,271,000
8988848 Extended and independent RF powered cathode substrate for extreme edge tunability Valentin N. Todorow, Samer Banna, Imad Yousif, Albert Wang 2015-03-24 $15,444,000
8951384 Electron beam plasma source with segmented beam dump for uniform plasma generation Leonid Dorf, Shahid Rauf, Kenneth S. Collins, Nipun Misra, James D. Carducci +1 more 2015-02-10 $19,320,000
8894805 Electron beam plasma source with profiled magnet shield for uniform plasma generation Kallol Bera, Shahid Rauf, Leonid Dorf, Kenneth S. Collins, Ajit Balakrishna 2014-11-25 $12,494,000
8773020 Apparatus for forming a magnetic field and methods of use thereof Shahid Rauf, Valentin N. Todorow 2014-07-08 $11,201,000