Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11935724 | Symmetric VHF source for a plasma reactor | Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Kenneth S. Collins +3 more | 2024-03-19 |
| 11587766 | Symmetric VHF source for a plasma reactor | Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Kenneth S. Collins +3 more | 2023-02-21 |
| 11043361 | Symmetric VHF source for a plasma reactor | Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Kenneth S. Collins +3 more | 2021-06-22 |
| 9824862 | Symmetric VHF source for a plasma reactor | Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Kenneth S. Collins +3 more | 2017-11-21 |
| 9721760 | Electron beam plasma source with reduced metal contamination | Leonid Dorf, Shahid Rauf, Kenneth S. Collins, Kartik Ramaswamy, Gonzalo Monroy +2 more | 2017-08-01 |
| 9653267 | Temperature controlled chamber liner | James D. Carducci, Kallol Bera, Larry D. Elizaga | 2017-05-16 |
| 9443700 | Electron beam plasma source with segmented suppression electrode for uniform plasma generation | Leonid Dorf, Shahid Rauf, Kenneth S. Collins, Kartik Ramaswamy, James D. Carducci +1 more | 2016-09-13 |
| 9269546 | Plasma reactor with electron beam plasma source having a uniform magnetic field | Ming-Feng Wu, Ajit Balakrishna, Leonid Dorf, Shahid Rauf, Kenneth S. Collins | 2016-02-23 |
| 9129777 | Electron beam plasma source with arrayed plasma sources for uniform plasma generation | Leonid Dorf, Shahid Rauf, Kenneth S. Collins, James D. Carducci, Gary Leray +1 more | 2015-09-08 |
| 8951384 | Electron beam plasma source with segmented beam dump for uniform plasma generation | Leonid Dorf, Shahid Rauf, Kenneth S. Collins, James D. Carducci, Gary Leray +1 more | 2015-02-10 |
| 8920597 | Symmetric VHF source for a plasma reactor | Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Kenneth S. Collins +3 more | 2014-12-30 |
| 8734664 | Method of differential counter electrode tuning in an RF plasma reactor | Yang Yang, Kartik Ramaswamy, Kenneth S. Collins, Steven Lane, Douglas A. Buchberger, Jr. +1 more | 2014-05-27 |
| 7786024 | Selective processing of semiconductor nanowires by polarized visible radiation | David Stumbo, Yaoling Pan, Costas P. Grigoropoulos | 2010-08-31 |