Issued Patents All Time
Showing 25 most recent of 241 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12400845 | Ion energy control on electrodes in a plasma reactor | Yue Guo, Yang Yang, Haitao Wang | 2025-08-26 |
| 12368020 | Pulsed voltage source for plasma processing applications | A N M Wasekul AZAD, Yang Yang, Yue Guo, Fernando Silveira | 2025-07-22 |
| 12347647 | Plasma excitation with ion energy control | Yang Yang, Yue Guo | 2025-07-01 |
| 12334304 | System and methods for implementing a micro pulsing scheme using dual independent pulsers | A N M Wasekul AZAD, Yue Guo, Nicolas Bright, Yang Yang | 2025-06-17 |
| 12334383 | Substrate support gap pumping to prevent glow discharge and light-up | James D. Carducci, Kenneth S. Collins, Michael R. Rice, Silverst Rodrigues, Yang Yang | 2025-06-17 |
| 12293897 | Radio frequency diverter assembly enabling on-demand different spatial | Yue Guo, A N M Wasekul AZAD, Yang Yang, Nicolas Bright | 2025-05-06 |
| 12278089 | Plasma uniformity control system and methods | Michael Stearns, Carlaton WONG | 2025-04-15 |
| 12272524 | Wideband variable impedance load for high volume manufacturing qualification and on-site diagnostics | Yue Guo, Jie Yu, Yang Yang | 2025-04-08 |
| 12266506 | Scanning impedance measurement in a radio frequency plasma processing chamber | Yue Guo, Nicolas Bright, Yang Yang, A N M Wasekul AZAD | 2025-04-01 |
| 12261019 | Voltage pulse time-domain multiplexing | Yang Yang, Yue Guo | 2025-03-25 |
| 12237148 | Plasma processing assembly using pulsed-voltage and radio-frequency power | Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy +4 more | 2025-02-25 |
| 12224192 | Bowed substrate clamping method, apparatus, and system | Arvinder Chadha | 2025-02-11 |
| 12205797 | Solid-state switch based high-speed pulser with plasma IEDF modification capability through multilevel output functionality | Yue Guo, Yang Yang, Fernando Silveira, A. N. M. Wasekul Azad | 2025-01-21 |
| 12183605 | In-situ semiconductor processing chamber temperature apparatus | Andrew Nguyen, Yogananda SARODE, Xue Yang Chang | 2024-12-31 |
| 12163218 | Continuous liner for use in a processing chamber | James D. Carducci, Kenneth S. Collins | 2024-12-10 |
| 12136537 | Cost effective radio frequency impedance matching networks | Yue Guo, Farhad Moghadam, Yang Yang | 2024-11-05 |
| 12130561 | Gas distribution plate with UV blocker | Michael D. Willwerth, Yang Yang | 2024-10-29 |
| 12125689 | Methods and apparatus for toroidal plasma generation | Andrew Nguyen, Yang Yang, Sathya Swaroop Ganta, Fernando Silveira, Yue Guo +1 more | 2024-10-22 |
| 12111341 | In-situ electric field detection method and apparatus | Yue Guo, Yang Yang, Fernando Silveira, A N M Wasekul AZAD | 2024-10-08 |
| 12106938 | Distortion current mitigation in a radio frequency plasma processing chamber | Yue Guo, Yang Yang | 2024-10-01 |
| 12094716 | Chambers and coatings for reducing backside damage | Leonard Tedeschi, Benjamin Schwarz, Changgong Wang, Vahid Firouzdor, Sumanth Banda +1 more | 2024-09-17 |
| 12080519 | Smart dynamic load simulator for RF power delivery control system | Jie Yu, Yue Guo, Tao Zhang, Shahid Rauf, John C. Forster +2 more | 2024-09-03 |
| 12046449 | Methods and apparatus for processing a substrate | Yue Guo, Katsumasa Kawasaki, Yang Yang, Nicolas Bright | 2024-07-23 |
| 12020901 | RF impedance matching networks for substrate processing platform | Yue Guo, Krishna Kumar Kuttannair, Jie Yu, Yang Yang | 2024-06-25 |
| 11972924 | Pulsed voltage source for plasma processing applications | A N M Wasekul AZAD, Yang Yang, Yue Guo, Fernando Silveira | 2024-04-30 |