| 12354847 |
Methods and apparatus for conductance liners in semiconductor process chambers |
Timothy Joseph Franklin, Rajinder Dhindsa, Carlaton WONG |
2025-07-08 |
| 12255051 |
Multi-shape voltage pulse trains for uniformity and etch profile tuning |
Linying Cui, James Rogers, Rajinder Dhindsa, Keith HERNANDEZ |
2025-03-18 |
| D1066275 |
Baffle for anti-rotation process kit for substrate processing chamber |
Rohan Rane, Xue Yang Chang, Timothy Joseph Franklin |
2025-03-11 |
| 12237148 |
Plasma processing assembly using pulsed-voltage and radio-frequency power |
Leonid Dorf, Rajinder Dhindsa, James Rogers, Evgeny Kamenetskiy, Yue Guo +4 more |
2025-02-25 |
| D1049067 |
Ring for an anti-rotation process kit for a substrate processing chamber |
Rohan Rane, Xue Yang Chang, Timothy Joseph Franklin |
2024-10-29 |
| 12009236 |
Sensors and system for in-situ edge ring erosion monitor |
Yaoling Pan, Patrick Tae, Michael D. Willwerth, Leonard Tedeschi, Philip Allan Kraus +5 more |
2024-06-11 |
| 11894255 |
Sheath and temperature control of process kit |
Jaeyong Cho, Kartik Ramaswamy |
2024-02-06 |
| 11848176 |
Plasma processing using pulsed-voltage and radio-frequency power |
Leonid Dorf, Rajinder Dhindsa, James Rogers, Evgeny Kamenetskiy, Yue Guo +3 more |
2023-12-19 |
| 11776789 |
Plasma processing assembly using pulsed-voltage and radio-frequency power |
Leonid Dorf, Rajinder Dhindsa, James Rogers, Evgeny Kamenetskiy, Yue Guo +4 more |
2023-10-03 |
| 11764041 |
Adjustable thermal break in a substrate support |
Alvaro Garcia de Gorordo, Andreas Schmid, Stephen Prouty, Andrew Antoine NOUJAIM |
2023-09-19 |
| 11462388 |
Plasma processing assembly using pulsed-voltage and radio-frequency power |
Leonid Dorf, Rajinder Dhindsa, James Rogers, Evgeny Kamenetskiy, Yue Guo +4 more |
2022-10-04 |
| 11462389 |
Pulsed-voltage hardware assembly for use in a plasma processing system |
Leonid Dorf, Rajinder Dhindsa, James Rogers, Evgeny Kamenetskiy, Yue Guo +5 more |
2022-10-04 |
| 10975469 |
Plasma resistant coating of porous body by atomic layer deposition |
Vahid Firouzdor, Sumanth Banda, Rajinder Dhindsa, Dana Marie Lovell |
2021-04-13 |
| 10745805 |
Plasma resistant coating of porous body by atomic layer deposition |
Vahid Firouzdor, Sumanth Banda, Rajinder Dhindsa, Dana Marie Lovell |
2020-08-18 |
| 8797705 |
Methods and arrangement for plasma dechuck optimization based on coupling of plasma signaling to substrate position and potential |
John C. Valcore, Jr., Saurabh Ullal, Ed Santos, Konstantin Makhratchev |
2014-08-05 |
