Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12394596 | Plasma uniformity control in pulsed DC plasma chamber | James Rogers | 2025-08-19 |
| 12334311 | Circuits for edge ring control in shaped dc pulsed plasma process device | James Rogers | 2025-06-17 |
| 12255051 | Multi-shape voltage pulse trains for uniformity and etch profile tuning | James Rogers, Daniel Sang Byun, Rajinder Dhindsa, Keith HERNANDEZ | 2025-03-18 |
| 12237148 | Plasma processing assembly using pulsed-voltage and radio-frequency power | Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy +4 more | 2025-02-25 |
| 12183557 | Apparatus and methods for controlling ion energy distribution | James Rogers | 2024-12-31 |
| 12148595 | Plasma uniformity control in pulsed DC plasma chamber | James Rogers | 2024-11-19 |
| 11984306 | Plasma chamber and chamber component cleaning methods | Rajinder Dhindsa, James Rogers | 2024-05-14 |
| 11948780 | Automatic electrostatic chuck bias compensation during plasma processing | James Rogers, Leonid Dorf | 2024-04-02 |
| 11908661 | Apparatus and methods for manipulating power at an edge ring in plasma process device | James Rogers | 2024-02-20 |
| 11901157 | Apparatus and methods for controlling ion energy distribution | James Rogers | 2024-02-13 |
| 11810768 | Temperature and bias control of edge ring | James Rogers, Rajinder Dhindsa | 2023-11-07 |
| 11798790 | Apparatus and methods for controlling ion energy distribution | James Rogers | 2023-10-24 |
| 11791138 | Automatic electrostatic chuck bias compensation during plasma processing | James Rogers, Leonid Dorf | 2023-10-17 |
| 11776789 | Plasma processing assembly using pulsed-voltage and radio-frequency power | Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy +4 more | 2023-10-03 |
| 11476145 | Automatic ESC bias compensation when using pulsed DC bias | James Rogers, Leonid Dorf | 2022-10-18 |
| 11462388 | Plasma processing assembly using pulsed-voltage and radio-frequency power | Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy +4 more | 2022-10-04 |
| 11462389 | Pulsed-voltage hardware assembly for use in a plasma processing system | Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy +5 more | 2022-10-04 |
| 11367593 | Apparatus and methods for manipulating radio frequency power at an edge ring in plasma process device | James Rogers | 2022-06-21 |
| 11289310 | Circuits for edge ring control in shaped DC pulsed plasma process device | James Rogers | 2022-03-29 |
| 11276601 | Apparatus and methods for manipulating power at an edge ring in a plasma processing device | James Rogers | 2022-03-15 |
| 11232933 | Temperature and bias control of edge ring | James Rogers, Rajinder Dhindsa | 2022-01-25 |
| 10784089 | Temperature and bias control of edge ring | James Rogers, Rajinder Dhindsa | 2020-09-22 |
| 10763081 | Apparatus and methods for manipulating radio frequency power at an edge ring in plasma process device | James Rogers | 2020-09-01 |