| 12394596 |
Plasma uniformity control in pulsed DC plasma chamber |
James Rogers |
2025-08-19 |
| 12334311 |
Circuits for edge ring control in shaped dc pulsed plasma process device |
James Rogers |
2025-06-17 |
| 12255051 |
Multi-shape voltage pulse trains for uniformity and etch profile tuning |
James Rogers, Daniel Sang Byun, Rajinder Dhindsa, Keith HERNANDEZ |
2025-03-18 |
| 12237148 |
Plasma processing assembly using pulsed-voltage and radio-frequency power |
Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy +4 more |
2025-02-25 |
| 12183557 |
Apparatus and methods for controlling ion energy distribution |
James Rogers |
2024-12-31 |
| 12148595 |
Plasma uniformity control in pulsed DC plasma chamber |
James Rogers |
2024-11-19 |
| 11984306 |
Plasma chamber and chamber component cleaning methods |
Rajinder Dhindsa, James Rogers |
2024-05-14 |
| 11948780 |
Automatic electrostatic chuck bias compensation during plasma processing |
James Rogers, Leonid Dorf |
2024-04-02 |
| 11908661 |
Apparatus and methods for manipulating power at an edge ring in plasma process device |
James Rogers |
2024-02-20 |
| 11901157 |
Apparatus and methods for controlling ion energy distribution |
James Rogers |
2024-02-13 |
| 11810768 |
Temperature and bias control of edge ring |
James Rogers, Rajinder Dhindsa |
2023-11-07 |
| 11798790 |
Apparatus and methods for controlling ion energy distribution |
James Rogers |
2023-10-24 |
| 11791138 |
Automatic electrostatic chuck bias compensation during plasma processing |
James Rogers, Leonid Dorf |
2023-10-17 |
| 11776789 |
Plasma processing assembly using pulsed-voltage and radio-frequency power |
Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy +4 more |
2023-10-03 |
| 11476145 |
Automatic ESC bias compensation when using pulsed DC bias |
James Rogers, Leonid Dorf |
2022-10-18 |
| 11462388 |
Plasma processing assembly using pulsed-voltage and radio-frequency power |
Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy +4 more |
2022-10-04 |
| 11462389 |
Pulsed-voltage hardware assembly for use in a plasma processing system |
Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy +5 more |
2022-10-04 |
| 11367593 |
Apparatus and methods for manipulating radio frequency power at an edge ring in plasma process device |
James Rogers |
2022-06-21 |
| 11289310 |
Circuits for edge ring control in shaped DC pulsed plasma process device |
James Rogers |
2022-03-29 |
| 11276601 |
Apparatus and methods for manipulating power at an edge ring in a plasma processing device |
James Rogers |
2022-03-15 |
| 11232933 |
Temperature and bias control of edge ring |
James Rogers, Rajinder Dhindsa |
2022-01-25 |
| 10784089 |
Temperature and bias control of edge ring |
James Rogers, Rajinder Dhindsa |
2020-09-22 |
| 10763081 |
Apparatus and methods for manipulating radio frequency power at an edge ring in plasma process device |
James Rogers |
2020-09-01 |
